Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HPGD | P15428 | 3/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.53 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.53 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.51 |
| ▸ | MAPT | P10636 | 1/20 | 0.49 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | POLB | P06746 | 1/20 | 0.48 |
| ▸ | CA12 | O43570 | 1/20 | 0.47 |
| ▸ | CA1 | P00915 | 1/20 | 0.47 |
| ▸ | CA2 | P00918 | 1/20 | 0.47 |
| ▸ | CA7 | P43166 | 1/20 | 0.47 |
| ▸ | CA9 | Q16790 | 1/20 | 0.47 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.46 |
| ▸ | LCK | P06239 | 1/20 | 0.46 |
| ▸ | NPC1 | O15118 | 1/20 | 0.46 |
| ▸ | KIF11 | P52732 | 1/20 | 0.45 |
| ▸ | HTT | P42858 | 1/20 | 0.45 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31493128 | 1.00 | HPGD (0.53) | HPGDALDH1A1NPSR1KDM4ECYP3A4 | |
| SCHEMBL15012676 | 0.86 | HTT (0.48) | HPGDALDH1A1NPSR1KDM4EMAPT | |
| SCHEMBL18288064 | 0.85 | ALOX15 (0.55) | HPGDALDH1A1KDM4ETSHRCA12 | |
| SCHEMBL9117716 | 0.83 | ALOX15 (0.46) | HPGDALDH1A1NPSR1KDM4ECYP3A4 | |
| SCHEMBL535683 | 0.83 | TSHR (0.49) | HPGDALDH1A1KDM4ECYP3A4MAPT | |
| SCHEMBL31281188 | 0.83 | TSHR (0.49) | HPGDALDH1A1KDM4ECYP3A4MAPT | |
| SCHEMBL2831563 | 0.83 | HPGD (0.43) | HPGDALDH1A1NPSR1KDM4ECYP3A4 | |
| Hydrochloric Acid SCHEMBL22445134 | 0.82 | TSHR (0.47) | HPGDALDH1A1KDM4ECYP3A4MAPT | |
| SCHEMBL18288083 | 0.82 | HPGD (0.53) | HPGDALDH1A1KDM4ECYP3A4MAPT | |
| SCHEMBL28858601 | 0.82 | LCK (0.56) | HPGDALDH1A1KDM4EMAPTCA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12570613-B2 | Imidazoquinoline or benzoindazolone compound and intermediate for preparing same | LMITO THERAPEUTICS INC. (KR) | 2026-03-10 | — | — | US | disclosed |
| US-20240034719-A1 | IMIDAZOQUINOLINE OR BENZOINDAZOLONE COMPOUND AND INTERMEDIATE FOR PREPARING SAME | LMITO THERAPEUTICS INC. (KR) | 2024-02-01 | — | — | US | disclosed |
| EP-4212530-A1 | IMIDAZOLQUINOLINE OR BENZOINDAZOLONE COMPOUND AND INTERMEDIATE FOR PREPARING SAME | Lmito Therapeutics Inc. (KR) | 2023-07-19 | — | — | EP | disclosed |
| US-20230072421-A1 | TARGETED RADIOPHARMACEUTICALS FOR THE DIAGNOSIS AND TREATMENT OF PROSTATE CANCER | BAYER AS (NO) | 2023-03-09 | — | — | US | disclosed |
| EP-4003959-A1 | TARGETED RADIOPHARMACEUTICALS FOR THE DIAGNOSIS AND TREATMENT OF PROSTATE CANCER | Bayer AS (NO) | 2022-06-01 | — | — | EP | disclosed |
| WO-2021013978-A1 | TARGETED RADIOPHARMACEUTICALS FOR THE DIAGNOSIS AND TREATMENT OF PROSTATE CANCER | BAYER AS (NO) | 2021-01-28 | — | — | WO | disclosed |
| EP-3109703-B1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, AND METHOD FOR FORMING PATTERN USING SAME | TOKYO ELECTRON LTD (JP) | 2020-12-30 | — | — | EP | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-10 | — | — | US | disclosed |
| US-9971247-B2 | Pattern-forming method | OSAKA UNIVERSITY (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20170075221-A1 | CHEMICALLY AMPLIFIED RESIST MATERIAL AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2017-03-16 | — | — | US | disclosed |
| US-20170052448-A1 | RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL | OSAKA UNIVERSITY (JP) | 2017-02-23 | — | — | US | disclosed |
| US-20170052449-A1 | CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND | OSAKA UNIVERSITY (JP) | 2017-02-23 | — | — | US | disclosed |
| US-20170052450-A1 | PATTERN-FORMING METHOD | OSAKA UNIVERSITY (JP) | 2017-02-23 | — | — | US | disclosed |
| US-20170052450-A1 | PATTERN-FORMING METHOD | OSAKA UNIVERSITY (JP) | 2017-02-23 | — | — | US | disclosed |
| US-20170052448-A1 | RESIST-PATTERN-FORMING METHOD AND CHEMICALLY AMPLIFIED RESIST MATERIAL | OSAKA UNIVERSITY (JP) | 2017-02-23 | — | — | US | disclosed |
| US-20170052449-A1 | CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND | OSAKA UNIVERSITY (JP) | 2017-02-23 | — | — | US | disclosed |
| EP-3133445-A1 | CHEMICALLY AMPLIFIED RESIST MATERIAL | OSAKA UNIVERSITY (JP) | 2017-02-22 | — | — | EP | disclosed |
| US-20160357103-A1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, METHOD FOR FORMING PATTERN USING SAME, SEMICONDUCTOR DEVICE, MASK FOR LITHOGRAPHY, AND TEMPLATE FOR NANOIMPRINTING | TOKYO ELECTRON LIMITED (JP) | 2016-12-08 | — | — | US | disclosed |
| US-20160357103-A1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, METHOD FOR FORMING PATTERN USING SAME, SEMICONDUCTOR DEVICE, MASK FOR LITHOGRAPHY, AND TEMPLATE FOR NANOIMPRINTING | TOKYO ELECTRON LIMITED (JP) | 2016-12-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | ASIC1, ASIC3, CLTA | HPGD 4505/4885ALDH1A1 1963/4885NPSR1 2033/4885 |
| US-20230072421-A1 | TARGETED RADIOPHARMACEUTICALS FOR THE DIAGNOSIS AND TREATMENT OF PROSTATE CANCER | KLK3, AR, SHBG | HPGD 194/4885ALDH1A1 1397/4885NPSR1 103/4885 |
| US-20240034719-A1 | IMIDAZOQUINOLINE OR BENZOINDAZOLONE COMPOUND AND INTERMEDIATE FOR PREPARING SAME | NQO1, NFE2L2, KEAP1 | HPGD 19/4885ALDH1A1 122/4885NPSR1 4198/4885 |
| US-12570613-B2 | Imidazoquinoline or benzoindazolone compound and intermediate for preparing same | NQO1, CBR1, NFE2L2 | HPGD 75/4885ALDH1A1 238/4885NPSR1 2859/4885 |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | SLC11A2, XRCC5, RAD54L | HPGD 3630/4885ALDH1A1 2183/4885NPSR1 1164/4885 |
| US-20170052449-A1 | CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND | RER1, POLR1A, FEM1B | HPGD 2876/4885ALDH1A1 1044/4885NPSR1 741/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.