SCHEMBL19928458

SCHEMBL19928458

c1ccc([SH](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.40
TP53 P04637 1/20 0.37
TSHR P16473 5/20 0.35
TDP1 Q9NUW8 5/20 0.35
ALOX12 P18054 3/20 0.35
CA1 P00915 2/20 0.35
CA2 P00918 2/20 0.35
CA9 Q16790 2/20 0.35
CA12 O43570 1/20 0.35
GLA P06280 1/20 0.35
CA3 P07451 1/20 0.35
CA4 P22748 1/20 0.35
CA14 Q9ULX7 1/20 0.35
LMNA P02545 1/20 0.35
ACHE P22303 1/20 0.35
CA7 P43166 1/20 0.35
HSD17B10 Q99714 3/20 0.33
CYP2A6 P11509 1/20 0.33
MAPT P10636 1/20 0.33
HPGD P15428 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28495472 0.87 ALDH1A1 (0.39) ALDH1A1TP53TSHRACHECYP2A6
SCHEMBL28710724 0.84 ALDH1A1 (0.30) ALDH1A1
SCHEMBL28688230 0.82 IDO1 (0.35)
SCHEMBL24057189 0.76 TSHR (0.59) ALDH1A1TSHRCA2CA9CA12
SCHEMBL23974024 0.76 ALDH1A1 (0.59) ALDH1A1TSHRMGLL
SCHEMBL25477009 0.76 TSHR (0.44) ALDH1A1TSHRTDP1LMNAACHE
SCHEMBL28833681 0.72
SCHEMBL23853834 0.72 CA1 (0.41) ALDH1A1TP53TSHRTDP1ALOX12
SCHEMBL22866374 0.72 TSHR (0.41) ALDH1A1TP53TSHRTDP1ALOX12
SCHEMBL21972407 0.69 SLC22A2 (0.41) ALDH1A1TP53TSHRTDP1ALOX12

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 217 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-110776974-A High-temperature-resistant antirust perfluoropolyether lubricating oil and preparation method thereof 中国石油化工股份有限公司 2020-02-11 CN claimed
WO-2024150677-A1 ACTIVE-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION 富士フイルム株式会社 2024-07-18 WO disclosed
WO-2024150553-A1 RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND JSR株式会社 2024-07-18 WO disclosed
US-20240241441-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240241440-A1 POLYMER, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2024-07-18 US disclosed
US-20240241444-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2024-07-18 US disclosed
US-12036078-B2 Oral products and methods for producing the same PolySpectra, Inc. (US) 2024-07-16 US disclosed
US-12032288-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-12032290-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-12032287-B2 Resist material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2024-07-09 US disclosed
CN-108701771-B Organic electroluminescent element and electronic device 出光兴产株式会社 2021-09-10 CN disclosed
US-20210069069-A1 DENTAL COMPOSITION COMPRISING A PARTICULATE CARRIER SUPPORTING A COINITIATOR DENTSPLY SIRONA INC. (US) 2021-03-11 US disclosed
US-20200295269-A1 HETEROCYCLIC COMPOUND AND ORGANIC LIGHT-EMITTING DEVICE INCLUDING THE SAME SAMSUNG DISPLAY CO., LTD. (KR) 2020-09-17 US disclosed
CN-107107389-B Method for producing a densified polymer powder, and method for melt-processing a densified polymer powder 沙特基础工业全球技术有限公司 2020-05-19 CN disclosed
CN-110776974-A High-temperature-resistant antirust perfluoropolyether lubricating oil and preparation method thereof 中国石油化工股份有限公司 2020-02-11 CN disclosed
CN-110563760-A Preparation method of thiophosphate compound 宜春学院 2019-12-13 CN disclosed
US-20190337967-A1 METHOD FOR PRODUCING ORGANOSILICON COMPOUND BY HYDROSILYLATION WITH METALLIC-ELEMENT-CONTAINING NANOPARTICLES THE SCHOOL CORPORATION KANSAI UNIVERSITY (JP) 2019-11-07 US disclosed
US-10189776-B2 Stereoselective process BOEHRINGER INGELHEIM INTERNATIONAL GMBH (DE) 2019-01-29 US disclosed
US-9911926-B2 Organic light-emitting device SAMSUNG DISPLAY CO., LTD. (KR) 2018-03-06 US disclosed
CN-1624953-A Mold for fuel cell separator, fuel cell separator and method of producing fuel cell separator MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 2005-06-08 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20190337967-A1 METHOD FOR PRODUCING ORGANOSILICON COMPOUND BY HYDROSILYLATION WITH METALLIC-ELEMENT-CONTAINING NANOPARTICLES MPST, AOC1, AGO2 ALDH1A1 670/4885TP53 3183/4885TSHR 4577/4885
US-20210069069-A1 DENTAL COMPOSITION COMPRISING A PARTICULATE CARRIER SUPPORTING A COINITIATOR PICALM, PDS5B, CLTA ALDH1A1 4366/4885TP53 846/4885TSHR 2840/4885
US-10189776-B2 Stereoselective process CYP4A11, CYP4B1, CYP3A4 ALDH1A1 316/4885TP53 4865/4885TSHR 3613/4885
US-12036078-B2 Oral products and methods for producing the same CROCC, RPAP1, RUVBL1 ALDH1A1 4171/4885TP53 2935/4885TSHR 2461/4885
US-12032288-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device RER1, COL1A1, RAD51 ALDH1A1 762/4885TP53 3889/4885TSHR 3144/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.