Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 4/20 | 0.43 |
| ▸ | MAPT | P10636 | 3/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | S100A4 | P26447 | 2/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | GPR3 | P46089 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | RAB9A | P51151 | 2/20 | 0.35 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.35 |
| ▸ | CRHBP | P24387 | 1/20 | 0.35 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2164911 | 0.84 | MAPT (0.43) | LMNAMAPTKMT2APOLBHPGD | |
| SCHEMBL2164909 | 0.84 | MAPT (0.43) | LMNAMAPTKMT2APOLBHPGD | |
| SCHEMBL7416281 | 0.73 | LIMK1 (0.47) | MAPTKMT2AHPGDMEN1SMN1; SMN2 | |
| SCHEMBL6369758 | 0.73 | GPR3 (0.41) | MAPTGPR3KDM4EALDH1A1RAB9A | |
| SCHEMBL787663 | 0.73 | HSD11B1 (0.43) | LMNAMAPTKMT2APOLBMEN1 | |
| SCHEMBL28769752 | 0.73 | HPGD (0.50) | LMNAMAPTKMT2APOLBHPGD | |
| SCHEMBL28932849 | 0.73 | S100A4 (0.52) | LMNAMAPTKMT2APOLBHPGD | |
| SCHEMBL9506713 | 0.73 | MAPT (0.50) | LMNAMAPTKMT2APOLBHPGD | |
| SCHEMBL5986359 | 0.70 | GPR3 (0.39) | LMNAHPGDGPR3TSHRKDM4E | |
| SCHEMBL18804144 | 0.70 | L3MBTL1 (0.47) | LMNAMAPTKMT2APOLBHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8906591-B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-12-09 | — | — | US | disclosed |
| US-8883395-B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-11-11 | — | — | US | disclosed |
| US-8871429-B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-10-28 | — | — | US | disclosed |
| US-8741545-B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-06-03 | — | — | US | disclosed |
| US-8709700-B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-04-29 | — | — | US | disclosed |
| US-8663901-B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-03-04 | — | — | US | disclosed |
| US-8658345-B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-02-25 | — | — | US | disclosed |
| US-8628910-B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-01-14 | — | — | US | disclosed |
| US-8628909-B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-01-14 | — | — | US | disclosed |
| US-8623584-B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-01-07 | — | — | US | disclosed |
| US-20130011794-A1 | FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-01-10 | — | — | US | disclosed |
| US-20130011787-A1 | FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-01-10 | — | — | US | disclosed |
| US-20130011788-A1 | FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-01-10 | — | — | US | disclosed |
| US-20130011792-A1 | FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-01-10 | — | — | US | disclosed |
| US-20130011795-A1 | FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-01-10 | — | — | US | disclosed |
| US-20130011793-A1 | FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-01-10 | — | — | US | disclosed |
| US-20130011790-A1 | FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-01-10 | — | — | US | disclosed |
| US-8343706-B2 | Fluorine-free fused ring heteroaromatic photoacid generators and resist compositions containing the same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-01-01 | — | — | US | disclosed |
| US-20110183259-A1 | FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-07-28 | — | — | US | disclosed |
| WO-2011089033-A1 | FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RESIST COMPOSITIONS CONTAINING THE SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-07-28 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130011787-A1 | FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RESIST COMPOSITIONS CONTAINING THE SAME | ARF5, ARFGEF1, ARFGAP1 | LMNA 4341/4885MAPT 3922/4885KMT2A 3004/4885 |
| US-20130011790-A1 | FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RESIST COMPOSITIONS CONTAINING THE SAME | ARF5, ARFGEF1, ARFGAP1 | LMNA 4341/4885MAPT 3922/4885KMT2A 3004/4885 |
| US-20110183259-A1 | FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RESIST COMPOSITIONS CONTAINING THE SAME | ARF5, ARFGEF1, ARFGAP1 | LMNA 4341/4885MAPT 3922/4885KMT2A 3004/4885 |
| US-20130011788-A1 | FLUORINE-FREE FUSED RING HETEROAROMATIC PHOTOACID GENERATORS AND RESIST COMPOSITIONS CONTAINING THE SAME | ARF5, ARFGEF1, ARFGAP1 | LMNA 4341/4885MAPT 3922/4885KMT2A 3004/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.