SCHEMBL2323487

SCHEMBL2323487

O=C(c1ccccc1)c1ccccc1N1CCOCC1

nearest known ligand 0.64

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.64
LMNA P02545 1/20 0.64
SMN1; SMN2 Q16637 5/20 0.63
GAA P10253 1/20 0.63
HPGD P15428 4/20 0.63
KDM4E B2RXH2 2/20 0.63
CYP1A2 P05177 1/20 0.63
CYP3A4 P08684 1/20 0.63
CASP1 P29466 1/20 0.63
CYP2C19 P33261 1/20 0.63
NPC1 O15118 3/20 0.59
RAB9A P51151 2/20 0.59
PIK3CD O00329 1/20 0.59
PIK3CA P42336 1/20 0.59
PIK3CB P42338 1/20 0.59
PIK3CG P48736 1/20 0.59
PRKDC P78527 1/20 0.59
TP53 P04637 1/20 0.59
ALOX15 P16050 1/20 0.59
TSHR P16473 1/20 0.59

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28393741 0.90 MAPT (0.53) ALDH1A1LMNASMN1; SMN2GAAHPGD
SCHEMBL27725575 0.87 HPGD (0.56) ALDH1A1LMNASMN1; SMN2GAAHPGD
SCHEMBL29034229 0.86 MAPT (0.57) ALDH1A1LMNASMN1; SMN2GAAHPGD
SCHEMBL29816440 0.85 ALDH1A1 (0.57) ALDH1A1LMNASMN1; SMN2GAAHPGD
SCHEMBL28529587 0.85 LMNA (0.57) ALDH1A1LMNASMN1; SMN2GAAHPGD
SCHEMBL226006 0.85 ALDH1A1 (0.57) ALDH1A1LMNASMN1; SMN2GAAHPGD
SCHEMBL28325052 0.85 NPC1 (0.62) ALDH1A1LMNASMN1; SMN2GAAHPGD
SCHEMBL10684744 0.83 NPC1 (0.65) ALDH1A1LMNASMN1; SMN2GAAHPGD
Hydrochloric Acid SCHEMBL6208562 0.83 ALDH1A1 (0.56) ALDH1A1LMNASMN1; SMN2GAAHPGD
SCHEMBL10690677 0.81 PRKDC (0.64) ALDH1A1LMNASMN1; SMN2GAAHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 222 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1932195-B1 SCAVENGER MATERIALS IN FUEL CARTRIDGE BIC SOC (FR) 2013-05-01 EP claimed
US-20090035394-A1 USE OF DNA-PK INHIBITION TO SENSITISE ATM DEFICIENT CANCERS TO DNA-DAMAGING CANCER THERAPIES KUDOS PHARMACEUTICALS LIMITED (GB) 2009-02-05 US claimed
EP-1895997-A2 USE OF DNA-PK INHIBITION TO SENSITISE ATM DEFICIENT CANCERS TO DNA-DAMAGING CANCER THERAPIES Kudos Pharmaceuticals Ltd (GB) 2008-03-12 EP claimed
WO-2006126010-A2 USE OF DNA-PK INHIBITION TO SENSITISE ATM DEFICIENT CANCERS TO DNA-DAMAGING CANCER THERAPIES KUDOS PHARMACEUTICALS LIMITED (GB) 2006-11-30 WO claimed
CN-120153318-A Photosensitive resin composition, method for producing cured relief pattern using same, and method for producing polyimide film 旭化成株式会社 2025-06-13 CN disclosed
CN-120129875-A Photosensitive resin composition, method for producing cured relief pattern, and semiconductor device 旭化成株式会社 2025-06-10 CN disclosed
CN-120129876-A Negative photosensitive resin composition, method for producing polyimide cured film using same, and polyimide cured film 旭化成株式会社 2025-06-10 CN disclosed
CN-116648313-B Resin composition, cured product, laminate, method for producing cured product, and semiconductor device 富士胶片株式会社 2025-05-16 CN disclosed
CN-119968421-A Resin composition, cured product, laminate, method for producing cured product, method for producing laminate, method for producing semiconductor device, and semiconductor device 富士胶片株式会社 2025-05-09 CN disclosed
CN-119937247-A Curable resin composition, resin film, cured film, laminate, method for producing cured film, and semiconductor device 富士胶片株式会社 2025-05-06 CN disclosed
CN-119213364-A Photosensitive resin composition, method for producing polyimide cured film using same, and polyimide cured film 旭化成株式会社 2024-12-27 CN disclosed
CN-118938601-A Negative photosensitive resin composition and method for producing cured relief pattern 旭化成株式会社 2024-11-12 CN disclosed
US-5391420-A Perfume inserts in fashion magazines or as point-of-purchase samples THERMEDICS INC. (US) 1995-02-21 US disclosed
CN-1095078-A The photopolymer composition that is used for the aniline forme that to process at water-bearing media GRACE W R & CO (US) 1994-11-16 CN disclosed
CN-1083493-A Water-developable photosensitive polyurethane- (meth) acrylate GRACE W R & CO (US) 1994-03-09 CN disclosed
CN-1016381-B PHOTOSENSITIVE COMPOSITIONS CONTAINING MICROCAPSULES CONCENTRATED IN SURFACE LAYER DU PONT (US) 1992-04-22 CN disclosed
CN-1004490-B Curable composition 旭化成工业株式会社 1989-06-14 CN disclosed
CN-88100085-A Microcapsules are enriched in the photosensitive composition on surface 1988-07-27 CN disclosed
CN-86104557-A Adopt photosensitive microcapsules to contain the image forming material of tertiary amines as coinitiators 1987-04-22 CN disclosed
CN-86102891-A Curable compositions 1987-01-21 CN disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090035394-A1 USE OF DNA-PK INHIBITION TO SENSITISE ATM DEFICIENT CANCERS TO DNA-DAMAGING CANCER THERAPIES ATM, CHEK2, DCK ALDH1A1 3562/4885LMNA 1819/4885SMN1; SMN2 3365/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.