SCHEMBL24944878

SCHEMBL24944878

COc1ccc(OC)c(/C=C/C(=O)OC2(c3ccccc3)CCNCC2)c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
JUN P05412 1/20 0.51
NFKB1 P19838 1/20 0.51
TDP1 Q9NUW8 1/20 0.49
ABCG2 Q9UNQ0 1/20 0.48
PDE4A P27815 1/20 0.46
PDE4B Q07343 1/20 0.46
PDE4C Q08493 1/20 0.46
PDE4D Q08499 1/20 0.46
MAPT P10636 6/20 0.46
ALDH1A1 P00352 5/20 0.46
SMN1; SMN2 Q16637 3/20 0.46
KDM4E B2RXH2 4/20 0.45
L3MBTL1 Q9Y468 3/20 0.45
GLA P06280 2/20 0.45
GAA P10253 2/20 0.45
HPGD P15428 2/20 0.45
POLB P06746 1/20 0.44
LMNA P02545 3/20 0.44
ATM Q13315 1/20 0.44
NPC1 O15118 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944898 0.92 MAPT (0.54) TDP1MAPTALDH1A1SMN1; SMN2KDM4E
SCHEMBL24943655 0.88 NFE2L2 (0.50) TDP1MAPTALDH1A1SMN1; SMN2KDM4E
SCHEMBL24944265 0.88 NFE2L2 (0.50) TDP1MAPTALDH1A1SMN1; SMN2KDM4E
SCHEMBL24943658 0.85 BCHE (0.50) NFKB1TDP1MAPTALDH1A1KDM4E
SCHEMBL26413847 0.84 NPC1 (0.47) ABCG2SMN1; SMN2L3MBTL1LMNANPC1
SCHEMBL24944264 0.84 BCHE (0.53) JUNNFKB1ABCG2MAPTALDH1A1
SCHEMBL24943719 0.84 ALDH1A1 (0.52) NFKB1ABCG2PDE4DMAPTALDH1A1
SCHEMBL24944889 0.82 TTR (0.53) MAPT
SCHEMBL24944908 0.82 NFE2L2 (0.52) MAPTALDH1A1KDM4EL3MBTL1LMNA
SCHEMBL24944708 0.82 HTR1A (0.58) TDP1ABCG2MAPTALDH1A1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR JUN 1338/4885NFKB1 3393/4885TDP1 2049/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.