SCHEMBL24944898

SCHEMBL24944898

COc1ccc(/C=C/C(=O)OC2(c3ccccc3)CCNCC2)c(OC)c1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 7/20 0.54
ALDH1A1 P00352 5/20 0.54
SMN1; SMN2 Q16637 3/20 0.54
NPC1 O15118 3/20 0.54
RAB9A P51151 3/20 0.54
MEN1 O00255 3/20 0.51
KMT2A Q03164 3/20 0.51
HDAC8 Q9BY41 1/20 0.50
CYP1A1 P04798 3/20 0.47
CYP1A2 P05177 3/20 0.47
CYP2D6 P10635 1/20 0.47
TNFRSF1A P19438 1/20 0.47
TDP1 Q9NUW8 2/20 0.46
KDM4E B2RXH2 4/20 0.46
LMNA P02545 3/20 0.46
GAA P10253 1/20 0.46
LY96 Q9Y6Y9 1/20 0.46
CYP1B1 Q16678 2/20 0.45
HPGD P15428 2/20 0.45
MAPK1 P28482 2/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24944878 0.92 JUN (0.51) MAPTALDH1A1SMN1; SMN2NPC1RAB9A
SCHEMBL24944265 0.88 NFE2L2 (0.50) MAPTALDH1A1SMN1; SMN2NPC1RAB9A
SCHEMBL24943655 0.88 NFE2L2 (0.50) MAPTALDH1A1SMN1; SMN2NPC1RAB9A
SCHEMBL24943658 0.85 BCHE (0.50) MAPTALDH1A1NPC1RAB9AMEN1
SCHEMBL26413847 0.84 NPC1 (0.47) SMN1; SMN2NPC1RAB9AKMT2ACYP1A1
SCHEMBL24944264 0.84 BCHE (0.53) MAPTALDH1A1SMN1; SMN2NPC1RAB9A
SCHEMBL24944908 0.82 NFE2L2 (0.52) MAPTALDH1A1NPC1RAB9AMEN1
SCHEMBL24943719 0.82 ALDH1A1 (0.52) MAPTALDH1A1SMN1; SMN2NPC1RAB9A
SCHEMBL24943717 0.82 ALOX5 (0.52) MAPTCYP1A2CYP2D6CYP3A4
SCHEMBL24944708 0.82 HTR1A (0.58) MAPTALDH1A1MEN1KMT2ACYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-11644753-B2 Resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-09 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230131303-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-04-27 US disclosed
US-20230021453-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-01-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11644753-B2 Resist composition and patterning process HNRNPU, NSUN2, HNRNPR MAPT 2648/4885ALDH1A1 4767/4885SMN1; SMN2 1285/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.