Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.67 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.67 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.50 |
| ▸ | HPGD | P15428 | 7/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 6/20 | 0.50 |
| ▸ | HMGB1 | P09429 | 2/20 | 0.50 |
| ▸ | NAPRT | Q6XQN6 | 2/20 | 0.50 |
| ▸ | CA12 | O43570 | 2/20 | 0.50 |
| ▸ | CA1 | P00915 | 2/20 | 0.50 |
| ▸ | CA2 | P00918 | 2/20 | 0.50 |
| ▸ | CA4 | P22748 | 2/20 | 0.50 |
| ▸ | CA7 | P43166 | 2/20 | 0.50 |
| ▸ | CA9 | Q16790 | 2/20 | 0.50 |
| ▸ | ESR1 | P03372 | 1/20 | 0.50 |
| ▸ | ITGB3 | P05106 | 1/20 | 0.50 |
| ▸ | ITGA2B | P08514 | 1/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | GGT1 | P19440 | 1/20 | 0.50 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6935 | 1.00 | ALDH1A1 (0.67) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| Magnesium SCHEMBL960154 | 0.98 | ALDH1A1 (0.64) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| Water SCHEMBL10792720 | 0.98 | ALDH1A1 (0.64) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| Water SCHEMBL1115165 | 0.98 | ALDH1A1 (0.64) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| SCHEMBL154505 | 0.98 | ALDH1A1 (0.64) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| Water SCHEMBL4303934 | 0.98 | ALDH1A1 (0.64) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| Ammonia Solution, Strong SCHEMBL2317138 | 0.98 | ALDH1A1 (0.64) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| SCHEMBL28144980 | 0.98 | ALDH1A1 (0.64) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| Water SCHEMBL8643839 | 0.96 | ALDH1A1 (0.61) | ALDH1A1ALOX15AKR1C3KDM4EHPGD | |
| Water SCHEMBL951511 | 0.96 | ALDH1A1 (0.61) | ALDH1A1ALOX15AKR1C3KDM4EHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 60 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110931768-B | High-nickel monocrystal lithium ion battery positive electrode material and preparation method thereof | 新乡天力锂能股份有限公司 | 2022-08-09 | — | — | CN | claimed |
| US-12637588-B2 | Method for producing inorganic particle-containing slurry and zirconia particle-containing slurry | FUJIMI INCORPORATED (JP) | 2026-05-26 | — | — | US | disclosed |
| US-20260139183-A1 | Chelating Compositions and Methods of Use | LOCUS SOLUTIONS IPCO LLC (US) | 2026-05-21 | — | — | US | disclosed |
| US-12606718-B2 | Polishing composition, polishing method, and method of manufacturing semiconductor substrate | FUJIMI INCORPORATED (JP) | 2026-04-21 | — | — | US | disclosed |
| US-20260092198-A1 | POLISHING COMPOSITION | FUJIMI INCORPORATED (JP) | 2026-04-02 | — | — | US | disclosed |
| US-20260092195-A1 | POLISHING COMPOSITION | FUJIMI INC (JP) | 2026-04-02 | — | — | US | disclosed |
| US-12590225-B2 | Polishing composition, polishing method, and method for producing polished substrate | FUJIMI INCORPORATED (JP) | 2026-03-31 | — | — | US | disclosed |
| US-20260085222-A1 | POLISHING COMPOSITION | FUJIMI INCORPORATED (JP) | 2026-03-26 | — | — | US | disclosed |
| US-20260078280-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING POLISHED SUBSTRATE | FUJIMI INC (JP) | 2026-03-19 | — | — | US | disclosed |
| EP-4693373-A1 | POLISHING AND WASHING METHOD, WASHING AGENT, AND SET OF POLISHING COMPOSITION AND WASHING AGENT | Fujimi Incorporated (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4132456-A1 | RHEOLOGICAL SOLID COMPOSITION | The Procter & Gamble Company (US) | 2023-02-15 | — | — | EP | disclosed |
| US-20220400671-A1 | ANTIMICROBIAL COMPOSITIONS CONTAINING PEROXYPHTHALIC ACID AND/OR SALT THEREOF | VIROX TECHNOLOGIES INC. (CA) | 2022-12-22 | — | — | US | disclosed |
| EP-4102971-A1 | ANTIMICROBIAL COMPOSITIONS CONTAINING PEROXYPHTHALIC ACID AND/OR SALT THEREOF | Virox Technologies Inc. (CA) | 2022-12-21 | — | — | EP | disclosed |
| US-20220348791-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING POLISHED SUBSTRATE | FUJIMI INCORPORATED (JP) | 2022-11-03 | — | — | US | disclosed |
| CN-115141550-A | Polishing composition | 福吉米株式会社 | 2022-10-04 | — | — | CN | disclosed |
| US-11434391-B2 | Polishing composition, polishing method, and method of producing substrate | FUJIMI INCORPORATED (JP) | 2022-09-06 | — | — | US | disclosed |
| US-11384256-B2 | Polishing method and method for manufacturing semiconductor substrate | FUJIMI INCORPORATED | 2022-07-12 | — | — | US | disclosed |
| US-11339312-B2 | Polishing composition, production method of the same, polishing method, and manufacturing method of semiconductor substrate | FUJIMI INCORPORATED (JP) | 2022-05-24 | — | — | US | disclosed |
| US-20220089907-A1 | POLISHING COMPOSITION | FUJIMI INCORPORATED (JP) | 2022-03-24 | — | — | US | disclosed |
| US-20220055180-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING SUBSTRATE | FUJIMI INCORPORATED (JP) | 2022-02-24 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (8 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260092195-A1 | POLISHING COMPOSITION | MSR1, ACR, ACP1 | ALDH1A1 4351/4885ALOX15 1359/4885AKR1C3 2931/4885 |
| US-20260092198-A1 | POLISHING COMPOSITION | ACP1, SFN, SMCHD1 | ALDH1A1 4361/4885ALOX15 2146/4885AKR1C3 3646/4885 |
| US-20260078280-A1 | POLISHING COMPOSITION, POLISHING METHOD, AND METHOD FOR PRODUCING POLISHED SUBSTRATE | SFN, HAO2, SGK2 | ALDH1A1 1495/4885ALOX15 225/4885AKR1C3 433/4885 |
| US-12637588-B2 | Method for producing inorganic particle-containing slurry and zirconia particle-containing slurry | ZAP70, NPM1, ACP1 | ALDH1A1 3317/4885ALOX15 4553/4885AKR1C3 2875/4885 |
| US-20260085222-A1 | POLISHING COMPOSITION | TMCO1, TCP1, CCT5 | ALDH1A1 3305/4885ALOX15 1466/4885AKR1C3 3400/4885 |
| US-20260139183-A1 | Chelating Compositions and Methods of Use | POLR1C, CASR, C1R | ALDH1A1 2419/4885ALOX15 810/4885AKR1C3 2130/4885 |
| US-12590225-B2 | Polishing composition, polishing method, and method for producing polished substrate | ACP1, HAO2, SORD | ALDH1A1 1032/4885ALOX15 1322/4885AKR1C3 475/4885 |
| US-12606718-B2 | Polishing composition, polishing method, and method of manufacturing semiconductor substrate | PIEZO1, ZP1, ZAP70 | ALDH1A1 4738/4885ALOX15 1561/4885AKR1C3 3720/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.