SCHEMBL3139868

SCHEMBL3139868

O=S(=O)(O)CCC(Cl)(Cl)Cl

nearest known ligand 0.41

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
PTGS1 P23219 1/20 0.41
PDE4A P27815 1/20 0.41
LMNA P02545 1/20 0.41
SLC6A6 P31641 1/20 0.41
CYP2C19 P33261 1/20 0.41
BLM P54132 1/20 0.41
APP P05067 1/20 0.38
CA1 P00915 1/20 0.32
CA2 P00918 1/20 0.32
TSHR P16473 1/20 0.32
NT5E P21589 1/20 0.32
CA4 P22748 1/20 0.32
CA6 P23280 1/20 0.32
CA5A P35218 1/20 0.32
CA7 P43166 1/20 0.32
CA9 Q16790 1/20 0.32
CA5B Q9Y2D0 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3134376 0.83 APP (0.46) PTGS1PDE4ALMNASLC6A6CYP2C19
SCHEMBL3139896 0.81 APP (0.44) PTGS1PDE4ALMNASLC6A6CYP2C19
SCHEMBL5923114 0.73 PTGS1 (0.43) PTGS1PDE4ALMNASLC6A6CYP2C19
Magnesium Chloride Anhydrous SCHEMBL28603033 0.71 PTGS1 (0.47) PTGS1PDE4ALMNASLC6A6CYP2C19
SCHEMBL15203858 0.71 PTGS1 (0.41) PTGS1PDE4ALMNASLC6A6CYP2C19
SCHEMBL492291 0.71 PTGS1 (0.41) PTGS1PDE4ALMNASLC6A6CYP2C19
SCHEMBL28739943 0.71 PTGS1 (0.41) PTGS1PDE4ALMNASLC6A6CYP2C19
SCHEMBL31553182 0.71 PTGS1 (0.48) PTGS1PDE4ALMNASLC6A6CYP2C19
SCHEMBL353110 0.71 PTGS1 (0.41) PTGS1PDE4ALMNASLC6A6CYP2C19
SCHEMBL27971734 0.71 LMNA (0.48) PTGS1PDE4ALMNASLC6A6CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250020997-A1 PHOTORESIST COMPOSITIONS AND METHODS OF MANUFACTURING INTEGRATED CIRCUIT DEVICES USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2025-01-16 US disclosed
US-20230176481-A1 FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2023-06-08 US disclosed
EP-1676835-B1 PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT WAKO PURE CHEM IND LTD (JP) 2014-12-10 EP disclosed
US-8669375-B2 Process for producing ester compound WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2014-03-11 US disclosed
US-20130066070-A1 PROCESS FOR PRODUCING ESTER COMPOUND WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2013-03-14 US disclosed
US-8318964-B2 Process for producing ester compound WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2012-11-27 US disclosed
US-20100324314-A1 PROCESS FOR PRODUCING ESTER COMPOUND WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-12-23 US disclosed
US-7833691-B2 Heterocycle-bearing onium salts WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-11-16 US disclosed
EP-1953149-B1 A heterocycle-containing onium salt WAKO PURE CHEM IND LTD (JP) 2010-10-06 EP disclosed
US-7642368-B2 for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2010-01-05 US disclosed
US-20050233253-A1 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) 2005-10-20 US disclosed
EP-1322601-B1 METHOD FOR SULPHONYLATING A HYDROXYLATED ORGANIC COMPOUND RHODIA CHIMIE SA (FR) 2005-08-03 EP disclosed
EP-1481973-A1 HETEROCYCLE-BEARING ONIUM SALTS Wako Pure Chemical Industries, Ltd. (JP) 2004-12-01 EP disclosed
US-20040024257-A1 Method for sulphonylating a hydroxylated organic compound CHIMIE, RHODIA (FR) 2004-02-05 US disclosed
EP-1322601-A1 METHOD FOR SULPHONYLATING A HYDROXYLATED ORGANIC COMPOUND Rhodia Chimie (FR) 2003-07-02 EP disclosed
WO-2002028826-A1 METHOD FOR SULPHONYLATING A HYDROXYLATED ORGANIC COMPOUND RHODIA CHIMIE (FR) 2002-04-11 WO disclosed
EP-0486937-B1 Hydrazone derivatives, processes for production thereof, and uses thereof NIHON NOHYAKU CO LTD (JP) 1995-03-22 EP disclosed
US-5358965-A Agricultural and horticultural insecticides, activity against moths and beetles NIHON NOHYAKU CO., LTD. (JP) 1994-10-25 US disclosed
US-5304573-A Insecticides NIHON NOHYAKU CO., LTD. (JP) 1994-04-19 US disclosed
EP-0486937-A1 Hydrazone derivatives, processes for production thereof, and uses thereof NIHON NOHYAKU CO., LTD. (JP) 1992-05-27 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20130066070-A1 PROCESS FOR PRODUCING ESTER COMPOUND ADH1C, ADH5, ADH1A PTGS1 2832/4885PDE4A 4386/4885LMNA 2262/4885
US-20050233253-A1 Diphenylsulfonium compounds in which the S atom is additionally attached to a xanthene-9-onyl-2-yl- or coumarin-7-yl- ring; acid generator for a chemically amplified resist; photopolymerization initiator for polymerizing an epoxide or a vinyl ether NOX4, CBR1, CBR3 PTGS1 1559/4885PDE4A 4703/4885LMNA 921/4885
US-20100324314-A1 PROCESS FOR PRODUCING ESTER COMPOUND ADH1C, ADH5, ADH1A PTGS1 2829/4885PDE4A 4359/4885LMNA 2434/4885
US-20040024257-A1 Method for sulphonylating a hydroxylated organic compound TST, SCLY, SDHB PTGS1 3606/4885PDE4A 4832/4885LMNA 4692/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.