Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.61 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.61 |
| ▸ | HPGD | P15428 | 4/20 | 0.55 |
| ▸ | LMNA | P02545 | 2/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.55 |
| ▸ | RAB9A | P51151 | 4/20 | 0.52 |
| ▸ | NPC1 | O15118 | 3/20 | 0.52 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.52 |
| ▸ | MAOB | P27338 | 1/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.46 |
| ▸ | CA12 | O43570 | 1/20 | 0.46 |
| ▸ | CA9 | Q16790 | 1/20 | 0.46 |
| ▸ | HSD17B1 | P14061 | 1/20 | 0.45 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | CES2 | O00748 | 2/20 | 0.43 |
| ▸ | CES1 | P23141 | 2/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3215658 | 1.00 | MAPT (0.61) | MAPTSMN1; SMN2HPGDLMNAALDH1A1 | |
| SCHEMBL1061558 | 0.92 | MAPT (0.59) | MAPTSMN1; SMN2HPGDLMNAALDH1A1 | |
| SCHEMBL3198744 | 0.91 | MAPT (0.54) | MAPTSMN1; SMN2HPGDLMNAALDH1A1 | |
| SCHEMBL9888851 | 0.89 | HPGD (0.76) | MAPTSMN1; SMN2HPGDLMNAALDH1A1 | |
| SCHEMBL13056361 | 0.89 | HPGD (0.76) | MAPTSMN1; SMN2HPGDLMNAALDH1A1 | |
| SCHEMBL6956930 | 0.85 | MAPT (0.55) | MAPTSMN1; SMN2HPGDLMNAALDH1A1 | |
| SCHEMBL3191806 | 0.84 | TSHR (0.59) | SMN1; SMN2HPGDALDH1A1CA12CA9 | |
| SCHEMBL3189981 | 0.84 | TSHR (0.59) | SMN1; SMN2HPGDALDH1A1CA12CA9 | |
| Acetic Acid SCHEMBL7788632 | 0.83 | CES2 (0.46) | MAPTSMN1; SMN2HPGDLMNAALDH1A1 | |
| Benzene SCHEMBL5533098 | 0.83 | MAPT (0.75) | MAPTSMN1; SMN2HPGDLMNAALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260117094-A1 | CURABLE ELECTRICAL INSULATION TAPE | TESA SE (DE) | 2026-04-30 | — | — | US | disclosed |
| EP-4578921-A1 | CURABLE ELECTRICAL INSULATION TAPE | TESA SE (DE) | 2025-07-02 | — | — | EP | disclosed |
| EP-4345131-A1 | CATIONICALLY CURABLE ADHESIVE COMPOSITION WITH DEFINED COLOURING IN THE CURED STATE | tesa SE (DE) | 2024-04-03 | — | — | EP | disclosed |
| CN-117777894-A | Cationic curable adhesive having defined coloration in the cured state | 德莎欧洲股份公司 | 2024-03-29 | — | — | CN | disclosed |
| CN-117777895-A | Curable pressure sensitive adhesives with improved adhesive properties | 德莎欧洲股份公司 | 2024-03-29 | — | — | CN | disclosed |
| CN-117597410-A | Reactive adhesive tape capable of die cutting | 德莎欧洲股份公司 | 2024-02-23 | — | — | CN | disclosed |
| CN-116731649-A | Curable adhesives with improved die-cuttability and improved impact properties | 德莎欧洲股份公司 | 2023-09-12 | — | — | CN | disclosed |
| CN-115960557-A | Adhesive tape and method for sheathing elongated items, in particular wires | 德莎欧洲股份公司 | 2023-04-14 | — | — | CN | disclosed |
| CN-115776997-A | Curable composition, cured film, method for producing cured film, element, and display device | ＡＧＣ株式会社 | 2023-03-10 | — | — | CN | disclosed |
| CN-111978898-B | Method for producing pressure-sensitive adhesive reactive adhesive tape | 德莎欧洲股份公司 | 2022-09-09 | — | — | CN | disclosed |
| WO-2019162035-A1 | COMPOSITION FOR GENERATING AN ADHESIVE COMPOUND, IN PARTICULAR FOR ENCAPSULATION OF AN ELECTRONIC ASSEMBLY | TESA SE (DE) | 2019-08-29 | — | — | WO | disclosed |
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | TOYO GOSEI CO., LTD. (JP) | 2018-01-11 | — | — | US | disclosed |
| US-9714217-B2 | Sulfonic acid derivative and photoacid generator | TOYO GOSEI CO., LTD. (JP) | 2017-07-25 | — | — | US | disclosed |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-23 | — | — | US | disclosed |
| US-8435717-B2 | Compound for photoacid generator, resist composition using the same, and pattern-forming method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-07 | — | — | US | disclosed |
| US-8383862-B2 | Salt compound, cationic polymerization initiator and cationically polymerizable composition | ADEKA CORPORATION (JP) | 2013-02-26 | — | — | US | disclosed |
| US-20120289738-A1 | SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR | TOYO GOSEI CO., LTD. (JP) | 2012-11-15 | — | — | US | disclosed |
| US-20100267857-A1 | SALT COMPOUND, CATIONIC POLYMERIZATION INITIATOR AND CATIONICALLY POLYMERIZABLE COMPOSITION | ADEKA CORPORATION (JP) | 2010-10-21 | — | — | US | disclosed |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LTD. (JP) | 2010-02-11 | — | — | US | disclosed |
| EP-2151443-A1 | POLYHEDRAL POLYSILOXANE MODIFIED PRODUCT AND COMPOSITION USING THE MODIFIED PRODUCT | Kaneka Corporation (JP) | 2010-02-10 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100267857-A1 | SALT COMPOUND, CATIONIC POLYMERIZATION INITIATOR AND CATIONICALLY POLYMERIZABLE COMPOSITION | RFC5, RER1, ARF5 | MAPT 3275/4885SMN1; SMN2 3384/4885HPGD 3644/4885 |
| US-20180011401-A1 | SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD | ASIC1, ASIC3, CRY1 | MAPT 4292/4885SMN1; SMN2 3408/4885HPGD 1810/4885 |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | MAPT 4347/4885SMN1; SMN2 3568/4885HPGD 3082/4885 |
| US-20120289738-A1 | SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR | CRY1, ASIC1, ASIC3 | MAPT 3875/4885SMN1; SMN2 4394/4885HPGD 1734/4885 |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | MAPT 4438/4885SMN1; SMN2 3886/4885HPGD 3236/4885 |
| US-20260117094-A1 | CURABLE ELECTRICAL INSULATION TAPE | EPCAM, ILK, ITGB3 | MAPT 522/4885SMN1; SMN2 1725/4885HPGD 4017/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.