SCHEMBL3215658

SCHEMBL3215658

CC(=O)c1ccc([S+](c2ccccc2)c2ccc(C(C)=O)cc2)cc1

nearest known ligand 0.61

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.61
SMN1; SMN2 Q16637 3/20 0.61
HPGD P15428 4/20 0.55
LMNA P02545 2/20 0.55
ALDH1A1 P00352 1/20 0.55
RAB9A P51151 4/20 0.52
NPC1 O15118 3/20 0.52
TAAR1 Q96RJ0 1/20 0.52
MAOB P27338 1/20 0.47
KMT2A Q03164 2/20 0.46
L3MBTL1 Q9Y468 1/20 0.46
CA12 O43570 1/20 0.46
CA9 Q16790 1/20 0.46
HSD17B1 P14061 1/20 0.45
NPSR1 Q6W5P4 1/20 0.44
CES2 O00748 2/20 0.43
CES1 P23141 2/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3205192 1.00 MAPT (0.61) MAPTSMN1; SMN2HPGDLMNAALDH1A1
SCHEMBL1061558 0.92 MAPT (0.59) MAPTSMN1; SMN2HPGDLMNAALDH1A1
SCHEMBL3198744 0.91 MAPT (0.54) MAPTSMN1; SMN2HPGDLMNAALDH1A1
SCHEMBL9888851 0.89 HPGD (0.76) MAPTSMN1; SMN2HPGDLMNAALDH1A1
SCHEMBL13056361 0.89 HPGD (0.76) MAPTSMN1; SMN2HPGDLMNAALDH1A1
SCHEMBL6956930 0.85 MAPT (0.55) MAPTSMN1; SMN2HPGDLMNAALDH1A1
SCHEMBL3191806 0.84 TSHR (0.59) SMN1; SMN2HPGDALDH1A1CA12CA9
SCHEMBL3189981 0.84 TSHR (0.59) SMN1; SMN2HPGDALDH1A1CA12CA9
Acetic Acid SCHEMBL7788632 0.83 CES2 (0.46) MAPTSMN1; SMN2HPGDLMNAALDH1A1
Benzene SCHEMBL5533098 0.83 MAPT (0.75) MAPTSMN1; SMN2HPGDLMNAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180011401-A1 SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD TOYO GOSEI CO., LTD. (JP) 2018-01-11 US disclosed
US-9714217-B2 Sulfonic acid derivative and photoacid generator TOYO GOSEI CO., LTD. (JP) 2017-07-25 US disclosed
US-20130130175-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method CENTRAL GLASS COMPANY, LIMITED (JP) 2013-05-23 US disclosed
US-8435717-B2 Compound for photoacid generator, resist composition using the same, and pattern-forming method CENTRAL GLASS COMPANY, LIMITED (JP) 2013-05-07 US disclosed
US-20120289738-A1 SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR TOYO GOSEI CO., LTD. (JP) 2012-11-15 US disclosed
US-20100035185-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method CENTRAL GLASS COMPANY, LTD. (JP) 2010-02-11 US disclosed
US-7414148-B2 Process for producing alkoxycarbonylfluoroalkanesulfonates CENTRAL GLASS COMPANY LIMITED (JP) 2008-08-19 US disclosed
US-20080108846-A1 PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES CENTRAL GLASS COMPANY, LIMITED (JP) 2008-05-08 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180011401-A1 SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD ASIC1, ASIC3, CRY1 MAPT 4292/4885SMN1; SMN2 3408/4885HPGD 1810/4885
US-20080108846-A1 PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES ARSA, PFAS, MPST MAPT 4791/4885SMN1; SMN2 3142/4885HPGD 3522/4885
US-20100035185-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method ASIC1, RER1, INSRR MAPT 4347/4885SMN1; SMN2 3568/4885HPGD 3082/4885
US-20120289738-A1 SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR CRY1, ASIC1, ASIC3 MAPT 3875/4885SMN1; SMN2 4394/4885HPGD 1734/4885
US-20130130175-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method ASIC1, RER1, INSRR MAPT 4438/4885SMN1; SMN2 3886/4885HPGD 3236/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.