Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 1/20 | 0.50 |
| ▸ | NFE2L2 | Q16236 | 5/20 | 0.41 |
| ▸ | CES2 | O00748 | 2/20 | 0.38 |
| ▸ | CES1 | P23141 | 2/20 | 0.38 |
| ▸ | TAAR1 | Q96RJ0 | 3/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.35 |
| ▸ | PSIP1 | O75475 | 1/20 | 0.33 |
| ▸ | IDO1 | P14902 | 1/20 | 0.33 |
| ▸ | AOC3 | Q16853 | 1/20 | 0.33 |
| ▸ | NPC1 | O15118 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31005130 | 1.00 | ACHE (0.50) | ACHENFE2L2CES2CES1TAAR1 | |
| SCHEMBL29401652 | 0.87 | ACHE (0.40) | ACHENFE2L2CES2CES1TAAR1 | |
| SCHEMBL30591643 | 0.87 | ACHE (0.40) | ACHENFE2L2CES2CES1TAAR1 | |
| SCHEMBL3215179 | 0.87 | ACHE (0.40) | ACHENFE2L2CES2CES1TAAR1 | |
| SCHEMBL3197202 | 0.87 | ACHE (0.40) | ACHENFE2L2CES2CES1TAAR1 | |
| SCHEMBL29403451 | 0.81 | ACHE (0.46) | ACHENFE2L2CES2CES1TAAR1 | |
| SCHEMBL775875 | 0.79 | ACHE (0.43) | ACHENFE2L2CES2CES1TAAR1 | |
| SCHEMBL514390 | 0.77 | ACHE (0.42) | ACHENFE2L2CES2CES1TAAR1 | |
| SCHEMBL2460604 | 0.75 | ACHE (0.40) | ACHENFE2L2CES2CES1TAAR1 | |
| SCHEMBL18195202 | 0.75 | ACHE (0.40) | ACHENFE2L2CES2CES1TAAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 54 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11914294-B2 | Positive resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-27 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027903-A1 | Resist Material And Patterning Process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027909-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027909-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11829067-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-11829067-B2 | Resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-20230367214-A1 | CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230367213-A1 | MASK BLANK, RESIST PATTERN FORMING PROCESS AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-11-16 | — | — | US | disclosed |
| US-8524440-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-03 | — | — | US | disclosed |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-23 | — | — | US | disclosed |
| US-8435717-B2 | Compound for photoacid generator, resist composition using the same, and pattern-forming method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2013-05-07 | — | — | US | disclosed |
| US-20120289738-A1 | SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR | TOYO GOSEI CO., LTD. (JP) | 2012-11-15 | — | — | US | disclosed |
| US-8110336-B2 | Resin and chemically amplified resist composition comprising the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-02-07 | — | — | US | disclosed |
| US-20110165513-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY LTD (JP) | 2011-07-07 | — | — | US | disclosed |
| US-20100075257-A1 | Resin and Chemically Amplified Resist Composition Comprising the Same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-03-25 | — | — | US | disclosed |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | CENTRAL GLASS COMPANY, LTD. (JP) | 2010-02-11 | — | — | US | disclosed |
| US-7414148-B2 | Process for producing alkoxycarbonylfluoroalkanesulfonates | CENTRAL GLASS COMPANY LIMITED (JP) | 2008-08-19 | — | — | US | disclosed |
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | CENTRAL GLASS COMPANY, LIMITED (JP) | 2008-05-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080108846-A1 | PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES | ARSA, PFAS, MPST | ACHE 4098/4885NFE2L2 2129/4885CES2 664/4885 |
| US-20240027903-A1 | Resist Material And Patterning Process | LBR, HNRNPU, EWSR1 | ACHE 4873/4885NFE2L2 2149/4885CES2 2176/4885 |
| US-20100035185-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | ACHE 4426/4885NFE2L2 4114/4885CES2 3810/4885 |
| US-20120289738-A1 | SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR | CRY1, ASIC1, ASIC3 | ACHE 4864/4885NFE2L2 958/4885CES2 2643/4885 |
| US-20130130175-A1 | Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method | ASIC1, RER1, INSRR | ACHE 4468/4885NFE2L2 4169/4885CES2 3772/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.