SCHEMBL3208778

SCHEMBL3208778

O=C(Oc1ccccc1[S+](c1ccccc1)c1ccccc1OC(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 6/20 0.56
MAPT P10636 5/20 0.56
SMN1; SMN2 Q16637 2/20 0.56
SLC6A3 Q01959 1/20 0.50
GAA P10253 2/20 0.49
ESR1 P03372 2/20 0.49
ESR2 Q92731 2/20 0.49
HSD17B10 Q99714 2/20 0.49
MEN1 O00255 2/20 0.49
JAK2 O60674 1/20 0.49
USP2 O75604 1/20 0.49
ALOX15 P16050 1/20 0.49
NPSR1 Q6W5P4 1/20 0.49
LMNA P02545 2/20 0.45
METAP2 P50579 1/20 0.45
METAP1 P53582 1/20 0.45
HDAC6 Q9UBN7 1/20 0.45
TOP1 P11387 1/20 0.45
F2 P00734 1/20 0.44
PARP1 P09874 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3198775 0.97 KMT2A (0.56) KMT2AMAPTSMN1; SMN2SLC6A3GAA
SCHEMBL3201069 0.91 KMT2A (0.61) KMT2AMAPTSMN1; SMN2SLC6A3GAA
SCHEMBL3190162 0.81 PTGS2 (0.53) MAPTGAAESR1HSD17B10LMNA
SCHEMBL31005112 0.81 PTGS2 (0.53) MAPTGAAESR1HSD17B10LMNA
SCHEMBL725404 0.79 KMT2A (0.76) KMT2AMAPTSMN1; SMN2SLC6A3GAA
SCHEMBL3203771 0.77 PTGS2 (0.53) MAPTGAAESR1HSD17B10LMNA
SCHEMBL30249447 0.77 PTGS2 (0.53) MAPTGAAESR1HSD17B10LMNA
Hydrochloric Acid SCHEMBL16050041 0.77 KMT2A (0.73) KMT2AMAPTSMN1; SMN2SLC6A3GAA
Bromide SCHEMBL29588519 0.77 KMT2A (0.73) KMT2AMAPTSMN1; SMN2SLC6A3GAA
SCHEMBL3208782 0.75 PARP10 (0.61) KMT2AMAPTSMN1; SMN2GAAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118459372-A Preparation method of photoacid generator sulfonate for ARF photoresist 常州朗芯新材料科技有限公司 2024-08-09 CN disclosed
US-20180011401-A1 SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD TOYO GOSEI CO., LTD. (JP) 2018-01-11 US disclosed
US-9714217-B2 Sulfonic acid derivative and photoacid generator TOYO GOSEI CO., LTD. (JP) 2017-07-25 US disclosed
US-20130130175-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method CENTRAL GLASS COMPANY, LIMITED (JP) 2013-05-23 US disclosed
US-8435717-B2 Compound for photoacid generator, resist composition using the same, and pattern-forming method CENTRAL GLASS COMPANY, LIMITED (JP) 2013-05-07 US disclosed
US-20120289738-A1 SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR TOYO GOSEI CO., LTD. (JP) 2012-11-15 US disclosed
US-20100035185-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method CENTRAL GLASS COMPANY, LTD. (JP) 2010-02-11 US disclosed
US-7414148-B2 Process for producing alkoxycarbonylfluoroalkanesulfonates CENTRAL GLASS COMPANY LIMITED (JP) 2008-08-19 US disclosed
US-20080108846-A1 PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES CENTRAL GLASS COMPANY, LIMITED (JP) 2008-05-08 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20180011401-A1 SULFONIC ACID DERIVATIVE, PHOTOACID GENERATOR USING SAME, RESIST COMPOSITION, AND DEVICE MANUFACTURING METHOD ASIC1, ASIC3, CRY1 KMT2A 503/4885MAPT 4292/4885SMN1; SMN2 3408/4885
US-20080108846-A1 PROCESS FOR PRODUCING ALKOXYCARBONYLFLUOROALKANESULFONATES ARSA, PFAS, MPST KMT2A 3530/4885MAPT 4791/4885SMN1; SMN2 3142/4885
US-20100035185-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method ASIC1, RER1, INSRR KMT2A 2194/4885MAPT 4347/4885SMN1; SMN2 3568/4885
US-20120289738-A1 SULFONIC ACID DERIVATIVE AND PHOTOACID GENERATOR CRY1, ASIC1, ASIC3 KMT2A 2109/4885MAPT 3875/4885SMN1; SMN2 4394/4885
US-20130130175-A1 Compound for Photoacid Generator, Resist Composition Using the Same, and Pattern-Forming Method ASIC1, RER1, INSRR KMT2A 2323/4885MAPT 4438/4885SMN1; SMN2 3886/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.