SCHEMBL3287120

SCHEMBL3287120

COc1ccc(/[C]=N/OS(=O)(=O)c2ccccc2Cl)cc1

nearest known ligand 0.40

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
▸ NFE2L2 Q16236 4/20 0.40
▸ KDM4E B2RXH2 1/20 0.38
▸ ALDH1A1 P00352 1/20 0.38
▸ TDP1 Q9NUW8 2/20 0.38
▸ L3MBTL1 Q9Y468 2/20 0.38
▸ KMT2A Q03164 1/20 0.38
▸ MAPT P10636 1/20 0.38
▸ PGR P06401 2/20 0.36
▸ F2 P00734 1/20 0.36
▸ CTRC Q99895 1/20 0.36
▸ SMN1; SMN2 Q16637 2/20 0.36
▸ POLB P06746 1/20 0.36
▸ RELA Q04206 1/20 0.35
▸ MAOB P27338 2/20 0.35
▸ HTR6 P50406 1/20 0.34
▸ LMNA P02545 1/20 0.34
▸ HTT P42858 1/20 0.34
▸ KCNH2 Q12809 1/20 0.34
▸ PKM P14618 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3287125 1.00 NFE2L2 (0.40) NFE2L2KDM4EALDH1A1TDP1L3MBTL1
SCHEMBL3280063 0.80 ALDH1A1 (0.43) ALDH1A1TDP1L3MBTL1MAPTPGR
SCHEMBL3280059 0.80 ALDH1A1 (0.43) ALDH1A1TDP1L3MBTL1MAPTPGR
SCHEMBL3287126 0.76 NFE2L2 (0.44) NFE2L2KDM4EALDH1A1KMT2AMAPT
SCHEMBL28313062 0.75 PKM (0.42) F2LMNAPKM
SCHEMBL29359430 0.74 KMT2A (0.42) NFE2L2KDM4EALDH1A1L3MBTL1KMT2A
SCHEMBL36764 0.74 KMT2A (0.42) NFE2L2KDM4EALDH1A1L3MBTL1KMT2A
SCHEMBL36763 0.74 KMT2A (0.42) NFE2L2KDM4EALDH1A1L3MBTL1KMT2A
SCHEMBL17216101 0.70 MAOB (0.43) NFE2L2ALDH1A1TDP1L3MBTL1KMT2A
SCHEMBL17216104 0.70 MAOB (0.43) NFE2L2ALDH1A1TDP1L3MBTL1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7897319-B2 Positive resist composition and method of forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2011-03-01 — — US disclosed
US-7700259-B2 Polymer compound, photoresist composition containing such polymer compound, and method for forming resist pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2010-04-20 — — US disclosed
US-20070259273-A1 Positive Resist Composition and Method of Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-11-08 — — US disclosed
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern TOKYO OHKA KOGYO CO., LTD. (JP) 2007-09-27 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070224520-A1 Polymer Compound, Photoresist Composition Containing Such Polymer Compound, and Method for Forming Resist Pattern ADH1A, ADH1C, POLR1A NFE2L2 1833/4885KDM4E 1567/4885ALDH1A1 56/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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