Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSB | P07858 | 1/20 | 0.53 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.44 |
| ▸ | LOXL2 | Q9Y4K0 | 2/20 | 0.42 |
| ▸ | GABRA1 | P14867 | 2/20 | 0.41 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.41 |
| ▸ | PSIP1 | O75475 | 1/20 | 0.39 |
| ▸ | MGLL | Q99685 | 1/20 | 0.38 |
| ▸ | RAPGEF4 | Q8WZA2 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | PLCG1 | P19174 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL330570 | 0.85 | CTSB (0.41) | CTSBHSD11B1LOXL2PSIP1 | |
| SCHEMBL780568 | 0.83 | CTSB (0.55) | CTSBHSD11B1LOXL2GABRA1GABRB2 | |
| SCHEMBL8932920 | 0.81 | LIPG (0.42) | CTSB | |
| SCHEMBL2024322 | 0.81 | CTSB (0.53) | CTSBHSD11B1LOXL2GABRA1GABRB2 | |
| SCHEMBL10179924 | 0.81 | CTSB (0.53) | CTSBHSD11B1LOXL2GABRA1GABRB2 | |
| SCHEMBL30096522 | 0.79 | CA2 (0.52) | CTSBHSD11B1LOXL2 | |
| SCHEMBL301742 | 0.79 | CA2 (0.52) | CTSBHSD11B1LOXL2 | |
| SCHEMBL29800774 | 0.79 | CTSB (0.52) | CTSBHSD11B1LOXL2GABRA1GABRB2 | |
| SCHEMBL29394818 | 0.79 | CTSB (0.52) | CTSBHSD11B1LOXL2GABRA1GABRB2 | |
| SCHEMBL4256900 | 0.79 | PLCG1 (0.54) | CTSBHSD11B1LOXL2GABRA1GABRB2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8063242-B2 | for treatment of neutrofil-dependent pathologies such as psoriasis, ulcerative colitis, melanoma, chronic obstructive pulmonary disease (COPD), bollous pemphigo, rheumatoid arthritis, idiopathic fibrosis, glomerulonephritis; prevention and treatment of damages caused by ischemia and reperfusion | DOMPE PHA.R.MA S.P.A. (IT) | 2011-11-22 | — | — | US | claimed |
| US-20050038119-A1 | 2-Aryl-propionic acids and pharmaceutical compositions containing them | DOMPÉ FARMACEUTICI S.P.A. (IT) | 2005-02-17 | — | — | US | claimed |
| EP-1455773-A1 | 2-ARYL-PROPIONIC ACIDS AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM | Dompé S.P.A. (IT) | 2004-09-15 | — | — | EP | claimed |
| WO-2003043625-A1 | 2-ARYL-PROPIONIC ACIDS AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM | DOMPE S.P.A. (IT) | 2003-05-30 | — | — | WO | claimed |
| US-4291047-A | Combating fungi with α-azolyl-β-hydroxy-ketones | BAYER AKTIENGESELLSCHAFT (DE) | 1981-09-22 | — | — | US | claimed |
| CN-111694215-B | Photoresist composition and method for forming photolithographic pattern | 常州强力先端电子材料有限公司 | 2022-04-19 | — | — | CN | disclosed |
| CN-111694215-A | Photoresist composition and method for forming photolithographic pattern | 常州强力先端电子材料有限公司 | 2020-09-22 | — | — | CN | disclosed |
| US-20180258038-A1 | N,N-SUBSTITUTED 3-AMINOPYRROLIDINE COMPOUNDS USEFUL AS MONOAMINES REUPTAKE INHIBITORS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2018-09-13 | — | — | US | disclosed |
| US-10000450-B2 | N,N-substituted 3-aminopyrrolidine compounds useful as monoamines reuptake inhibitors | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2018-06-19 | — | — | US | disclosed |
| US-20170166524-A1 | N,N-SUBSTITUTED 3-AMINOPYRROLIDINE COMPOUNDS USEFUL AS MONOAMINES REUPTAKE INHIBITORS | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2017-06-15 | — | — | US | disclosed |
| US-9611214-B2 | N,N-substituted 3-aminopyrrolidine compounds useful as monoamines reuptake inhibitors | OTSUKA PHARMACEUTICAL CO., LTD. (JP) | 2017-04-04 | — | — | US | disclosed |
| CN-103613527-B | N, N-substituted 3-aminopyrrolidine compounds useful as monoamine reuptake inhibitors | OTSUKA PHARMACEUTICAL CO.,LTD. (JP) | 2016-02-24 | — | — | CN | disclosed |
| US-6838229-B2 | Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-01-04 | — | — | US | disclosed |
| EP-1455773-A1 | 2-ARYL-PROPIONIC ACIDS AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM | Dompé S.P.A. (IT) | 2004-09-15 | — | — | EP | disclosed |
| EP-1426365-A1 | 3-PHENOXY-4-PYRIDAZINOL DERIVATIVE AND HERBICIDE COMPOSITION CONTAINING THE SAME | Sankyo Agro Company, Limited (JP) | 2004-06-09 | — | — | EP | disclosed |
| EP-1329160-A2 | 4-ACYLAMINOPYRAZOLE DERIVATIVES | Sankyo Company, Limited (JP) | 2003-07-23 | — | — | EP | disclosed |
| WO-2003043625-A1 | 2-ARYL-PROPIONIC ACIDS AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM | DOMPE S.P.A. (IT) | 2003-05-30 | — | — | WO | disclosed |
| US-20030039921-A1 | Chemically amplified negative photoresist composition for the formation of thick films, photoresist base material and method of forming bumps using the same | TOKYO OHKA KOGYO CO., LTD. | 2003-02-27 | — | — | US | disclosed |
| US-5955241-A | Chemical-amplification-type negative resist composition and method for forming negative resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-09-21 | — | — | US | disclosed |
| EP-0415212-A1 | Aryloxynaphthalene derivatives | BAYER AG (DE) | 1991-03-06 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10000450-B2 | N,N-substituted 3-aminopyrrolidine compounds useful as monoamines reuptake inhibitors | SLC6A2, TPH1, SLC6A3 | CTSB 2824/4885HSD11B1 762/4885LOXL2 4496/4885 |
| US-20180258038-A1 | N,N-SUBSTITUTED 3-AMINOPYRROLIDINE COMPOUNDS USEFUL AS MONOAMINES REUPTAKE INHIBITORS | SLC6A2, TPH1, SLC6A3 | CTSB 2824/4885HSD11B1 762/4885LOXL2 4496/4885 |
| US-20170166524-A1 | N,N-SUBSTITUTED 3-AMINOPYRROLIDINE COMPOUNDS USEFUL AS MONOAMINES REUPTAKE INHIBITORS | SLC6A2, TPH1, SLC6A3 | CTSB 2824/4885HSD11B1 762/4885LOXL2 4496/4885 |
| US-20050038119-A1 | 2-Aryl-propionic acids and pharmaceutical compositions containing them | CXCR2, FPR1, CCR2 | CTSB 1945/4885HSD11B1 2901/4885LOXL2 375/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.