Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CCR2 | P41597 | 1/20 | 0.36 |
| ▸ | KCNA5 | P22460 | 1/20 | 0.35 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1823425 | 0.83 | ESR2 (0.41) | SLC6A2MAPT | |
| SCHEMBL12484267 | 0.80 | NPSR1 (0.43) | CCR2MEN1MAPTKMT2ANPSR1 | |
| SCHEMBL5244036 | 0.80 | NPSR1 (0.43) | CCR2MEN1MAPTKMT2ANPSR1 | |
| SCHEMBL11437597 | 0.79 | CCR2 (0.34) | CCR2KCNA5 | |
| SCHEMBL597190 | 0.78 | CCR2 (0.33) | CCR2KCNA5SLC6A2 | |
| SCHEMBL1823424 | 0.78 | P2RX4 (0.32) | — | |
| SCHEMBL8196761 | 0.76 | ALDH1A1 (0.38) | MEN1MAPTKMT2A | |
| SCHEMBL4753780 | 0.75 | CCR2 (0.35) | CCR2KCNA5SLC6A2 | |
| SCHEMBL8588502 | 0.74 | MAOB (0.42) | MEN1MAPTKMT2A | |
| SCHEMBL4647450 | 0.73 | KCNA5 (0.33) | KCNA5MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 171 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0605149-B1 | Recording sheet | JUJO PAPER CO LTD (JP) | 1998-04-22 | — | — | EP | claimed |
| EP-0605149-A2 | Recording sheet | NIPPON PAPER INDUSTRIES CO., LTD. (JP) | 1994-07-06 | — | — | EP | claimed |
| EP-0144178-A1 | Cyanoacrylate adhesive composition having sustained toughness | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1985-06-12 | — | — | EP | claimed |
| US-12637638-B2 | Rinsing solution, method of treating substrate, and method of manufacturing semiconductor device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-05-26 | — | — | US | disclosed |
| CN-122094826-A | Method for producing laminate and method for separating CO2 | — | 2026-05-26 | — | — | CN | disclosed |
| CN-122094772-A | Method for producing laminated film, and method for separating CO2 | — | 2026-05-26 | — | — | CN | disclosed |
| US-12595564-B2 | Method of forming surface treatment film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-04-07 | — | — | US | disclosed |
| US-12575346-B2 | Method for treating surface of substrate, method for region-selectively producing film on surface of substrate, and surface treatment agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-03-10 | — | — | US | disclosed |
| US-12570860-B2 | Two-component treatment agent, treatment method for making metal surface antibacterial and antibacterial treatment agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-03-10 | — | — | US | disclosed |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | CENTRAL GLASS CO LTD (JP) | 2026-01-15 | — | — | US | disclosed |
| US-20250343040-A1 | SUBSTRATE PROCESSING METHOD AND SUBSTRATE PRODUCTION METHOD | CENTRAL GLASS CO LTD (JP) | 2025-11-06 | — | — | US | disclosed |
| US-20120083561-A1 | ADHESIVE COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-04-05 | — | — | US | disclosed |
| US-20120031443-A1 | CLEANING DEVICE, CLEANING METHOD, AND COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-02-09 | — | — | US | disclosed |
| US-8097397-B2 | Material for formation of protective film, method for formation of photoresist pattern, and solution for washing/removal of protective film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-01-17 | — | — | US | disclosed |
| US-8058220-B2 | Cleaning liquid for lithography and a cleaning method using it for photoexposure devices | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-11-15 | — | — | US | disclosed |
| US-20110195190-A1 | SURFACE TREATMENT LIQUID, SURFACE TREATMENT METHOD, HYDROPHOBILIZATION METHOD, AND HYDROPHOBILIZED SUBSTRATE | TOKYO OHKA KOGYO CO., LTD (JP) | 2011-08-11 | — | — | US | disclosed |
| US-20110061678-A1 | Cleaning liquid for lithography and a cleaning method using it for photoexposure devices | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-03-17 | — | — | US | disclosed |
| US-20100086879-A1 | MATERIAL FOR FORMATION OF PROTECTIVE FILM, METHOD FOR FORMATION OF PHOTORESIST PATTERN, AND SOLUTION FOR WASHING/REMOVAL OF PROTECTIVE FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| US-20100086799-A1 | Removal method, adhesive agent for substrate, and laminate including substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-04-08 | — | — | US | disclosed |
| EP-1962327-A1 | WASHING LIQUID FOR PHOTOLITHOGRAPHY, AND METHOD FOR WASHING EXPOSURE DEVICE USING THE SAME | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-08-27 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12637638-B2 | Rinsing solution, method of treating substrate, and method of manufacturing semiconductor device | DSTN, CFL1, TLN1 | CCR2 2234/4885KCNA5 3028/4885SLC6A2 3548/4885 |
| US-12570860-B2 | Two-component treatment agent, treatment method for making metal surface antibacterial and antibacterial treatment agent | SARS1, ACE2, EIF2AK2 | CCR2 2406/4885KCNA5 3629/4885SLC6A2 3690/4885 |
| US-12595564-B2 | Method of forming surface treatment film | TWF2, IKZF3, HAO2 | CCR2 4414/4885KCNA5 2851/4885SLC6A2 96/4885 |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | ESPL1, SMS, SGMS1 | CCR2 4003/4885KCNA5 3970/4885SLC6A2 1889/4885 |
| US-12575346-B2 | Method for treating surface of substrate, method for region-selectively producing film on surface of substrate, and surface treatment agent | SI, SIK1, BAK1 | CCR2 3772/4885KCNA5 2177/4885SLC6A2 2436/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.