SCHEMBL4082792

SCHEMBL4082792

[SiH3]OC(CCBr)(c1ccccc1)c1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 1/20 0.33
LMNA P02545 1/20 0.33
SIGMAR1 Q99720 1/20 0.33
KIF11 P52732 2/20 0.32
MAPK1 P28482 1/20 0.32
TSHR P16473 3/20 0.31
ALDH1A1 P00352 3/20 0.31
KCNN4 O15554 1/20 0.31
TRPA1 O75762 1/20 0.31
TAAR1 Q96RJ0 1/20 0.30
ALOX15 P16050 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4076790 0.83 MAPK1 (0.34) TDP1LMNASIGMAR1KIF11MAPK1
SCHEMBL3341600 0.83 TDP1 (0.36) TDP1LMNASIGMAR1KIF11MAPK1
Dimethylamine SCHEMBL15769565 0.82 KCNN4 (0.34) LMNASIGMAR1KIF11MAPK1KCNN4
SCHEMBL3482436 0.79 KCNN4 (0.38) LMNASIGMAR1KIF11MAPK1TSHR
SCHEMBL4078047 0.79 ALDH1A1 (0.34) KIF11MAPK1TSHRALDH1A1KCNN4
SCHEMBL4079897 0.79 TSHR (0.36) KIF11MAPK1TSHRALDH1A1KCNN4
SCHEMBL10612623 0.76 KIF11 (0.52) KIF11TAAR1
SCHEMBL3481756 0.76 LTA4H (0.38) SIGMAR1KIF11MAPK1KCNN4
SCHEMBL3415673 0.76 KIF11 (0.38) LMNASIGMAR1KIF11MAPK1KCNN4
SCHEMBL28661137 0.75 ALDH1A1 (0.37) MAPK1TSHRALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1705207-B1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR CORP (JP) 2012-10-24 EP disclosed
US-7528207-B2 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2009-05-05 US disclosed
US-20070021580-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-25 US disclosed
US-20070015892-A1 Method for producing polymer, polymer, composition for forming insulating film, method for producing insulating film, and insulating film JSR CORPORATION (JP) 2007-01-18 US disclosed
EP-1705206-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed
EP-1705207-A1 METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM JSR Corporation (JP) 2006-09-27 EP disclosed