Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HTR6 | P50406 | 2/20 | 0.39 |
| ▸ | PSIP1 | O75475 | 1/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 2/20 | 0.39 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.38 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.37 |
| ▸ | CA2 | P00918 | 3/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | CA1 | P00915 | 2/20 | 0.37 |
| ▸ | CA5A | P35218 | 2/20 | 0.37 |
| ▸ | CA9 | Q16790 | 2/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | CA12 | O43570 | 1/20 | 0.37 |
| ▸ | CA3 | P07451 | 1/20 | 0.37 |
| ▸ | CA4 | P22748 | 1/20 | 0.37 |
| ▸ | CA6 | P23280 | 1/20 | 0.37 |
| ▸ | CA7 | P43166 | 1/20 | 0.37 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.37 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.37 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36458 | 0.84 | HTR6 (0.39) | HTR6PSIP1HSD11B1APOBEC3GCA2 | |
| SCHEMBL2024663 | 0.84 | CA1 (0.38) | HTR6PSIP1HSD11B1APOBEC3GPTGS2 | |
| SCHEMBL270030 | 0.83 | CA1 (0.41) | HSD11B1CA2CA1HSD17B10MEN1 | |
| SCHEMBL8847449 | 0.79 | HTR6 (0.42) | HTR6PSIP1HSD11B1APOBEC3GCA2 | |
| SCHEMBL37033 | 0.79 | HTR6 (0.42) | HTR6PSIP1HSD11B1APOBEC3GCA2 | |
| SCHEMBL444803 | 0.78 | PTGS2 (0.44) | HSD11B1PTGS2 | |
| SCHEMBL5410134 | 0.77 | PSIP1 (0.45) | HTR6PSIP1HSD11B1APOBEC3GCA2 | |
| SCHEMBL3136958 | 0.74 | HTT (0.45) | HSD11B1CA2ALDH1A1CA1CA5A | |
| SCHEMBL36148 | 0.74 | HTT (0.45) | HSD11B1CA2ALDH1A1CA1CA5A | |
| SCHEMBL387181 | 0.72 | HSD11B1 (0.50) | HSD11B1CA2ALDH1A1CA1NR1H3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 451 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4714988-A1 | FLUORINE-CONTAINING POLYMER, COMPOSITION FOR FORMING FLUORINE-CONTAINING RESIN FILM, FLUORINE-CONTAINING RESIN FILM, COMPOSITION FOR FORMING RESIST PATTERN, METHOD FOR FORMING RESIST PATTERN, COMPOSITION FOR FORMING RESIST UPPER LAYER FILM, METHOD FOR DECOMPOSING FLUORINE-CONTAINING POLYMER, FLUORINE-CONTAINING POLYMERIZABLE MONOMER, COMPOUND, AND METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMERIZABLE MONOMER | Central Glass Company, Limited (JP) | 2026-03-25 | — | — | EP | disclosed |
| EP-4714990-A1 | COPOLYMER, POLYMER FOR WATER-REPELLENT AGENT, COMPOSITION FOR FORMING WATER-REPELLENT FILM, RESIN FILM, AND METHOD FOR FORMING RESIST PATTERN | Central Glass Company, Limited (JP) | 2026-03-25 | — | — | EP | disclosed |
| WO-2024248136-A1 | COPOLYMER, POLYMER FOR WATER-REPELLENT AGENT, COMPOSITION FOR FORMING WATER-REPELLENT FILM, RESIN FILM, AND METHOD FOR FORMING RESIST PATTERN | セントラル硝子株式会社 | 2024-12-05 | — | — | WO | disclosed |
| WO-2024248135-A1 | FLUORINE-CONTAINING POLYMER, COMPOSITION FOR FORMING FLUORINE-CONTAINING RESIN FILM, FLUORINE-CONTAINING RESIN FILM, COMPOSITION FOR FORMING RESIST PATTERN, METHOD FOR FORMING RESIST PATTERN, COMPOSITION FOR FORMING RESIST UPPER LAYER FILM, METHOD FOR DECOMPOSING FLUORINE-CONTAINING POLYMER, FLUORINE-CONTAINING POLYMERIZABLE MONOMER, COMPOUND, AND METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMERIZABLE MONOMER | セントラル硝子株式会社 | 2024-12-05 | — | — | WO | disclosed |
| EP-2584409-B1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, POLYMERIC COMPOUND, AND COMPOUND | TOKYO OHKA KOGYO CO LTD (JP) | 2021-04-28 | — | — | EP | disclosed |
| EP-2060600-B1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO LTD (JP) | 2017-12-27 | — | — | EP | disclosed |
| EP-2093213-B1 | Positive resist composition and method of forming a resist pattern using the same | TOKYO OHKA KOGYO CO LTD (JP) | 2017-10-04 | — | — | EP | disclosed |
| US-9618843-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-9618842-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-11 | — | — | US | disclosed |
| US-9494860-B2 | Resist composition, method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-11-15 | — | — | US | disclosed |
| US-20070065748-A1 | Resin for photoresist composition, photoresist composition and method for forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-03-22 | — | — | US | disclosed |
| US-7172848-B2 | Chemical amplification type positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2007-02-06 | — | — | US | disclosed |
| EP-1736485-A1 | POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-12-27 | — | — | EP | disclosed |
| US-20060194140-A1 | Chemical amplification type positive resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-08-31 | — | — | US | disclosed |
| US-20060183876-A1 | Resin for resist positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO, C., LTD. (JP) | 2006-08-17 | — | — | US | disclosed |
| EP-1655315-A1 | RESIN FOR RESIST, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2006-05-10 | — | — | EP | disclosed |
| EP-1602977-A1 | Positive resist composition and compound used therein | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-12-07 | — | — | EP | disclosed |
| US-20050266340-A1 | Positive resist composition and compound used therein | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-12-01 | — | — | US | disclosed |
| US-20050227172-A1 | Process for producing photoresist composition, filtration device, application device, and photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2005-10-13 | — | — | US | disclosed |
| US-20050042540-A1 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. | 2005-02-24 | — | — | US | disclosed |