Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PREP | P48147 | 4/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | CA12 | O43570 | 4/20 | 0.41 |
| ▸ | CA1 | P00915 | 4/20 | 0.41 |
| ▸ | CA9 | Q16790 | 4/20 | 0.41 |
| ▸ | CHRNB2 | P17787 | 1/20 | 0.38 |
| ▸ | CHRNB4 | P30926 | 1/20 | 0.38 |
| ▸ | CHRNA3 | P32297 | 1/20 | 0.38 |
| ▸ | CHRNA7 | P36544 | 1/20 | 0.38 |
| ▸ | CHRNA4 | P43681 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.33 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.32 |
| ▸ | HSP90AB1 | P08238 | 1/20 | 0.32 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7130529 | 0.85 | ALDH1A1 (0.42) | PREPALDH1A1CHRNB2CHRNB4CHRNA3 | |
| SCHEMBL7189378 | 0.84 | CA12 (0.46) | PREPALDH1A1CA12CA1CA9 | |
| SCHEMBL6763899 | 0.83 | PREP (0.53) | PREPALDH1A1CA12CA1CA9 | |
| SCHEMBL7133196 | 0.82 | ALDH1A1 (0.44) | ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL36605 | 0.81 | CA12 (0.38) | PREPCA12CA1CA9HSP90AA1 | |
| SCHEMBL896879 | 0.81 | ALDH1A1 (0.50) | PREPALDH1A1CA12CA1CA9 | |
| SCHEMBL410818 | 0.79 | ALDH1A1 (0.50) | ALDH1A1CHRNB2CHRNB4CHRNA3CHRNA7 | |
| SCHEMBL413810 | 0.79 | HSP90AA1 (0.47) | PREPALDH1A1CA12CA1CA9 | |
| SCHEMBL4024641 | 0.78 | KMT2A (0.49) | PREPALDH1A1CA12CA1CA9 | |
| SCHEMBL9843159 | 0.78 | CA12 (0.42) | PREPALDH1A1CA12CA1CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 461 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4735933-A2 | SURFACE ACTIVATED CHEMICAL VAPOR DEPOSITION AND USES THEREOF | Gvd Corporation (US) | 2026-05-06 | — | — | EP | claimed |
| WO-2025007115-A2 | SURFACE ACTIVATED CHEMICAL VAPOR DEPOSITION AND USES THEREOF | GVD CORPORATION (US) | 2025-01-02 | — | — | WO | claimed |
| EP-3532898-B1 | METHOD FOR PRODUCING A POLYMER BY NITROXYL-CONTROLLED POLYMERISATION, AND POLYMER | FRAUNHOFER GES FORSCHUNG (DE) | 2024-07-31 | — | — | EP | claimed |
| WO-2024066848-A1 | HIGH-MOLECULAR-WEIGHT NARROW-DISTRIBUTION PHS RESIN, AND PREPARATION METHOD THEREFOR AND USE THEREOF | 上海八亿时空先进材料有限公司 | 2024-04-04 | — | — | WO | claimed |
| CN-117777337-A | Preparation method of poly (p-hydroxystyrene) | 上海八亿时空先进材料有限公司 | 2024-03-29 | — | — | CN | claimed |
| EP-3861039-B1 | HYDROGEL COMPOSITIONS | OPHTALMIC CIE (FR) | 2023-11-01 | — | — | EP | claimed |
| CN-115260348-B | PHS resin with high molecular weight and narrow distribution, and preparation method and application thereof | 上海八亿时空先进材料有限公司 | 2023-08-15 | — | — | CN | claimed |
| CN-115260348-A | High molecular weight and narrow distribution PHS resin and preparation method and application thereof | 北京八亿时空液晶科技股份有限公司 | 2022-11-01 | — | — | CN | claimed |
| US-11292859-B2 | Method for producing a polymer by nitroxyl-controlled polymerisation, and polymer | FRAUNHOFER-GESELLSCHAFT ZURFÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) | 2022-04-05 | — | — | US | claimed |
| US-20210332174-A1 | HYDROGEL COMPOSITIONS | OPHTALMIC COMPAGNIE (FR) | 2021-10-28 | — | — | US | claimed |
| EP-3861039-A1 | HYDROGEL COMPOSITIONS | Ophtalmic Compagnie (FR) | 2021-08-11 | — | — | EP | claimed |
| CN-113166340-A | Hydrogel composition | 眼科公司 | 2021-07-23 | — | — | CN | claimed |
| WO-2020070423-A1 | HYDROGEL COMPOSITIONS | OPHTALMIC COMPAGNIE (FR) | 2020-04-09 | — | — | WO | claimed |
| US-20180083190-A1 | METHOD OF FORMING MULTIPLE NANOPATTERNS AND METHOD OF MANUFACTURING ORGANIC SOLAR CELL USING THE SAME | POSTECH ACADEMY-INDUSTRY FOUNDATION (KR) | 2018-03-22 | — | — | US | claimed |
| EP-2350340-A1 | SYSTEMS, APPARATUS AND METHODS FOR COATING THE INTERIOR OF A CONTAINER USING A PHOTOLYSIS AND/OR THERMAL CHEMICAL VAPOR DEPOSITION PROCESS | Becton, Dickinson and Company (US) | 2011-08-03 | — | — | EP | claimed |
| WO-2010034004-A1 | SYSTEMS, APPARATUS AND METHODS FOR COATING THE INTERIOR OF A CONTAINER USING A PHOTOLYSIS AND/OR THERMAL CHEMICAL VAPOR DEPOSITION PROCESS | BECTON, DICKINSON AND COMPANY (US) | 2010-03-25 | — | — | WO | claimed |
| US-7141355-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-11-28 | — | — | US | claimed |
| US-6136874-A | Microporous polymeric foams made with silicon or germanium based monomers | THE PROCTER & GAMBLE COMPANY (US) | 2000-10-24 | — | — | US | claimed |
| US-5663260-A | Hyperbranched copolymers from AB monomers and C monomers | CORNELL RESEARCH FOUNDATION, INC. (US) | 1997-09-02 | — | — | US | claimed |
| EP-4735933-A2 | SURFACE ACTIVATED CHEMICAL VAPOR DEPOSITION AND USES THEREOF | Gvd Corporation (US) | 2026-05-06 | — | — | EP | disclosed |
| EP-4653503-A1 | METHOD FOR PRODUCING PIGMENT COMPOSITION, PIGMENT COMPOSITION, INK, AND PRINTED MATERIAL | DIC Corporation (JP) | 2025-11-26 | — | — | EP | disclosed |
| US-20250340749-A1 | AQUEOUS PIGMENT DISPERSION AND PRODUCTION METHOD FOR AQUEOUS PIGMENT DISPERSION | DIC CORPORATION (JP) | 2025-11-06 | — | — | US | disclosed |
| US-12460039-B2 | Block copolymer intermediate, block copolymer, and methods for producing same | DIC CORPORATION (JP) | 2025-11-04 | — | — | US | disclosed |
| US-12331148-B2 | Block copolymer intermediate, block copolymer, and production methods for same | DIC CORPORATION (JP) | 2025-06-17 | — | — | US | disclosed |
| CN-119874973-A | Preparation method of multi-component styrene resin for photoresist | 苏州威迈芯材半导体有限公司 | 2025-04-25 | — | — | CN | disclosed |
| EP-3674372-B1 | INK, INK FOR INK-JET RECORDING, PRINTED MATTER, AND METHOD FOR PRODUCING PRINTED MATTER | DAINIPPON INK & CHEMICALS (JP) | 2025-04-23 | — | — | EP | disclosed |
| US-12264251-B2 | Ink, ink for ink-jet recording, printed matter, and method for producing printed matter | DIC CORPORATION (JP) | 2025-04-01 | — | — | US | disclosed |
| CN-116134193-B | Water-resistant paper, and wrapping paper or container using same | DIC油墨株式会社 | 2025-03-28 | — | — | CN | disclosed |
| WO-2025048577-A1 | METHOD FOR MANUFACTURING FUNCTIONAL POLYMERS BY ANIONIC POLYMERIZATION | 주식회사 이엔에프테크놀로지 | 2025-03-06 | — | — | WO | disclosed |
| WO-2025047654-A1 | POSITIVE PHOTOSENSITIVE PIGMENT COMPOSITION, CURED FILM CONTAINING CURED PRODUCT THEREOF, ORGANIC EL DISPLAY DEVICE, ELECTRONIC APPARATUS, AND BLOCK COPOLYMER | 東レ株式会社 | 2025-03-06 | — | — | WO | disclosed |
| US-12187855-B2 | Intermediate for block copolymer, block copolymer, and methods for producing same | DIC CORPORATION (JP) | 2025-01-07 | — | — | US | disclosed |
| WO-2025007115-A2 | SURFACE ACTIVATED CHEMICAL VAPOR DEPOSITION AND USES THEREOF | GVD CORPORATION (US) | 2025-01-02 | — | — | WO | disclosed |
| US-12180322-B2 | Protein adsorption preventing agent, protein adsorption preventing film, and medical tool using same | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2024-12-31 | — | — | US | disclosed |
| EP-4047059-B1 | METHOD FOR PRODUCING PIGMENT COMPOSITION | DAINIPPON INK & CHEMICALS (JP) | 2024-12-11 | — | — | EP | disclosed |
| EP-4063458-B1 | METHOD FOR PRODUCING PIGMENT COMPOSITION | DAINIPPON INK & CHEMICALS (JP) | 2024-09-18 | — | — | EP | disclosed |
| WO-2024185534-A1 | METHOD FOR PRODUCING PIGMENT COMPOSITION, PIGMENT COMPOSITION, INK, AND PRINTED MATERIAL | DIC株式会社 | 2024-09-12 | — | — | WO | disclosed |
| US-20240302742-A1 | PHOTORESIST COMPOSITION INCLUDING PHOTOSENSITIVE POLYMER AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-09-12 | — | — | US | disclosed |
| CN-118625595-A | Nonionic non-chemically amplified photoresist composition comprising photosensitive polymer and method of manufacturing integrated circuit device | 三星电子株式会社 | 2024-09-10 | — | — | CN | disclosed |
| EP-3532898-B1 | METHOD FOR PRODUCING A POLYMER BY NITROXYL-CONTROLLED POLYMERISATION, AND POLYMER | FRAUNHOFER GES FORSCHUNG (DE) | 2024-07-31 | — | — | EP | disclosed |
| US-12024573-B2 | Method for manufacturing polymer and flow-type reaction system for manufacturing polymer | FUJIFILM CORPORATION (JP) | 2024-07-02 | — | — | US | disclosed |
| WO-2024066848-A1 | HIGH-MOLECULAR-WEIGHT NARROW-DISTRIBUTION PHS RESIN, AND PREPARATION METHOD THEREFOR AND USE THEREOF | 上海八亿时空先进材料有限公司 | 2024-04-04 | — | — | WO | disclosed |
| CN-117777337-A | Preparation method of poly (p-hydroxystyrene) | 上海八亿时空先进材料有限公司 | 2024-03-29 | — | — | CN | disclosed |
| CN-117777337-A | Preparation method of poly (p-hydroxystyrene) | 上海八亿时空先进材料有限公司 | 2024-03-29 | — | — | CN | disclosed |
| US-20240076514-A1 | INK, INK FOR INK-JET RECORDING, PRINTED MATTER, AND METHOD FOR PRODUCING PRINTED MATTER | DIC CORPORATION (JP) | 2024-03-07 | — | — | US | disclosed |
| CN-117362556-A | Method for producing block polymer | 日产化学株式会社 | 2024-01-09 | — | — | CN | disclosed |
| WO-2024004665-A1 | MOISTURE-PROOF PAPER AND PACKAGE | ＤＩＣグラフィックス株式会社 | 2024-01-04 | — | — | WO | disclosed |
| EP-3689915-B1 | METHOD FOR MANUFACTURING POLYMER, AND FLOW-TYPE REACTION SYSTEM FOR MANUFACTURING POLYMER | FUJIFILM CORP (JP) | 2023-12-06 | — | — | EP | disclosed |
| EP-3988581-B1 | INTERMEDIATE FOR BLOCK COPOLYMER, BLOCK COPOLYMER, AND METHODS FOR PRODUCING SAME | DAINIPPON INK & CHEMICALS (JP) | 2023-12-06 | — | — | EP | disclosed |
| EP-3861039-B1 | HYDROGEL COMPOSITIONS | OPHTALMIC CIE (FR) | 2023-11-01 | — | — | EP | disclosed |
| CN-116761718-A | Laminate and package using laminate | DIC油墨株式会社 | 2023-09-15 | — | — | CN | disclosed |
| CN-114341279-B | Aqueous liquid printing ink, printed matter and laminate | DIC油墨株式会社 | 2023-09-12 | — | — | CN | disclosed |
| CN-116723940-A | Printed matter and laminate | DIC株式会社 | 2023-09-08 | — | — | CN | disclosed |
| CN-115260348-B | PHS resin with high molecular weight and narrow distribution, and preparation method and application thereof | 上海八亿时空先进材料有限公司 | 2023-08-15 | — | — | CN | disclosed |
| WO-2023145936-A1 | STYRENIC POLYMER PRODUCTION METHOD | 富士フイルム和光純薬株式会社 | 2023-08-03 | — | — | WO | disclosed |
| US-11654096-B2 | Xyloside derivatives of resveratrol for use thereof in cosmetics | L'OREAL (FR) | 2023-05-23 | — | — | US | disclosed |
| CN-116134193-A | Water-resistant paper, and wrapping paper or container using same | DIC油墨株式会社 | 2023-05-16 | — | — | CN | disclosed |
| EP-3647389-B1 | PROTEIN ADSORPTION PREVENTING AGENT, PROTEIN ADSORPTION PREVENTING FILM, AND MEDICAL TOOL USING SAME | MARUZEN PETROCHEM CO LTD (JP) | 2023-05-10 | — | — | EP | disclosed |
| CN-112867739-B | Method for producing polymer and flow reaction system for producing polymer | 富士胶片株式会社 | 2023-05-02 | — | — | CN | disclosed |
| US-20230093202-A1 | BLOCK COPOLYMER INTERMEDIATE, BLOCK COPOLYMER, AND METHODS FOR PRODUCING SAME | DIC CORPORATION (JP) | 2023-03-23 | — | — | US | disclosed |
| CN-110100205-B | Method for producing polymers by controlled nitrogen-oxygen polymerization and polymers | 弗劳恩霍夫应用研究促进协会 | 2022-12-30 | — | — | CN | disclosed |
| WO-2022270321-A1 | LAYERED BODY, AND WRAPPING PAPER OR CONTAINER USING SUCH LAYERED BODY | ＤＩＣグラフィックス株式会社 | 2022-12-29 | — | — | WO | disclosed |
| CN-115464145-A | Metal nanocluster and preparation method and application thereof | 中国科学院上海有机化学研究所 | 2022-12-13 | — | — | CN | disclosed |
| US-11518898-B2 | Ink set and method for producing printed article | DIC CORPORATION (JP) | 2022-12-06 | — | — | US | disclosed |
| US-20220372324-A1 | METHOD FOR PRODUCING PIGMENT COMPOSITION | DIC CORPORATION (JP) | 2022-11-24 | — | — | US | disclosed |
| US-20220363910-A1 | METHOD FOR PRODUCING PIGMENT COMPOSITION | DIC CORPORATION (JP) | 2022-11-17 | — | — | US | disclosed |
| EP-4089125-A1 | INTERMEDIATE FOR BLOCK COPOLYMER, BLOCK COPOLYMER, AND METHODS FOR PRODUCING SAME | DIC Corporation (JP) | 2022-11-16 | — | — | EP | disclosed |
| CN-115260348-A | High molecular weight and narrow distribution PHS resin and preparation method and application thereof | 北京八亿时空液晶科技股份有限公司 | 2022-11-01 | — | — | CN | disclosed |
| CN-112739783-B | Water-based ink, ink for inkjet recording, printed matter, and method for producing printed matter | DIC株式会社 | 2022-11-01 | — | — | CN | disclosed |
| EP-4063458-A1 | METHOD FOR PRODUCING PIGMENT COMPOSITION | DIC Corporation (JP) | 2022-09-28 | — | — | EP | disclosed |
| CN-108137937-B | Printing agent, method for producing printing agent, and fabric | DIC株式会社 | 2022-09-13 | — | — | CN | disclosed |
| WO-2022185935-A1 | PRINTED MATTER AND LAMINATE | DIC株式会社 | 2022-09-09 | — | — | WO | disclosed |
| WO-2022185932-A1 | LAMINATE BODY, AND PACKAGE USING LAMINATE | ＤＩＣグラフィックス株式会社 | 2022-09-09 | — | — | WO | disclosed |
| EP-4047059-A1 | METHOD FOR PRODUCING PIGMENT COMPOSITION | DIC Corporation (JP) | 2022-08-24 | — | — | EP | disclosed |
| US-11421122-B2 | Aqueous ink, ink for inkjet recording, printed material and method for producing printed material | DIC CORPORATION (JP) | 2022-08-23 | — | — | US | disclosed |
| CN-112585013-B | Method for producing inkjet printed material | DIC株式会社 | 2022-08-02 | — | — | CN | disclosed |
| US-20220234904-A1 | HOLLOW NANO-PARTICLE, HOLLOW SILICA NANO-PARTICLE, AND PRODUCTION METHOD FOR SAME | DIC CORPORATION (JP) | 2022-07-28 | — | — | US | disclosed |
| US-20220235167-A1 | BLOCK COPOLYMER INTERMEDIATE, BLOCK COPOLYMER, AND PRODUCTION METHODS FOR SAME | DIC CORPORATION (JP) | 2022-07-28 | — | — | US | disclosed |
| US-20220227945-A1 | INTERMEDIATE FOR BLOCK COPOLYMER, BLOCK COPOLYMER, AND METHODS FOR PRODUCING SAME | DIC CORPORATION (JP) | 2022-07-21 | — | — | US | disclosed |
| US-11385543-B2 | Enviromentally stable, thick film, chemically amplified resist | MERCK PATENT GMBH (DE) | 2022-07-12 | — | — | US | disclosed |
| CN-114667325-A | Method for producing pigment composition | DIC株式会社 | 2022-06-24 | — | — | CN | disclosed |
| WO-2022124102-A1 | AQUEOUS COATING MATERIAL, LAYERED PRODUCT, AND PACKAGING OBJECT OR CONTAINER | 国立研究開発法人物質・材料研究機構 | 2022-06-16 | — | — | WO | disclosed |
| US-11332551-B2 | Method for manufacturing polymer and flow-type reaction system for manufacturing polymer | FUJIFILM CORPORATION (JP) | 2022-05-17 | — | — | US | disclosed |
| CN-114450358-A | Method for producing pigment composition | DIC株式会社 | 2022-05-06 | — | — | CN | disclosed |
| CN-113597372-B | Composition for paper exterior coating and adhesive, and coated article, water-and oil-resistant paper laminate, paper straw, and paper tableware using the same | DIC油墨株式会社 | 2022-05-06 | — | — | CN | disclosed |
| EP-3988581-A1 | INTERMEDIATE FOR BLOCK COPOLYMER, BLOCK COPOLYMER, AND METHODS FOR PRODUCING SAME | DIC Corporation (JP) | 2022-04-27 | — | — | EP | disclosed |
| EP-3988593-A1 | BLOCK COPOLYMER INTERMEDIATE, BLOCK COPOLYMER, AND PRODUCTION METHODS FOR SAME | DIC Corporation (JP) | 2022-04-27 | — | — | EP | disclosed |
| CN-114341279-A | Aqueous liquid printing ink, printed matter, and laminate | DIC油墨株式会社 | 2022-04-12 | — | — | CN | disclosed |
| WO-2022071261-A1 | WATERPROOF PAPER, AND WRAPPING PAPER OR CONTAINER USING SAID WATERPROOF PAPER | ＤＩＣグラフィックス株式会社 | 2022-04-07 | — | — | WO | disclosed |
| US-11292859-B2 | Method for producing a polymer by nitroxyl-controlled polymerisation, and polymer | FRAUNHOFER-GESELLSCHAFT ZURFÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V. (DE) | 2022-04-05 | — | — | US | disclosed |
| EP-3505206-B1 | A SYSTEM FOR COATING THE INTERIOR OF A CONTAINER USING A PHOTOLYSIS CHEMICAL VAPOR DEPOSITION PROCESS | BECTON DICKINSON CO (US) | 2022-03-16 | — | — | EP | disclosed |
| US-11242414-B2 | Method for manufacturing polymer and flow-type reaction system for manufacturing polymer | FUJIFILM CORPORATION (JP) | 2022-02-08 | — | — | US | disclosed |
| WO-2021261260-A1 | COATING AGENT FOR PAPER BASE MATERIALS OR PLASTIC BASE MATERIALS, AND PAPER BASE MATERIAL, PLASTIC BASE MAERIAL, CONTAINER AND PACKAGING MATERIAL, EACH HAVING COATING LAYER OF SAID COATING AGENT | DIC株式会社 | 2021-12-30 | — | — | WO | disclosed |
| US-20210395546-A1 | AQUEOUS INK, INK FOR INKJET RECORDING, PRINTED MATERIAL AND METHOD FOR PRODUCING PRINTED MATERIAL | DIC CORPORATION (JP) | 2021-12-23 | — | — | US | disclosed |
| US-20210387149-A1 | METHOD FOR PRODUCING AQUEOUS PIGMENT DISPERSION | DIC CORPORATION (JP) | 2021-12-16 | — | — | US | disclosed |
| US-20210340287-A1 | POLYMER PRODUCTION METHOD | NISSAN CHEMICAL CORPORATION (JP) | 2021-11-04 | — | — | US | disclosed |
| CN-113597372-A | Composition for paper exterior coating and adhesive, and coated article, water-and oil-resistant paper laminate, paper straw, and paper tableware using the same | DIC油墨株式会社 | 2021-11-02 | — | — | CN | disclosed |
| US-20210332174-A1 | HYDROGEL COMPOSITIONS | OPHTALMIC COMPAGNIE (FR) | 2021-10-28 | — | — | US | disclosed |
| EP-3861039-A1 | HYDROGEL COMPOSITIONS | Ophtalmic Compagnie (FR) | 2021-08-11 | — | — | EP | disclosed |
| EP-3858870-A1 | POLYMER PRODUCING METHOD, AND A FLOW-TYPE REACTION SYSTEM FOR PRODUCING POLYMER | FUJIFILM Corporation (JP) | 2021-08-04 | — | — | EP | disclosed |
| CN-109563195-B | Process for producing branched modified rubber, rubber composition comprising branched modified rubber prepared by the process, and use thereof | 公共型股份公司希布尔控股 | 2021-07-27 | — | — | CN | disclosed |
| CN-113166340-A | Hydrogel composition | 眼科公司 | 2021-07-23 | — | — | CN | disclosed |
| US-20210222025-A1 | PRIMER FOR INK-JET PRINTING INKS, RECORDING MEDIUM, AND PRINTING SYSTEM | DIC CORPORATION (JP) | 2021-07-22 | — | — | US | disclosed |
| US-11066571-B2 | Pattern forming method, under coating agent, and laminate | Oji Holdings Corporation (JP) | 2021-07-20 | — | — | US | disclosed |
| WO-2021140860-A1 | INTERMEDIATE FOR BLOCK COPOLYMER, BLOCK COPOLYMER, AND METHODS FOR PRODUCING SAME | DIC株式会社 | 2021-07-15 | — | — | WO | disclosed |
| US-11059912-B2 | Polymer production method | NISSAN CHEMICAL CORPORATION (JP) | 2021-07-13 | — | — | US | disclosed |
| US-20210206886-A1 | METHOD FOR MANUFACTURING POLYMER AND FLOW-TYPE REACTION SYSTEM FOR MANUFACTURING POLYMER | FUJIFILM CORPORATION (JP) | 2021-07-08 | — | — | US | disclosed |
| US-11021630-B2 | Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2021-06-01 | — | — | US | disclosed |
| CN-107849383-B | Aqueous pigment dispersion, aqueous green ink for inkjet recording, or aqueous red ink for inkjet recording | DIC株式会社 | 2021-05-14 | — | — | CN | disclosed |
| US-20210139721-A1 | METHOD FOR PRODUCING PIGMENT-KNEADED PRODUCT AND AQUEOUS PIGMENT DISPERSION | DIC CORPORATION (JP) | 2021-05-13 | — | — | US | disclosed |
| CN-112739783-A | Water-based ink, ink for inkjet recording, printed matter, and method for producing printed matter | DIC株式会社 | 2021-04-30 | — | — | CN | disclosed |
| US-20210122867-A1 | PROTEIN ADSORPTION PREVENTING AGENT, PROTEIN ADSORPTION PREVENTING FILM, AND MEDICAL TOOL USING SAME | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2021-04-29 | — | — | US | disclosed |
| WO-2021075333-A1 | METHOD FOR PRODUCING PIGMENT COMPOSITION | DIC株式会社 | 2021-04-22 | — | — | WO | disclosed |
| EP-3805324-A1 | METHOD FOR PRODUCING PIGMENT-KNEADED PRODUCT AND AQUEOUS PIGMENT DISPERSION | DIC Corporation (JP) | 2021-04-14 | — | — | EP | disclosed |
| WO-2021065643-A1 | AQUEOUS PIGMENT DISPERSION, PIGMENT KNEADED PRODUCT, AND PRODUCTION METHOD FOR AQUEOUS PIGMENT DISPERSION | DIC株式会社 | 2021-04-08 | — | — | WO | disclosed |
| WO-2021060125-A1 | AQUEOUS LIQUID PRINTING INK, PRINTED MATTER, AND LAMINATE | ＤＩＣグラフィックス株式会社 | 2021-04-01 | — | — | WO | disclosed |
| EP-3249097-B1 | PRINTED FABRIC CLOTH ARTICLE | DAINIPPON INK & CHEMICALS (JP) | 2021-03-31 | — | — | EP | disclosed |
| CN-112585013-A | Method for producing inkjet printed material | DIC株式会社 | 2021-03-30 | — | — | CN | disclosed |
| EP-3366727-B1 | PRINTING AGENT, PRINTING AGENT PRODUCTION METHOD, AND CLOTH ARTICLE | DAINIPPON INK & CHEMICALS (JP) | 2021-02-24 | — | — | EP | disclosed |
| CN-107849167-B | Method for producing polymer for electronic material and polymer for electronic material obtained by the production method | 丸善石油化学株式会社 | 2021-02-23 | — | — | CN | disclosed |
| EP-3778656-A1 | METHOD FOR PRODUCING POLYMER AND FLOW-TYPE REACTION SYSTEM FOR PRODUCING POLYMER | FUJIFILM Corporation (JP) | 2021-02-17 | — | — | EP | disclosed |
| US-10913873-B2 | Block copolymers with high flory-huggins interaction parameters for block copolymer lithography | WISCONSIN ALUMNI RESEARCH FOUNDATION (US) | 2021-02-09 | — | — | US | disclosed |
| CN-112334317-A | Primer for ink jet printing ink, recording medium, and printing system | DIC株式会社 | 2021-02-05 | — | — | CN | disclosed |
| US-20210002504-A1 | INK SET AND METHOD FOR PRODUCING PRINTED ARTICLE | DIC CORPORATION (JP) | 2021-01-07 | — | — | US | disclosed |
| WO-2020255726-A1 | INTERMEDIATE FOR BLOCK COPOLYMER, BLOCK COPOLYMER, AND METHODS FOR PRODUCING SAME | DIC株式会社 | 2020-12-24 | — | — | WO | disclosed |
| WO-2020255727-A1 | BLOCK COPOLYMER INTERMEDIATE, BLOCK COPOLYMER, AND PRODUCTION METHODS FOR SAME | DIC株式会社 | 2020-12-24 | — | — | WO | disclosed |
| CN-112074575-A | Pigment kneaded product and method for producing aqueous pigment dispersion | DIC株式会社 | 2020-12-11 | — | — | CN | disclosed |
| US-20200369793-A1 | METHOD FOR MANUFACTURING POLYMER AND FLOW-TYPE REACTION SYSTEM FOR MANUFACTURING POLYMER | FUJIFILM CORPORATION (JP) | 2020-11-26 | — | — | US | disclosed |
| EP-3497519-B1 | ENVIROMENTALLY STABLE, THICK FILM, CHEMICALLY AMPLIFIED RESIST | MERCK PATENT GMBH (DE) | 2020-11-25 | — | — | EP | disclosed |
| WO-2020203346-A1 | COMPOSITION FOR OVERCOATING AND FOR ADHESIVE AGENT THAT ARE USED ON PAPER, AND COATED ARTICLE, WATER-RESISTANT OIL-RESISTANT PAPER LAMINATE, PAPER STRAW, AND PAPER TABLEWARE IN WHICH COMPOSITION IS USED | ＤＩＣグラフィックス株式会社 | 2020-10-08 | — | — | WO | disclosed |
| CN-107208365-B | Printing agent, fabric and method for producing printing agent | DIC株式会社 | 2020-09-15 | — | — | CN | disclosed |
| CN-107148456-B | Water-based ink for ink-jet recording | DIC株式会社 | 2020-08-28 | — | — | CN | disclosed |
| EP-3689915-A1 | METHOD FOR PRODUCING POLYMER, AND FLOW REACTION SYSTEM FOR PRODUCING POLYMER | FUJIFILM Corporation (JP) | 2020-08-05 | — | — | EP | disclosed |
| US-20200239722-A1 | AQUEOUS PIGMENT DISPERSION AND METHOD FOR PRODUCING AQUEOUS PIGMENT DISPERSION | DIC CORPORATION (JP) | 2020-07-30 | — | — | US | disclosed |
| US-20200223949-A1 | METHOD FOR MANUFACTURING POLYMER AND FLOW-TYPE REACTION SYSTEM FOR MANUFACTURING POLYMER | FUJIFILM CORPORATION (JP) | 2020-07-16 | — | — | US | disclosed |
| CN-111417688-A | Ink set and method for producing printed matter | DIC株式会社 | 2020-07-14 | — | — | CN | disclosed |
| CN-111378166-A | Energy absorption method based on dynamic polymer | 翁秋梅 | 2020-07-07 | — | — | CN | disclosed |
| CN-111378162-A | Energy absorption method based on dynamic polymer | 翁秋梅 | 2020-07-07 | — | — | CN | disclosed |
| EP-3674372-A1 | INK, INK FOR INK-JET RECORDING, PRINTED MATTER, AND METHOD FOR PRODUCING PRINTED MATTER | DIC Corporation (JP) | 2020-07-01 | — | — | EP | disclosed |
| US-20200199390-A1 | INK, INK FOR INK-JET RECORDING, PRINTED MATTER, AND METHOD FOR PRODUCING PRINTED MATTER | DIC CORPORATION (JP) | 2020-06-25 | — | — | US | disclosed |
| EP-3670543-A2 | POLYMER PRODUCTION METHOD | Nissan Chemical Corporation (JP) | 2020-06-24 | — | — | EP | disclosed |
| US-20200183278-A1 | ENVIROMENTALLY STABLE, THICK FILM, CHEMICALLY AMPLIFIED RESIST | AZ ELECTRONIC MATERIALS S.À R.L. (LU) | 2020-06-11 | — | — | US | disclosed |
| US-10647864-B2 | Aqueous pigment dispersion, aqueous green ink for inkjet recording, and aqueous red ink for inkjet recording | DIC CORPORATION (JP) | 2020-05-12 | — | — | US | disclosed |
| EP-3647389-A1 | PROTEIN ADSORPTION PREVENTING AGENT, PROTEIN ADSORPTION PREVENTING FILM, AND MEDICAL TOOL USING SAME | Maruzen Petrochemical Co., Ltd. (JP) | 2020-05-06 | — | — | EP | disclosed |
| CN-111032795-A | Ink, ink for inkjet recording, printed matter, and method for producing printed matter | DIC株式会社 | 2020-04-17 | — | — | CN | disclosed |
| WO-2020070423-A1 | HYDROGEL COMPOSITIONS | OPHTALMIC COMPAGNIE (FR) | 2020-04-09 | — | — | WO | disclosed |
| WO-2020066561-A1 | POLYMER PRODUCING METHOD, AND A FLOW-TYPE REACTION SYSTEM FOR PRODUCING POLYMER | 富士フイルム株式会社 | 2020-04-02 | — | — | WO | disclosed |
| WO-2020054567-A1 | METHOD FOR MANUFACTURING INKJET PRINT | DIC株式会社 | 2020-03-19 | — | — | WO | disclosed |
| EP-2440403-B1 | AIRCRAFT TRANSPARENCY WITH SOLAR CONTROL PROPERTIES | PPG IND OHIO INC (US) | 2020-03-11 | — | — | EP | disclosed |
| US-20200048491-A1 | PATTERN FORMING METHOD, UNDER COATING AGENT, AND LAMINATE | Oji Holdings Corporation (JP) | 2020-02-13 | — | — | US | disclosed |
| EP-3597709-A1 | AQUEOUS PIGMENT DISPERSION AND METHOD FOR PRODUCING AQUEOUS PIGMENT DISPERSION | DIC Corporation (JP) | 2020-01-22 | — | — | EP | disclosed |
| WO-2020012969-A1 | PRIMER FOR INKJET PRINTING INKS, RECORD-RECEIVING MEDIUM AND PRINTING SYSTEM | DIC株式会社 | 2020-01-16 | — | — | WO | disclosed |
| CN-106125503-B | Copolymer formulations for directed self-assembly, methods of manufacture thereof, and articles comprising the same | 陶氏环球技术有限公司 | 2020-01-10 | — | — | CN | disclosed |
| EP-2203783-B1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2019-11-13 | — | — | EP | disclosed |
| WO-2019188749-A1 | METHOD FOR PRODUCING POLYMER AND FLOW-TYPE REACTION SYSTEM FOR PRODUCING POLYMER | 富士フイルム株式会社 | 2019-10-03 | — | — | WO | disclosed |
| US-10418184-B2 | Solid electrolytic capacitor | TOKIN CORPORATION (JP) | 2019-09-17 | — | — | US | disclosed |
| EP-3536363-A1 | SYSTEMS FOR COATING THE INTERIOR OF A CONTAINER | Becton, Dickinson and Company (US) | 2019-09-11 | — | — | EP | disclosed |
| EP-3533524-A1 | PATTERN FORMING METHOD, BASE AGENT AND LAMINATE | Oji Holdings Corporation (JP) | 2019-09-04 | — | — | EP | disclosed |
| US-20190248927-A1 | METHOD FOR PRODUCING A POLYMER BY NITROXYL-CONTROLLED POLYMERISATION, AND POLYMER | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. (DE) | 2019-08-15 | — | — | US | disclosed |
| US-10351727-B2 | Copolymer formulation for directed self-assembly, methods of manufacture thereof and articles comprising the same | DOW GLOBAL TECHNOLOGIES LLC (US) | 2019-07-16 | — | — | US | disclosed |
| EP-3235884-B1 | WATER-BASED INK FOR INK JET RECORDING | DAINIPPON INK & CHEMICALS (JP) | 2019-07-03 | — | — | EP | disclosed |
| EP-3505206-A1 | A SYSTEM FOR COATING THE INTERIOR OF A CONTAINER USING A PHOTOLYSIS CHEMICAL VAPOR DEPOSITION PROCESS | Becton, Dickinson and Company (US) | 2019-07-03 | — | — | EP | disclosed |
| EP-3497519-A1 | ENVIROMENTALLY STABLE, THICK FILM, CHEMICALLY AMPLIFIED RESIST | Ridgefield Acquisition (LU) | 2019-06-19 | — | — | EP | disclosed |
| WO-2019078080-A1 | LEVELING AGENT, INK COMPOSITION FOR FORMATION OF FUNCTIONAL LAYER, AND LAYERED ELECTRONIC COMPONENT | DIC株式会社 | 2019-04-25 | — | — | WO | disclosed |
| US-10246536-B2 | Functionalized highly syndiotactic polystyrene and preparation method thereof | CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) | 2019-04-02 | — | — | US | disclosed |
| EP-2350340-B1 | SYSTEMS FOR COATING THE INTERIOR OF A CONTAINER | BECTON DICKINSON CO (US) | 2019-03-27 | — | — | EP | disclosed |
| EP-3070132-B1 | AQUEOUS PIGMENT DISPERSION AND AQUEOUS INK FOR INKJET RECORDING USE | DAINIPPON INK & CHEMICALS (JP) | 2019-01-09 | — | — | EP | disclosed |
| US-10167410-B2 | Using chemical vapor deposited films to control domain orientation in block copolymer thin films | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2019-01-01 | — | — | US | disclosed |
| US-10167410-B2 | Using chemical vapor deposited films to control domain orientation in block copolymer thin films | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2019-01-01 | — | — | US | disclosed |
| US-20180362791-A1 | AQUEOUS INK SET FOR INKJET RECORDING AND INKJET RECORDING METHOD | DIC CORPORATION (JP) | 2018-12-20 | — | — | US | disclosed |
| US-20180355198-A1 | AQUEOUS PIGMENT DISPERSION, AQUEOUS GREEN INK FOR INKJET RECORDING, AND AQUEOUS RED INK FOR INKJET RECORDING | DIC CORPORATION (JP) | 2018-12-13 | — | — | US | disclosed |
| EP-3412690-A1 | POLYMER PRODUCTION METHOD | Nissan Chemical Corporation (JP) | 2018-12-12 | — | — | EP | disclosed |
| EP-3031838-B1 | METHOD FOR PRODUCING BLOCK COPOLYMER, AND BLOCK COPOLYMER OBTAINED USING SAME | DAINIPPON INK & CHEMICALS (JP) | 2018-12-05 | — | — | EP | disclosed |
| US-10139724-B2 | Anhydride copolymer top coats for orientation control of thin film block copolymers | BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEM (US) | 2018-11-27 | — | — | US | disclosed |
| EP-3392319-A1 | AQUEOUS INK SET FOR INK JET RECORDING AND INK JET RECORDING METHOD | DIC Corporation (JP) | 2018-10-24 | — | — | EP | disclosed |
| US-20180282943-A1 | PRINTING AGENT, PRINTING AGENT PRODUCTION METHOD, AND CLOTH ARTICLE | DIC CORPORATION (JP) | 2018-10-04 | — | — | US | disclosed |
| EP-3366727-A1 | PRINTING AGENT, PRINTING AGENT PRODUCTION METHOD, AND CLOTH ARTICLE | DIC Corporation (JP) | 2018-08-29 | — | — | EP | disclosed |
| US-10035921-B2 | Water-based ink for inkjet recording | DIC CORPORATION (JP) | 2018-07-31 | — | — | US | disclosed |
| US-10011713-B2 | Copolymer formulation for directed self assembly, methods of manufacture thereof and articles comprising the same | DOW GLOBAL TECHNOLOGIES LLC (US) | 2018-07-03 | — | — | US | disclosed |
| US-9975984-B2 | Method for producing block copolymer, and block copolymer obtained using same | DIC CORPORATION (JP) | 2018-05-22 | — | — | US | disclosed |
| US-9951236-B2 | Aqueous pigment dispersion and aqueous ink for inkjet recording use | DIC CORPORATION (JP) | 2018-04-24 | — | — | US | disclosed |
| US-20180083190-A1 | METHOD OF FORMING MULTIPLE NANOPATTERNS AND METHOD OF MANUFACTURING ORGANIC SOLAR CELL USING THE SAME | POSTECH ACADEMY-INDUSTRY FOUNDATION (KR) | 2018-03-22 | — | — | US | disclosed |
| US-20180016743-A1 | PRINTING AGENT, PRINTED FABRIC, AND METHOD FOR PRODUCING PRINTING AGENT | DIC CORPORATION (JP) | 2018-01-18 | — | — | US | disclosed |
| US-9834700-B2 | Polylactide/silicon-containing block copolymers for nanolithography | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2017-12-05 | — | — | US | disclosed |
| US-9834700-B2 | Polylactide/silicon-containing block copolymers for nanolithography | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2017-12-05 | — | — | US | disclosed |
| US-9834700-B2 | Polylactide/silicon-containing block copolymers for nanolithography | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2017-12-05 | — | — | US | disclosed |
| US-20170342288-A1 | WATER-BASED INK FOR INKJET RECORDING | DIC CORPORATION (JP) | 2017-11-30 | — | — | US | disclosed |
| EP-3249097-A1 | PRINTING AGENT, FABRIC CLOTH ARTICLE, AND METHOD FOR MANUFACTURING PRINTING AGENT | DIC Corporation (JP) | 2017-11-29 | — | — | EP | disclosed |
| US-20170335036-A1 | FUNCTIONALIZED HIGHLY SYNDIOTACTIC POLYSTYRENE AND PREPARATION METHOD THEREOF | CHANGCHUN INSTITUTE OF APPLIED CHEMISTRY CHINESE ACADEMY OF SCIENCES (CN) | 2017-11-23 | — | — | US | disclosed |
| EP-3235884-A1 | WATER-BASED INK FOR INK JET RECORDING | DIC Corporation (JP) | 2017-10-25 | — | — | EP | disclosed |
| US-9765214-B2 | Copolymer formulation for directed self-assembly, methods of manufacture thereof and articles comprising the same | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA (US) | 2017-09-19 | — | — | US | disclosed |
| US-9738814-B2 | Method of controlling block copolymer characteristics and articles manufactured therefrom | DOW GLOBAL TECHNOLOGIES LLC (US) | 2017-08-22 | — | — | US | disclosed |
| US-20170166664-A1 | METHOD FOR MANUFACTURING POLYMER COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-15 | — | — | US | disclosed |
| US-20170166664-A1 | METHOD FOR MANUFACTURING POLYMER COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-06-15 | — | — | US | disclosed |
| US-20170121555-A1 | BLOCK COPOLYMERS WITH HIGH FLORY-HUGGINS INTERACTION PARAMETERS FOR BLOCK COPOLYMER LITHOGRAPHY | WISCONSIN ALUMNI RESEARCH FOUNDATION | 2017-05-04 | — | — | US | disclosed |
| EP-2448900-B1 | ANIONIC POLYMERIZATION INITIATORS AND PROCESSES | BRIDGESTONE CORP (JP) | 2017-04-26 | — | — | EP | disclosed |
| US-9598553-B2 | Metal nanoparticle composite and method for producing the same | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2017-03-21 | — | — | US | disclosed |
| US-9587136-B2 | Block copolymers with high Flory-Huggins interaction parameters for block copolymer lithography | WISCONSIN ALUMNI RESEARCH FOUNDATION (US) | 2017-03-07 | — | — | US | disclosed |
| US-9484248-B2 | Patternable dielectric film structure with improved lithography and method of fabricating same | GLOBALFOUNDRIES INC. (KY) | 2016-11-01 | — | — | US | disclosed |
| US-20160293337-A1 | SOLID ELECTROLYTIC CAPACITOR | NEC TOKIN CORPORATION (JP) | 2016-10-06 | — | — | US | disclosed |
| EP-3070132-A1 | AQUEOUS PIGMENT DISPERSION AND AQUEOUS INK FOR INKJET RECORDING USE | DIC Corporation (JP) | 2016-09-21 | — | — | EP | disclosed |
| US-20160264799-A1 | AQUEOUS PIGMENT DISPERSION AND AQUEOUS INK FOR INKJET RECORDING USE | DIC CORPORATION (JP) | 2016-09-15 | — | — | US | disclosed |
| US-20160251539-A1 | COPOLYMER FORMULATION FOR DIRECTED SELF-ASSEMBLY, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA | 2016-09-01 | — | — | US | disclosed |
| US-20160251508-A1 | COPOLYMER FORMULATION FOR DIRECTED SELF-ASSEMBLY, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME | THE REGENTS OF THE UNIVERSITY OF CALIFORNIA | 2016-09-01 | — | — | US | disclosed |
| US-20160229943-A1 | METHOD FOR PRODUCING BLOCK COPOLYMER, AND BLOCK COPOLYMER OBTAINED USING SAME | DIC CORPORATION (JP) | 2016-08-11 | — | — | US | disclosed |
| US-20160186003-A1 | COPOLYMER FORMULATION FOR DIRECTED SELF ASSEMBLY, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-06-30 | — | — | US | disclosed |
| US-20160186004-A1 | COPOLYMER FORMULATION FOR DIRECTED SELF ASSEMBLY, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-06-30 | — | — | US | disclosed |
| EP-3031838-A1 | METHOD FOR PRODUCING BLOCK COPOLYMER, AND BLOCK COPOLYMER OBTAINED USING SAME | DIC Corporation (JP) | 2016-06-15 | — | — | EP | disclosed |
| US-9365660-B2 | Anionic polymerization initiators and processes | BRIDGESTONE CORPORATION (JP) | 2016-06-14 | — | — | US | disclosed |
| US-20160129128-A1 | ANTIBODY DRUG CONJUGATES | PHARMA MAR, S.A. (ES) | 2016-05-12 | — | — | US | disclosed |
| EP-1551885-B1 | PROCESS TO MODIFY POLYMERIC MATERIALS | 3M INNOVATIVE PROPERTIES CO (US) | 2016-02-17 | — | — | EP | disclosed |
| US-20160016860-A1 | METHODS FOR PHOSPHINE OXIDE REDUCTION IN CATALYTIC WITTIG REACTIONS | DUBLIN CITY UNIVERSITY (IE) | 2016-01-21 | — | — | US | disclosed |
| EP-2970347-A1 | METHODS FOR PHOSPHINE OXIDE REDUCTION IN CATALYTIC WITTIG REACTIONS | Dublin City University (IE) | 2016-01-20 | — | — | EP | disclosed |
| US-20150370159-A1 | Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM | 2015-12-24 | — | — | US | disclosed |
| US-20150370159-A1 | Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM | 2015-12-24 | — | — | US | disclosed |
| US-20150370159-A1 | Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM | 2015-12-24 | — | — | US | disclosed |
| US-20150353763-A1 | Polylactide/Silicon-Containing Block Copolymers for Nanolithography | BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEM | 2015-12-10 | — | — | US | disclosed |
| US-20150353763-A1 | Polylactide/Silicon-Containing Block Copolymers for Nanolithography | BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEM | 2015-12-10 | — | — | US | disclosed |
| US-20150353763-A1 | Polylactide/Silicon-Containing Block Copolymers for Nanolithography | BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEM | 2015-12-10 | — | — | US | disclosed |
| US-9157008-B2 | Anhydride copolymer top coats for orientation control of thin film block copolymers | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2015-10-13 | — | — | US | disclosed |
| US-9157008-B2 | Anhydride copolymer top coats for orientation control of thin film block copolymers | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2015-10-13 | — | — | US | disclosed |
| US-9157008-B2 | Anhydride copolymer top coats for orientation control of thin film block copolymers | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2015-10-13 | — | — | US | disclosed |
| US-9120117-B2 | Polylactide/silicon-containing block copolymers for nanolithography | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2015-09-01 | — | — | US | disclosed |
| US-9120117-B2 | Polylactide/silicon-containing block copolymers for nanolithography | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2015-09-01 | — | — | US | disclosed |
| US-9120117-B2 | Polylactide/silicon-containing block copolymers for nanolithography | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2015-09-01 | — | — | US | disclosed |
| US-20150232689-A1 | Using Chemical Vapor Deposited Films to Control Domain Orientation in Block Copolymer Thin Films | BOARD OF REGENTS,THE UNIVERSITY OF TEXAS SYSTEM | 2015-08-20 | — | — | US | disclosed |
| US-20150232689-A1 | Using Chemical Vapor Deposited Films to Control Domain Orientation in Block Copolymer Thin Films | BOARD OF REGENTS,THE UNIVERSITY OF TEXAS SYSTEM | 2015-08-20 | — | — | US | disclosed |
| US-20150232689-A1 | Using Chemical Vapor Deposited Films to Control Domain Orientation in Block Copolymer Thin Films | BOARD OF REGENTS,THE UNIVERSITY OF TEXAS SYSTEM | 2015-08-20 | — | — | US | disclosed |
| US-20150184024-A1 | METHOD OF CONTROLLING BLOCK COPOLYMER CHARACTERISTICS AND ARTICLES MANUFACTURED THEREFROM | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2015-07-02 | — | — | US | disclosed |
| US-9040121-B2 | Using chemical vapor deposited films to control domain orientation in block copolymer thin films | BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEM (US) | 2015-05-26 | — | — | US | disclosed |
| US-9040121-B2 | Using chemical vapor deposited films to control domain orientation in block copolymer thin films | BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEM (US) | 2015-05-26 | — | — | US | disclosed |
| US-9040121-B2 | Using chemical vapor deposited films to control domain orientation in block copolymer thin films | BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEM (US) | 2015-05-26 | — | — | US | disclosed |
| US-9035462-B2 | Airgap-containing interconnect structure with patternable low-k material and method of fabricating | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-05-19 | — | — | US | disclosed |
| US-9029067-B2 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | JSR CORPORATION (JP) | 2015-05-12 | — | — | US | disclosed |
| US-20150099109-A1 | BLOCK COPOLYMERS WITH HIGH FLORY-HUGGINS INTERACTION PARAMETERS FOR BLOCK COPOLYMER LITHOGRAPHY | WISCONSIN ALUMNI RESEARCH FOUNDATION (US) | 2015-04-09 | — | — | US | disclosed |
| US-8992512-B2 | Medical devices having polymeric regions with copolymers containing hydrocarbon and heteroatom-containing monomeric species | BOSTON SCIENTIFIC SCIMED, INC. (US) | 2015-03-31 | — | — | US | disclosed |
| US-20150004547-A1 | RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD FOR FORMATION OF RESIST PATTERN BY USING THE SAME | JSR CORPORATION (JP) | 2015-01-01 | — | — | US | disclosed |
| US-8916978-B2 | Interconnect structure and method of fabricating | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-12-23 | — | — | US | disclosed |
| US-20140363773-A1 | PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2014-12-11 | — | — | US | disclosed |
| US-8877429-B2 | Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same | JSR CORPORATION (JP) | 2014-11-04 | — | — | US | disclosed |
| US-8853856-B2 | Methodology for evaluation of electrical characteristics of carbon nanotubes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-10-07 | — | — | US | disclosed |
| WO-2014140353-A1 | METHODS FOR PHOSPHINE OXIDE REDUCTION IN CATALYTIC WITTIG REACTIONS | DUBLIN CITY UNIVERSITY (IE) | 2014-09-18 | — | — | WO | disclosed |
| US-8828749-B2 | Methodology for evaluation of electrical characteristics of carbon nanotubes | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-09-09 | — | — | US | disclosed |
| EP-2729508-A1 | OLIGOSACCHARIDE/SILICON-CONTAINING BLOCK COPOLYMERS FOR LITHOGRAPHY APPLICATIONS | Board Of Regents, The University Of Texas System (US) | 2014-05-14 | — | — | EP | disclosed |
| US-8715918-B2 | Thick film resists | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2014-05-06 | — | — | US | disclosed |
| US-8715901-B2 | Resin composition for forming fine pattern and method for forming fine pattern | JSR CORPORATION (JP) | 2014-05-06 | — | — | US | disclosed |
| EP-2467431-B1 | POLYSILOXANE COATING WITH HYBRID COPOLYMER | PPG IND OHIO INC (US) | 2014-04-30 | — | — | EP | disclosed |
| US-20140058028-A1 | METAL NANOPARTICLE COMPOSITE AND METHOD FOR PRODUCING THE SAME | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2014-02-27 | — | — | US | disclosed |
| US-8659115-B2 | Airgap-containing interconnect structure with improved patternable low-K material and method of fabricating | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-02-25 | — | — | US | disclosed |
| US-8618663-B2 | Patternable dielectric film structure with improved lithography and method of fabricating same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-12-31 | — | — | US | disclosed |
| EP-2669029-A1 | METALLIC NANOPARTICLE COMPOSITE AND METHOD FOR PRODUCING THE SAME | Maruzen Petrochemical Co., Ltd. (JP) | 2013-12-04 | — | — | EP | disclosed |
| US-20130280497-A1 | Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers | BOARD OF REGENTSTHE UNIVERSITY OF TEXAS SYSTEM | 2013-10-24 | — | — | US | disclosed |
| US-20130280497-A1 | Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers | BOARD OF REGENTSTHE UNIVERSITY OF TEXAS SYSTEM | 2013-10-24 | — | — | US | disclosed |
| US-20130280497-A1 | Anhydride Copolymer Top Coats for Orientation Control of Thin Film Block Copolymers | BOARD OF REGENTSTHE UNIVERSITY OF TEXAS SYSTEM | 2013-10-24 | — | — | US | disclosed |
| US-20130266780-A1 | Polylactide/Silicon-containing Block Copolymers for Nanolithography | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM | 2013-10-10 | — | — | US | disclosed |
| US-20130266780-A1 | Polylactide/Silicon-containing Block Copolymers for Nanolithography | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM | 2013-10-10 | — | — | US | disclosed |
| US-20130266780-A1 | Polylactide/Silicon-containing Block Copolymers for Nanolithography | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM | 2013-10-10 | — | — | US | disclosed |
| EP-1757990-B1 | Resin compositions for miniaturizing the resin pattern spaces or holes and method for miniaturizing the resin pattern spaces or holes using the same | JSR CORP (JP) | 2013-10-09 | — | — | EP | disclosed |
| US-8519540-B2 | Self-aligned dual damascene BEOL structures with patternable low- K material and methods of forming same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-08-27 | — | — | US | disclosed |
| WO-2013119820-A1 | POLYACTIDE/SILICON-CONTAINING BLOCK COPOLYMERS FOR NANOLITHOGRAPHY | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2013-08-15 | — | — | WO | disclosed |
| WO-2013119811-A1 | USING CHEMICAL VAPOR DEPOSITED FILMS TO CONTROL DOMAIN ORIENTATION IN BLOCK COPOLYMER THIN FILMS | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2013-08-15 | — | — | WO | disclosed |
| US-20130207272-A1 | AIRGAP-CONTAINING INTERCONNECT STRUCTURE WITH PATTERNABLE LOW-K MATERIAL AND METHOD OF FABRICATING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-08-15 | — | — | US | disclosed |
| WO-2013119811-A1 | USING CHEMICAL VAPOR DEPOSITED FILMS TO CONTROL DOMAIN ORIENTATION IN BLOCK COPOLYMER THIN FILMS | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2013-08-15 | — | — | WO | disclosed |
| US-20130209757-A1 | USING CHEMICAL VAPOR DEPOSITED FILMS TO CONTROL DOMAIN ORIENTATION IN BLOCK COPOLYMER THIN FILMS | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM | 2013-08-15 | — | — | US | disclosed |
| WO-2013119820-A1 | POLYACTIDE/SILICON-CONTAINING BLOCK COPOLYMERS FOR NANOLITHOGRAPHY | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2013-08-15 | — | — | WO | disclosed |
| US-20130209757-A1 | USING CHEMICAL VAPOR DEPOSITED FILMS TO CONTROL DOMAIN ORIENTATION IN BLOCK COPOLYMER THIN FILMS | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM | 2013-08-15 | — | — | US | disclosed |
| US-20130211344-A1 | MEDICAL COMPONENTS HAVING COATED SURFACES EXHIBITING LOW FRICTION AND/OR LOW GAS/LIQUID PERMEABILITY | BECTON DICKINSON FRANCE (FR) | 2013-08-15 | — | — | US | disclosed |
| US-20130209757-A1 | USING CHEMICAL VAPOR DEPOSITED FILMS TO CONTROL DOMAIN ORIENTATION IN BLOCK COPOLYMER THIN FILMS | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM | 2013-08-15 | — | — | US | disclosed |
| WO-2013119832-A1 | ANHYDRIDE COPOLYMER TOP COATS FOR ORIENTATION CONTROL OF THIN FILM BLOCK COPOLYMERS | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2013-08-15 | — | — | WO | disclosed |
| WO-2013119832-A1 | ANHYDRIDE COPOLYMER TOP COATS FOR ORIENTATION CONTROL OF THIN FILM BLOCK COPOLYMERS | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2013-08-15 | — | — | WO | disclosed |
| US-8507631-B2 | Polysiloxane coating with hybrid copolymer | PPG INDUSTRIES OHIO, INC. (US) | 2013-08-13 | — | — | US | disclosed |
| US-20130196019-A1 | SILICON-CONTAINING BLOCK CO-POLYMERS, METHODS FOR SYNTHESIS AND USE | NATIONAL UNIVERSITY OF SINAPORE (SG) | 2013-08-01 | — | — | US | disclosed |
| US-20130196019-A1 | SILICON-CONTAINING BLOCK CO-POLYMERS, METHODS FOR SYNTHESIS AND USE | NATIONAL UNIVERSITY OF SINAPORE (SG) | 2013-08-01 | — | — | US | disclosed |
| US-8492483-B2 | ABA triblock copolymer and process for producing the same | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2013-07-23 | — | — | US | disclosed |
| US-8487411-B2 | Multiple patterning using improved patternable low-κ dielectric materials | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-07-16 | — | — | US | disclosed |
| US-8476758-B2 | Airgap-containing interconnect structure with patternable low-k material and method of fabricating | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-07-02 | — | — | US | disclosed |
| US-8475667-B2 | Method of patterning photosensitive material on a substrate containing a latent acid generator | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-07-02 | — | — | US | disclosed |
| US-8461039-B2 | Patternable low-K dielectric interconnect structure with a graded cap layer and method of fabrication | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-06-11 | — | — | US | disclosed |
| US-8450854-B2 | Interconnect structures with patternable low-k dielectrics and method of fabricating same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-05-28 | — | — | US | disclosed |
| US-8415248-B2 | Self-aligned dual damascene BEOL structures with patternable low-k material and methods of forming same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-04-09 | — | — | US | disclosed |
| US-20130022785-A1 | OLIGOSACCHARIDE/SILICON-CONTAINING BLOCK COPOLYMERS FOR LITHOGRAPHY APPLICATIONS | Board of Regents, The University of the Texas System | 2013-01-24 | — | — | US | disclosed |
| US-20130022785-A1 | OLIGOSACCHARIDE/SILICON-CONTAINING BLOCK COPOLYMERS FOR LITHOGRAPHY APPLICATIONS | Board of Regents, The University of the Texas System | 2013-01-24 | — | — | US | disclosed |
| US-20130009323-A1 | INTERCONNECT STRUCTURE AND METHOD OF FABRICATING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-01-10 | — | — | US | disclosed |
| US-20130009312-A1 | INTERCONNECT STRUCTURE FABRICATED WITHOUT DRY PLASMA ETCH PROCESSING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-01-10 | — | — | US | disclosed |
| WO-2012177839-A1 | OLIGOSACCHARIDE/SILICON-CONTAINING BLOCK COPOLYMERS FOR LITHOGRAPHY APPLICATIONS | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2012-12-27 | — | — | WO | disclosed |
| US-8334203-B2 | Interconnect structure and method of fabricating | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-12-18 | — | — | US | disclosed |
| US-20120301980-A1 | METHODOLOGY FOR EVALUATION OF ELECTRICAL CHARACTERISTICS OF CARBON NANOTUBES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-29 | — | — | US | disclosed |
| EP-1853327-B1 | MEDICAL DEVICES HAVING POLYMERIC REGIONS WITH COPOLYMERS CONTAINING HYDROCARBON AND HETEROATOM-CONTAINING MONOMERIC SPECIES | BOSTON SCIENT LTD (BB) | 2012-11-07 | — | — | EP | disclosed |
| EP-2519291-A1 | MEDICAL COMPONENTS HAVING COATED SURFACES EXHIBITING LOW FRICTION AND/OR LOW GAS/LIQUID PERMEABILITY | Becton Dickinson France (FR) | 2012-11-07 | — | — | EP | disclosed |
| US-8298937-B2 | Interconnect structure fabricated without dry plasma etch processing | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-10-30 | — | — | US | disclosed |
| US-20120252204-A1 | PATTERNABLE LOW-K DIELECTRIC INTERCONNECT STRUCTURE WITH A GRADED CAP LAYER AND METHOD OF FABRICATION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-10-04 | — | — | US | disclosed |
| US-20120244478-A1 | RESIST PATTERN FORMATION METHOD | JSR CORPORATION (JP) | 2012-09-27 | — | — | US | disclosed |
| US-20120231622-A1 | SELF-ALIGNED DUAL DAMASCENE BEOL STRUCTURES WITH PATTERNABLE LOW- K MATERIAL AND METHODS OF FORMING SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-09-13 | — | — | US | disclosed |
| US-20120228775-A1 | AIRGAP-CONTAINING INTERCONNECT STRUCTURE WITH PATTERNABLE LOW-K MATERIAL AND METHOD OF FABRICATING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-09-13 | — | — | US | disclosed |
| US-20120178869-A1 | POLYSILOXANE COATING WITH HYBRID COPOLYMER | PPG INDUSTRIES OHIO, INC. (US) | 2012-07-12 | — | — | US | disclosed |
| US-20120172535-A1 | VINYL ETHER-BASED STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2012-07-05 | — | — | US | disclosed |
| US-8211624-B2 | Method for pattern formation and resin composition for use in the method | JSR CORPORATION (JP) | 2012-07-03 | — | — | US | disclosed |
| US-20120161296-A1 | MULTIPLE PATTERNING USING IMPROVED PATTERNABLE LOW-k DIELECTRIC MATERIALS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-06-28 | — | — | US | disclosed |
| EP-2467431-A1 | POLYSILOXANE COATING WITH HYBRID COPOLYMER | PPG Industries Ohio, Inc. (US) | 2012-06-27 | — | — | EP | disclosed |
| US-8206894-B2 | Resist pattern-forming method and resist pattern miniaturizing resin composition | JSR CORPORATION (JP) | 2012-06-26 | — | — | US | disclosed |
| US-20120156621-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2012-06-21 | — | — | US | disclosed |
| EP-2465885-A1 | VINYL ETHER-BASED STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF | Maruzen Petrochemical Co., Ltd. (JP) | 2012-06-20 | — | — | EP | disclosed |
| US-8202783-B2 | Patternable low-k dielectric interconnect structure with a graded cap layer and method of fabrication | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-06-19 | — | — | US | disclosed |
| US-20120136128-A1 | ANIONIC POLYMERIZATION INITIATORS AND PROCESSES | BRIDGESTONE CORPORATION (JP) | 2012-05-31 | — | — | US | disclosed |
| EP-2448900-A2 | ANIONIC POLYMERIZATION INITIATORS AND PROCESSES | Bridgestone Corporation (JP) | 2012-05-09 | — | — | EP | disclosed |
| US-8163658-B2 | Multiple patterning using improved patternable low-k dielectric materials | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-04-24 | — | — | US | disclosed |
| EP-2440403-A2 | AIRCRAFT TRANSPARENCY WITH SOLAR CONTROL PROPERTIES | PPG Industries Ohio, Inc. (US) | 2012-04-18 | — | — | EP | disclosed |
| US-20120083523-A1 | MEDICAL DEVICES HAVING POLYMERIC REGIONS WITH COPOLYMERS CONTAINING HYDROCARBON AND HETEROATOM-CONTAINING MONOMERIC SPECIES | BOSTON SCIENTIFIC SCIMED, INC. (US) | 2012-04-05 | — | — | US | disclosed |
| US-8148487-B2 | Polysiloxane coating with hybrid copolymer | PPG INDUSTRIES OHIO, INC. (US) | 2012-04-03 | — | — | US | disclosed |
| EP-2412737-A1 | VINYL ETHER-BASED STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF | Maruzen Petrochemical CO., LTD. (JP) | 2012-02-01 | — | — | EP | disclosed |
| US-20120022219-A1 | VINYL ETHER-BASED STAR POLYMER AND PROCESS FOR PRODUCTION THEREOF | MARUZEN PETROCHEMICAL CO., LTD | 2012-01-26 | — | — | US | disclosed |
| US-8101711-B2 | Process to modify polymeric materials and resulting compositions | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2012-01-24 | — | — | US | disclosed |
| US-8084862-B2 | Interconnect structures with patternable low-k dielectrics and method of fabricating same | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-12-27 | — | — | US | disclosed |
| US-20110309507-A1 | METHODOLOGY FOR EVALUATION OF ELECTRICAL CHARACTERISTICS OF CARBON NANOTUBES | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 2011-12-22 | — | — | US | disclosed |
| US-20110304053-A1 | INTERCONNECT STRUCTURE AND METHOD OF FABRICATING | INTERNATIONAL BUSINESS MACHINES CORP. (US) | 2011-12-15 | — | — | US | disclosed |
| US-8075906-B2 | Medical devices having polymeric regions with copolymers containing hydrocarbon and heteroatom-containing monomeric species | BOSTON SCIENTIFIC SCIMED, INC. (US) | 2011-12-13 | — | — | US | disclosed |
| EP-2378362-A1 | RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING THE SAME | JSR Corporation (JP) | 2011-10-19 | — | — | EP | disclosed |
| US-8034874-B2 | Medical devices having polymeric regions that contain fluorocarbon-containing block copolymers | BOSTON SCIENTIFIC SCIMED, INC. (US) | 2011-10-11 | — | — | US | disclosed |
| WO-2011116223-A1 | SILICON-CONTAINING BLOCK CO-POLYMERS, METHODS FOR SYNTHESIS AND USE | BOARD OF REGENTS THE UNIVERSITY OF TEXAS SYSTEM (US) | 2011-09-22 | — | — | WO | disclosed |
| US-20110223544-A1 | RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING THE SAME | JSR CORPORATION (JP) | 2011-09-15 | — | — | US | disclosed |
| US-20110186537-A1 | Systems, Apparatus and Methods for Coating the Interior of a Container Using a Photolysis and/or Thermal Chemical Vapor Deposition Process | BECTON, DICKINSON AND COMPANY (US) | 2011-08-04 | — | — | US | disclosed |
| EP-2350340-A1 | SYSTEMS, APPARATUS AND METHODS FOR COATING THE INTERIOR OF A CONTAINER USING A PHOTOLYSIS AND/OR THERMAL CHEMICAL VAPOR DEPOSITION PROCESS | Becton, Dickinson and Company (US) | 2011-08-03 | — | — | EP | disclosed |
| WO-2011080543-A1 | MEDICAL COMPONENTS HAVING COATED SURFACES EXHIBITING LOW FRICTION AND/OR LOW GAS/LIQUID PERMEABILITY | BECTON DICKINSON FRANCE (FR) | 2011-07-07 | — | — | WO | disclosed |
| US-20110123936-A1 | RESIST PATTERN COATING AGENT AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2011-05-26 | — | — | US | disclosed |
| US-7944055-B2 | Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-05-17 | — | — | US | disclosed |
| US-20110111349-A1 | RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD FOR FORMATION OF RESIST PATTERN BY USING THE SAME | JSR CORPORATION (JP) | 2011-05-12 | — | — | US | disclosed |
| WO-2011038995-A1 | PATTERNABLE LOW-K DIELECTRIC INTERCONNECT STRUCTURE WITH A GRADED CAP LAYER AND METHOD OF FABRICATION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-04-07 | — | — | WO | disclosed |
| US-20110074044-A1 | PATTERNABLE LOW-K DIELECTRIC INTERCONNECT STRUCTURE WITH A GRADED CAP LAYER AND METHOD OF FABRICATION | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-03-31 | — | — | US | disclosed |
| WO-2011022172-A1 | POLYSILOXANE COATING WITH HYBRID COPOLYMER | PPG INDUSTRIES OHIO, INC. (US) | 2011-02-24 | — | — | WO | disclosed |
| US-20110046337-A1 | POLYSILOXANE COATING WITH HYBRID COPOLYMER | PPG INDUSTRIES OHIO, INC. (US) | 2011-02-24 | — | — | US | disclosed |
| US-20110042790-A1 | MULTIPLE PATTERNING USING IMPROVED PATTERNABLE LOW-k DIELECTRIC MATERIALS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2011-02-24 | — | — | US | disclosed |
| WO-2011008501-A2 | ANIONIC POLYMERIZATION INITIATORS AND PROCESSES | BRIDGESTONE CORPORATION (JP) | 2011-01-20 | — | — | WO | disclosed |
| US-20100323292-A1 | RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN | JSR CORPORATION (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100319971-A1 | AIRGAP-CONTAINING INTERCONNECT STRUCTURE WITH IMPROVED PATTERNABLE LOW-K MATERIAL AND METHOD OF FABRICATING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-12-23 | — | — | US | disclosed |
| US-20100314767-A1 | SELF-ALIGNED DUAL DAMASCENE BEOL STRUCTURES WITH PATTERNABLE LOW- K MATERIAL AND METHODS OF FORMING SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-12-16 | — | — | US | disclosed |
| US-20100314768-A1 | INTERCONNECT STRUCTURE FABRICATED WITHOUT DRY PLASMA ETCH PROCESSING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-12-16 | — | — | US | disclosed |
| WO-2010144709-A2 | AIRCRAFT TRANSPARENCY WITH SOLAR CONTROL PROPERTIES | PPG INDUSTRIES OHIO, INC. (US) | 2010-12-16 | — | — | WO | disclosed |
| US-20100316886-A1 | AIRCRAFT TRANSPARENCY WITH SOLAR CONTROL PROPERTIES | PPG INDUSTRIES OHIO, INC. (US) | 2010-12-16 | — | — | US | disclosed |
| US-7850867-B2 | Compositions for liquid crystal display | SIPIX IMAGING, INC. (US) | 2010-12-14 | — | — | US | disclosed |
| US-20100310988-A1 | RESIST PATTERN-FORMING METHOD AND RESIST PATTERN MINIATURIZING RESIN COMPOSITION | JSR CORPORATION (JP) | 2010-12-09 | — | — | US | disclosed |
| US-20100283157-A1 | INTERCONNECT STRUCTURES WITH PATTERNABLE LOW-K DIELECTRICS AND METHOD OF FABRICATING SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-11-11 | — | — | US | disclosed |
| US-20100286351-A1 | ABA TRIBLOCK COPOLYMER AND PROCESS FOR PRODUCING THE SAME | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-11-11 | — | — | US | disclosed |
| US-20100207276-A1 | SPIN-ON ANTIREFLECTIVE COATING FOR INTEGRATION OF PATTERNABLE DIELECTRIC MATERIALS AND INTERCONNECT STRUCTURES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-08-19 | — | — | US | disclosed |
| US-7767762-B2 | Methods for forming copolymers comprising olefin and protected or unprotected hydroxystyrene units | UNIVERSITY OF MASSACHUSETTS LOWELL (US) | 2010-08-03 | — | — | US | disclosed |
| US-20100190104-A1 | METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE METHOD | JSR CORPORATION (JP) | 2010-07-29 | — | — | US | disclosed |
| EP-2203783-A2 | THICK FILM RESISTS | AZ Electronic Materials USA Corp. (US) | 2010-07-07 | — | — | EP | disclosed |
| US-20100168339-A1 | NOVEL METHODS FOR FORMING COPOLYMERS COMPRISING OLEFIN AND PROTECTED OR UNPROTECTED HYDROXYSTYRENE UNITS | UNIVERSITY OF MASSACHUSETTS LOWELL | 2010-07-01 | — | — | US | disclosed |
| EP-2186837-A1 | ABA TRIBLOCK COPOLYMER AND PROCESS FOR PRODUCING THE SAME | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-05-19 | — | — | EP | disclosed |
| US-7709370-B2 | Spin-on antireflective coating for integration of patternable dielectric materials and interconnect structures | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-05-04 | — | — | US | disclosed |
| EP-1723185-B1 | COPOLYMERS COMPRISING OLEFIN AND PROTECTED OR UNPROTECTED HYDROXYSTYRENE UNITS | UNIV MASSACHUSETTS LOWELL (US) | 2010-04-28 | — | — | EP | disclosed |
| WO-2010034004-A1 | SYSTEMS, APPARATUS AND METHODS FOR COATING THE INTERIOR OF A CONTAINER USING A PHOTOLYSIS AND/OR THERMAL CHEMICAL VAPOR DEPOSITION PROCESS | BECTON, DICKINSON AND COMPANY (US) | 2010-03-25 | — | — | WO | disclosed |
| US-20100048819-A1 | PROCESS TO MODIFY POLYMERIC MATERIALS AND RESULTING COMPOSITIONS | 3M INNOVATIVE PROPERTIES COMPANY | 2010-02-25 | — | — | US | disclosed |
| US-7666794-B2 | Multiple patterning using patternable low-k dielectric materials | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2010-02-23 | — | — | US | disclosed |
| US-20100009292-A1 | RESIN COMPOSITION FOR MICROPATTERN FORMATION AND METHOD OF MICROPATTERN FORMATION | JSR CORPORATION (JP) | 2010-01-14 | — | — | US | disclosed |
| EP-2133747-A1 | RESIN COMPOSITION FOR MICROPATTERN FORMATION AND METHOD OF MICROPATTERN FORMATION | JSR Corporation (JP) | 2009-12-16 | — | — | EP | disclosed |
| US-7632916-B2 | Thermally induced graft polymerization in an apparatus by shearing, devolatilization; grafting isoprene-t-butyl methacrylate copolymer with polyoxyethylene glycol methyl ether, forming methacrylic acid/anhydride monomers | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2009-12-15 | — | — | US | disclosed |
| EP-2128706-A1 | RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN | JSR Corporation (JP) | 2009-12-02 | — | — | EP | disclosed |
| US-7615325-B2 | Compositions for liquid crystal display | SIPIX IMAGING, INC. (US) | 2009-11-10 | — | — | US | disclosed |
| US-20090250835-A1 | METHOD FOR MANUFACTURING MOLDING DIE AND METHOD FOR MANUFACTURING MOLDED PRODUCT | JSR CORPORATION (JP) | 2009-10-08 | — | — | US | disclosed |
| US-20090174067-A1 | AIRGAP-CONTAINING INTERCONNECT STRUCTURE WITH PATTERNABLE LOW-K MATERIAL AND METHOD OF FABRICATING | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-07-09 | — | — | US | disclosed |
| EP-2067594-A1 | METHOD FOR MANUFACTURING MOLDING DIE AND METHOD FOR MANUFACTURING MOLDED PRODUCT | JSR Corporation (JP) | 2009-06-10 | — | — | EP | disclosed |
| WO-2009040661-A2 | THICK FILM RESISTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-04-02 | — | — | WO | disclosed |
| WO-2009039523-A1 | INTERCONNECT STRUCTURES CONTAINING PATTERNABLE LOW-K DIELECTRICS AND METHODS OF FABRICATING SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | WO | disclosed |
| WO-2009037117-A1 | INTERCONNECT STRUCTURES WITH PATTERNABLE LOW-K DIELECTRICS AND METHOD OF FABRICATING SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | WO | disclosed |
| WO-2009037119-A1 | PATTERNABLE DIELECTRIC FILM STRUCTURE WITH IMPROVED LITHOGRAPHY AND METHOD OF FABRICATING SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | WO | disclosed |
| US-20090081589-A1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2009-03-26 | — | — | US | disclosed |
| US-20090079076-A1 | PATTERNABLE DIELECTRIC FILM STRUCTURE WITH IMPROVED LITHOGRAPHY AND METHOD OF FABRICATING SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090079075-A1 | INTERCONNECT STRUCTURES WITH PATTERNABLE LOW-K DIELECTRICS AND METHOD OF FABRICATING SAME | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| US-20090081418-A1 | SPIN-ON ANTIREFLECTIVE COATING FOR INTEGRATION OF PATTERNABLE DIELECTRIC MATERIALS AND INTERCONNECT STRUCTURES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | US | disclosed |
| WO-2009039268-A1 | SPIN-ON ANTIREFLECTIVE COATING FOR INTEGRATION OF PATTERNABLE DIELECTRIC MATERIALS AND INTERCONNECT STRUCTURES | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2009-03-26 | — | — | WO | disclosed |
| US-20090061200-A1 | Hydrophobic Insulation Material | TRISTAR PLASTICS CORPORATION (US) | 2009-03-05 | — | — | US | disclosed |
| US-20080272334-A1 | COMPOSITIONS FOR LIQUID CRYSTAL DISPLAY | SIPIX IMAGING INC. | 2008-11-06 | — | — | US | disclosed |
| EP-1951775-A1 | MEDICAL DEVICES HAVING POLYMERIC REGIONS THAT CONTAIN FLUOROCARBON-CONTAINING BLOCK COPOLYMERS | Boston Scientific Scimed, Inc. (US) | 2008-08-06 | — | — | EP | disclosed |
| US-20080150091-A1 | MULTIPLE PATTERNING USING PATTERNABLE LOW-k DIELECTRIC MATERIALS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-06-26 | — | — | US | disclosed |
| EP-1919973-A1 | NOVEL METHODS FOR FORMING COPOLYMERS COMPRISING OLEFIN AND PROTECTED OR UNPROTECTED HYDROXYSTYRENE UNITS | UNIVERSITY OF MASSACHUSETTS LOWELL (US) | 2008-05-14 | — | — | EP | disclosed |
| EP-1853327-A2 | MEDICAL DEVICES HAVING POLYMERIC REGIONS WITH COPOLYMERS CONTAINING HYDROCARBON AND HETEROATOM-CONTAINING MONOMERIC SPECIES | Boston Scientific Limited (BB) | 2007-11-14 | — | — | EP | disclosed |
| US-20070259287-A1 | Resin Composition for Forming Fine Pattern and Method for Forming Fine Pattern | JSR CORPORATION (JP) | 2007-11-08 | — | — | US | disclosed |
| US-20070238840-A1 | Novel methods for forming copolymers comprising olefin and protected or unprotected hydroxystyrene units | MASSACHUSETTS LOWELL, UNIVERSITY OF | 2007-10-11 | — | — | US | disclosed |
| EP-1481981-B1 | Styrene hypophosphite adduct, preparation thereof and use | CLARIANT PRODUKTE DEUTSCHLAND (DE) | 2007-08-15 | — | — | EP | disclosed |
| US-7241829-B2 | Exfoliated polyolefin/clay nanocomposites using chain end functionalized polyolefin as the polymeric surfactant | THE PENN STATE RESEARCH FOUNDATION (US) | 2007-07-10 | — | — | US | disclosed |
| WO-2007075244-A1 | MEDICAL DEVICES HAVING POLYMERIC REGIONS THAT CONTAIN FLUOROCARBON-CONTAINING BLOCK COPOLYMERS | BOSTON SCIENTIFIC SCIMED, INC. (US) | 2007-07-05 | — | — | WO | disclosed |
| US-7226979-B2 | Copolymers comprising olefin and protected or unprotected hydroxystyrene units | UNIVERSITY OF MASSACHUSETTS LOWELL (US) | 2007-06-05 | — | — | US | disclosed |
| US-20070122915-A1 | Continuous process for the production of combinatorial libraries of modified materials | 3M INNOVATIVE PROPETIES COMPANY | 2007-05-31 | — | — | US | disclosed |
| US-20070117925-A1 | Medical devices having polymeric regions that contain fluorocarbon-containing block copolymers | BOSTON SCIENTIFIC SCIMED, INC. | 2007-05-24 | — | — | US | disclosed |
| US-7220791-B2 | Styrene-hypophosphite adduct, a process for preparation thereof, and its use | CLARIANT PRODUKTE (DEUTSCHLAND) GMBH (DE) | 2007-05-22 | — | — | US | disclosed |
| US-20070098921-A1 | Compositions For Liquid Crystal Display | E INK CALIFORNIA, LLC | 2007-05-03 | — | — | US | disclosed |
| EP-1757990-A1 | RESIN COMPOSITION FOR FORMING FINE PATTERN AND METHOD FOR FORMING FINE PATTERN | JSR Corporation (JP) | 2007-02-28 | — | — | EP | disclosed |
| US-7182830-B2 | Compositions and assembly process for liquid crystal display | SIPIX IMAGING, INC. (US) | 2007-02-27 | — | — | US | disclosed |
| WO-2007022072-A1 | NOVEL METHODS FOR FORMING COPOLYMERS COMPRISING OLEFIN AND PROTECTED OR UNPROTECTED HYDROXYSTYRENE UNITS | UNIVERSITY OF MASSACHUSETTS LOWELL (US) | 2007-02-22 | — | — | WO | disclosed |
| US-7157283-B2 | Continuous process for the production of combinatorial libraries of modified materials | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2007-01-02 | — | — | US | disclosed |
| US-7141355-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-11-28 | — | — | US | disclosed |
| EP-1723185-A1 | COPOLYMERS COMPRISING OLEFIN AND PROTECTED OR UNPROTECTED HYDROXYSTYRENE UNITS | UNIVERSITY OF MASSACHUSETTS LOWELL (US) | 2006-11-22 | — | — | EP | disclosed |
| WO-2006083628-A2 | MEDICAL DEVICES HAVING POLYMERIC REGIONS WITH COPOLYMERS CONTAINING HYDROCARBON AND HETEROATOM-CONTAINING MONOMERIC SPECIES | BOSTON SCIENTIFIC SCIMED, INC. (US) | 2006-08-10 | — | — | WO | disclosed |
| US-20060171981-A1 | Medical devices having polymeric regions with copolymers containing hydrocarbon and heteroatom-containing monomeric species | BOSTON SCIENTIFIC SCIMED, INC. | 2006-08-03 | — | — | US | disclosed |
| EP-1654316-A2 | EXFOLIATED POLYOLEFIN/CLAY NANOCOMPOSITES USING CHAIN END FUNCTIONALIZED POLYOLEFIN AS THE POLYMERIC SURFACTANT | THE PENN STATE RESEARCH FOUNDATION (US) | 2006-05-10 | — | — | EP | disclosed |
| US-7026406-B1 | Syndiotactic styrene polymers and process for the production thereof | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2006-04-11 | — | — | US | disclosed |
| WO-2005077995-A1 | COPOLYMERS COMPRISING OLEFIN AND PROTECTED OR UNPRODUCTED HYDROXYSTYRENE UNITS | UNIVERSITY OF MASSACHUSETTS LOWELL (US) | 2005-08-25 | — | — | WO | disclosed |
| US-20050176891-A1 | Copolymers comprising olefin and protected or unprotected hydroxystyrene units | LOWELL, UNIVERSITY OF MASSACHUSETTS | 2005-08-11 | — | — | US | disclosed |
| EP-1448807-A4 | FLUOROCARBON-ORGANOSILICON COPOLYMERS AND COATINGS PREPARED BY HOT-FILAMENT CHEMICAL VAPOR DEPOSITION | MASSACHUSETTS INST TECHNOLOGY (US) | 2005-07-13 | — | — | EP | disclosed |
| EP-1551885-A2 | PROCESS TO MODIFY POLYMERIC MATERIALS AND RESULTING COMPOSITIONS | 3M Innovative Properties Company (US) | 2005-07-13 | — | — | EP | disclosed |
| EP-1551547-A1 | A CONTINUOUS PROCESS FOR THE PRODUCTION OF COMBINATORIAL LIBRARIES OF MODIFIED MATERIALS | 3M Innovative Properties Company (US) | 2005-07-13 | — | — | EP | disclosed |
| WO-2005044904-A2 | EXFOLIATED POLYOLEFIN/CLAY NANOCOMPOSITES USING CHAIN END FUNCTIONALIZED POLYOLEFIN AS THE POLYMERIC SURFACTANT | THE PENN STATE RESEARCH FOUNDATION (US) | 2005-05-19 | — | — | WO | disclosed |
| US-6889735-B2 | Pneumatic tire having a rubber component containing a dendrimer | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 2005-05-10 | — | — | US | disclosed |
| US-6887578-B2 | Fluorocarbon-organosilicon copolymers and coatings prepared by hot-filament chemical vapor deposition | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2005-05-03 | — | — | US | disclosed |
| US-20050014905-A1 | Exfoliated polyolefin/clay nanocomposites using chain end functionalized polyolefin as the polymeric surfactant | PENN STATE RESEARCH FOUNDATION, THE | 2005-01-20 | — | — | US | disclosed |
| US-20040242738-A1 | Styrene-hypophosphite adduct, a process for preparation thereof, and its use | CLARIANT GMBH | 2004-12-02 | — | — | US | disclosed |
| EP-1481981-A2 | Styrene hypophosphite adduct, preparation thereof and use | Clariant GmbH (DE) | 2004-12-01 | — | — | EP | disclosed |
| EP-1477848-A1 | RADIATION-SENSITIVE RESIN COMPOSITION | JSR Corporation (JP) | 2004-11-17 | — | — | EP | disclosed |
| US-20040209008-A1 | Compositions and assembly process for liquid crystal display | E INK CALIFORNIA, LLC | 2004-10-21 | — | — | US | disclosed |
| EP-1448807-A1 | FLUOROCARBON-ORGANOSILICON COPOLYMERS AND COATINGS PREPARED BY HOT-FILAMENT CHEMICAL VAPOR DEPOSITION | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2004-08-25 | — | — | EP | disclosed |
| US-20040142280-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2004-07-22 | — | — | US | disclosed |
| WO-2004012858-A1 | A CONTINUOUS PROCESS FOR THE PRODUCTION OF COMBINATORIAL LIBRARIES OF MODIFIED MATERIALS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2004-02-12 | — | — | WO | disclosed |
| WO-2004013189-A2 | PROCESS TO MODIFY POLYMERIC MATERIALS AND RESULTING COMPOSITIONS | 3M INNOVATIVE PROPERTIES COMPANY (US) | 2004-02-12 | — | — | WO | disclosed |
| US-20040023398-A1 | Continuous process for the production of combinatorial libraries of modified materials | 3M INNOVATIVE PROPERTIES COMPANY | 2004-02-05 | — | — | US | disclosed |
| US-20040020576-A1 | Pneumatic tire having a rubber component containing a dendrimer | THE GOODYEAR TIRE & RUBBER COMPANY | 2004-02-05 | — | — | US | disclosed |
| US-20040024130-A1 | Process to modify polymeric materials and resulting compositions | 3M INNOVATIVE PROPERTIES COMPANY | 2004-02-05 | — | — | US | disclosed |
| US-6656660-B1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-12-02 | — | — | US | disclosed |
| US-20030138645-A1 | Fluorocarbon- organosilicon copolymers and coatings prepared by hot-filament chemical vapor deposition | NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT | 2003-07-24 | — | — | US | disclosed |
| EP-0780732-B1 | Polymer composition and resist material | WAKO PURE CHEM IND LTD (JP) | 2003-07-09 | — | — | EP | disclosed |
| WO-2003038143-A1 | FLUOROCARBON-ORGANOSILICON COPOLYMERS AND COATINGS PREPARED BY HOT-FILAMENT CHEMICAL VAPOR DEPOSITION | MASSACHUSETTS INSTITUTE OF TECHNOLOGY (US) | 2003-05-08 | — | — | WO | disclosed |
| EP-1283221-A1 | SYNDIOTACTIC STYRENE POLYMERS AND PROCESS FOR THE PRODUCTION THEREOF | National Institute of Advanced Industrial Science and Technology (JP) | 2003-02-12 | — | — | EP | disclosed |
| US-6506537-B2 | Photopolymerization | JSR CORPORATION (JP) | 2003-01-14 | — | — | US | disclosed |
| US-6486272-B1 | METAL COMPOUND INTERACTS WITH A VINYL COMPOUND WITH A FUNCTIONAL GROUP TO MASK IT AND COPOLYMERIZING WITH A STYRENE IN THE PRESENCE OF TRANSITION METAL COMPOUND, OXYGEN COMPOUNDS WHICH FORM IONIC COMPLEXES, AND AN ORGANOMETALLIC COMPOUND | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 2002-11-26 | — | — | US | disclosed |
| US-20020173605-A1 | PROCESS FOR PRODUCING FUNCTIONAL STYRENE COPOLYMER AND FUNCTIONAL STYRENE COPOLYMER | IDEMITSU KOSAN CO.,LTD. (JP) | 2002-11-21 | — | — | US | disclosed |
| EP-0948560-B1 | MICROPOROUS POLYMERIC FOAMS MADE WITH SILICON OR GERMANIUM BASED MONOMERS | PROCTER & GAMBLE (US) | 2002-08-14 | — | — | EP | disclosed |
| EP-1219649-A1 | PROCESS FOR PRODUCING FUNCTIONAL STYRENE COPOLYMER AND FUNCTIONAL STYRENE COPOLYMER | IDEMITSU PETROCHEMICAL CO., LTD. (JP) | 2002-07-03 | — | — | EP | disclosed |
| US-20020068796-A1 | Pneumatic tire having a rubber component containing a dendrimer | FRANK UWE ERNST (DE) | 2002-06-06 | — | — | US | disclosed |
| US-6365321-B1 | COPOLYMER WITH ACRYLATE HAVING ACID LABILE GROUP, HOMOGENOUSLY BLENDED WITH PHENOLIC POLYMER WHICH IS PARTIALLY OR WHOLLY PROTECTED | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-04-02 | — | — | US | disclosed |
| EP-1177919-A2 | A pneumatic tire having a rubber component containing a dendrimer | THE GOODYEAR TIRE & RUBBER COMPANY (US) | 2002-02-06 | — | — | EP | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| EP-0805132-B1 | Method of producing styrene derivatives | HONSHU CHEMICAL IND (JP) | 2001-12-12 | — | — | EP | disclosed |
| US-6277546-B1 | Process for imaging of photoresist | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-08-21 | — | — | US | disclosed |
| US-6210856-B1 | Resist composition and process of forming a patterned resist layer on a substrate | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-04-03 | — | — | US | disclosed |
| US-6136874-A | Microporous polymeric foams made with silicon or germanium based monomers | THE PROCTER & GAMBLE COMPANY (US) | 2000-10-24 | — | — | US | disclosed |
| EP-1024406-A1 | Resist composition | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 2000-08-02 | — | — | EP | disclosed |
| EP-0704762-B1 | Resist material and pattern formation | WAKO PURE CHEM IND LTD (JP) | 1999-12-15 | — | — | EP | disclosed |
| US-5976759-A | ALKALI SOLUBLE BY HEATING | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1999-11-02 | — | — | US | disclosed |
| EP-0596668-B1 | Process for imaging of photoresist | IBM (US) | 1999-04-14 | — | — | EP | disclosed |
| EP-0520626-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1999-03-10 | — | — | EP | disclosed |
| EP-0605089-B1 | Photoresist composition | IBM (US) | 1999-01-07 | — | — | EP | disclosed |
| US-5763560-A | TREATING BENZALDEHYDE DERIVATIVE WITH ZINC AND ACTIVE CHLORIDE IN AN ORGANIC SOLVENT | HONSHU CHEMICAL INDUSTRY CO., LTD. (JP) | 1998-06-09 | — | — | US | disclosed |
| EP-0805132-A1 | Method of producing styrene derivatives | HONSHU CHEMICAL INDUSTRY CO. LTD. (JP) | 1997-11-05 | — | — | EP | disclosed |
| US-5663260-A | Hyperbranched copolymers from AB monomers and C monomers | CORNELL RESEARCH FOUNDATION, INC. (US) | 1997-09-02 | — | — | US | disclosed |
| EP-0791022-A1 | HYPERBRANCHED COPOLYMERS FROM AB MONOMERS AND C MONOMERS | CORNELL RESEARCH FOUNDATION, INC. (US) | 1997-08-27 | — | — | EP | disclosed |
| EP-0780732-A2 | Polymer composition and resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1997-06-25 | — | — | EP | disclosed |
| US-5625020-A | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1997-04-29 | — | — | US | disclosed |
| US-5558976-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR, PHOTORESISTS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| US-5558971-A | HYDROXYSTYRENE POLYMER DERIVATIVES, PHOTOACID GENERATOR | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1996-09-24 | — | — | US | disclosed |
| WO-1996014345-A1 | HYPERBRANCHED COPOLYMERS FROM AB MONOMERS AND C MONOMERS | CORNELL RESEARCH FOUNDATION, INC. (US) | 1996-05-17 | — | — | WO | disclosed |
| EP-0704762-A1 | Resist material and pattern formation | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1996-04-03 | — | — | EP | disclosed |
| US-5492793-A | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1996-02-20 | — | — | US | disclosed |
| US-5384192-A | Multilayer element with inorganic substrate and polymer coating | EASTMAN KODAK COMPANY (US) | 1995-01-24 | — | — | US | disclosed |
| US-5362597-A | Lenses | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1994-11-08 | — | — | US | disclosed |
| EP-0605089-A2 | Photoresist composition | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1994-07-06 | — | — | EP | disclosed |
| EP-0596668-A2 | Process for imaging of photoresist | International Business Machines Corporation (US) | 1994-05-11 | — | — | EP | disclosed |
| US-5276110-A | Highly regular multi-arm star polymers | NATIONAL RESEARCH COUNCIL OF CANADA (CA) | 1994-01-04 | — | — | US | disclosed |
| EP-0520626-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-12-30 | — | — | EP | disclosed |
| EP-0455191-A2 | Block copolymers containing poly(1,3-conjugated dienes) and poly(vinylphenols), silyl protected poly(vinylphenols) or poly(metal phenolates) | EASTMAN KODAK COMPANY (US) | 1991-11-06 | — | — | EP | disclosed |
| EP-0192078-B1 | PROCESS FOR PREPARING NEGATIVE RELIEF IMAGES | International Business Machines Corporation (US) | 1989-12-13 | — | — | EP | disclosed |
| EP-0192078-A2 | Process for preparing negative relief images | International Business Machines Corporation (US) | 1986-08-27 | — | — | EP | disclosed |
| US-4551418-A | Process for preparing negative relief images with cationic photopolymerization | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1985-11-05 | — | — | US | disclosed |
| US-4551418-A | Process for preparing negative relief images with cationic photopolymerization | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1985-11-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160016860-A1 | METHODS FOR PHOSPHINE OXIDE REDUCTION IN CATALYTIC WITTIG REACTIONS | DCXR, TECR, PWWP2B | PREP 2559/4885ALDH1A1 4341/4885CA12 446/4885 |
| US-20120083523-A1 | MEDICAL DEVICES HAVING POLYMERIC REGIONS WITH COPOLYMERS CONTAINING HYDROCARBON AND HETEROATOM-CONTAINING MONOMERIC SPECIES | AHR, ARNT, OPRM1 | PREP 3174/4885ALDH1A1 1960/4885CA12 2882/4885 |
| US-20160129128-A1 | ANTIBODY DRUG CONJUGATES | CD79B, OGFR, CD22 | PREP 4047/4885ALDH1A1 784/4885CA12 261/4885 |
| US-20120136128-A1 | ANIONIC POLYMERIZATION INITIATORS AND PROCESSES | AP1M1, AP2M1, CCNE2 | PREP 4402/4885ALDH1A1 830/4885CA12 2082/4885 |
| US-11066571-B2 | Pattern forming method, under coating agent, and laminate | LMNB2, MCM4, LMNB1 | PREP 4703/4885ALDH1A1 2196/4885CA12 69/4885 |
| US-20200048491-A1 | PATTERN FORMING METHOD, UNDER COATING AGENT, AND LAMINATE | LMNB2, MCM4, LMNB1 | PREP 4703/4885ALDH1A1 2196/4885CA12 69/4885 |
| US-11654096-B2 | Xyloside derivatives of resveratrol for use thereof in cosmetics | SIRT1, SIRT3, DCXR | PREP 898/4885ALDH1A1 1226/4885CA12 4584/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.