Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GRIN2A known ✓ | Q12879 | 4/20 | 0.36 |
| ▸ | SIGMAR1 known ✓ | Q99720 | 1/20 | 0.36 |
| ▸ | THRB known ✓ | P10828 | 2/20 | 0.35 |
| ▸ | NPFFR1 | Q9GZQ6 | 1/20 | 0.37 |
| ▸ | NPFFR2 | Q9Y5X5 | 1/20 | 0.37 |
| ▸ | GRIN2D | O15399 | 4/20 | 0.36 |
| ▸ | GRIN3B | O60391 | 4/20 | 0.36 |
| ▸ | GRIN1 | Q05586 | 4/20 | 0.36 |
| ▸ | GRIN2B | Q13224 | 4/20 | 0.36 |
| ▸ | GRIN2C | Q14957 | 4/20 | 0.36 |
| ▸ | GRIN3A | Q8TCU5 | 4/20 | 0.36 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.36 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.36 |
| ▸ | STAT6 | P42226 | 1/20 | 0.36 |
| ▸ | SLC47A1 | Q96FL8 | 1/20 | 0.36 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | BLM | P54132 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL960382 | 0.97 | GRIN2D (0.38) | NPFFR1NPFFR2GRIN2DGRIN3BGRIN1 | |
| Bicarbonate SCHEMBL20943642 | 0.85 | THRB (0.43) | NPFFR1NPFFR2TSHRTHRBCYP2C9 | |
| SCHEMBL5495240 | 0.80 | MEN1 (0.32) | NPFFR1NPFFR2GRIN2DGRIN3BGRIN1 | |
| SCHEMBL6395459 | 0.78 | SIGMAR1 (0.32) | SIGMAR1 | |
| SCHEMBL4437737 | 0.76 | NPFFR1 (0.31) | NPFFR1NPFFR2GRIN2DGRIN3BGRIN1 | |
| SCHEMBL8160229 | 0.76 | — | — | |
| SCHEMBL3415057 | 0.74 | NPFFR1 (0.35) | NPFFR1NPFFR2GRIN2DGRIN3BGRIN1 | |
| SCHEMBL6348665 | 0.74 | EPHX2 (0.43) | TSHR | |
| SCHEMBL3848004 | 0.74 | LMNA (0.32) | GRIN2DGRIN3BGRIN1GRIN2AGRIN2B | |
| SCHEMBL4102744 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7588876-B2 | Resist material and pattern formation method | PANASONIC CORPORATION (JP) | 2009-09-15 | — | — | US | disclosed |
| US-7413843-B2 | Sulfonamide compound, polymer compound, resist material and pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2008-08-19 | — | — | US | disclosed |
| US-7378216-B2 | Resist material and pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2008-05-27 | — | — | US | disclosed |
| US-20070099117-A1 | Sulfonamide compound, polymer compound, resist material and pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2007-05-03 | — | — | US | disclosed |
| US-7166418-B2 | Selectively irradiating resist film with high energy beams of light such as krypton fluoride, argon fluoride, fluorine, krypton, argon or soft X-ray laser ; developing polymer with unsaturated sulfonamide units | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2007-01-23 | — | — | US | disclosed |
| EP-1602976-B1 | Resist material and pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2007-01-17 | — | — | EP | disclosed |
| US-20050277057-A1 | Resist material and pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-12-15 | — | — | US | disclosed |
| EP-1602976-A1 | Resist material and pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-12-07 | — | — | EP | disclosed |
| US-20050266338-A1 | Resist material and pattern formation method | PANASONIC CORPORATION (JP) | 2005-12-01 | — | — | US | disclosed |
| US-20050266337-A1 | Resist material and pattern formation method | PANNOVA SEMIC, LLC | 2005-12-01 | — | — | US | disclosed |
| EP-1517181-A1 | Sulfonamide compound, polymer compound, reist material and pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2005-03-23 | — | — | EP | disclosed |
| US-20050058935-A1 | Sulfonamide compound, polymer compound, resist material and pattern formation method | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2005-03-17 | — | — | US | disclosed |