Known targets — ChEMBL curated mechanism
ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.32 |
| ▸ | HTR1A | P08908 | 1/20 | 0.31 |
| ▸ | DRD2 | P14416 | 1/20 | 0.31 |
| ▸ | HTR2A | P28223 | 1/20 | 0.31 |
| ▸ | IDO1 | P14902 | 1/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6697206 | 0.76 | MEN1 (0.39) | MEN1KMT2AHTR1ADRD2HTR2A | |
| SCHEMBL1771923 | 0.76 | MEN1 (0.50) | MEN1KMT2AIDO1KDM4ETDP1 | |
| SCHEMBL28522766 | 0.74 | MEN1 (0.35) | MEN1KMT2AHTR1ADRD2HTR2A | |
| SCHEMBL9719205 | 0.74 | MEN1 (0.37) | MEN1KMT2AHTR1ADRD2HTR2A | |
| SCHEMBL28831792 | 0.72 | HTR1A (0.33) | MEN1KMT2AHTR1ADRD2HTR2A | |
| SCHEMBL11157615 | 0.72 | ALDH1A1 (0.33) | MEN1KMT2AHTR1ADRD2HTR2A | |
| SCHEMBL8975933 | 0.72 | MEN1 (0.38) | MEN1KMT2AHTR1ADRD2HTR2A | |
| SCHEMBL11160365 | 0.72 | SMN1; SMN2 (0.36) | MEN1KMT2AHTR1ADRD2HTR2A | |
| SCHEMBL6801495 | 0.72 | SMN1; SMN2 (0.48) | MEN1KMT2A | |
| SCHEMBL28692977 | 0.71 | KCNH2 (0.44) | MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230274853-A1 | THIN METAL ELECTRODE FILMS, AND MANUFACTURING METHOD THEREOF | CLAP CO., LTD (KR) | 2023-08-31 | — | — | US | disclosed |
| WO-2022012937-A1 | THIN METAL ELECTRODE FILMS, AND MANUFACTURING METHOD THEREOF | BASF SE (DE) | 2022-01-20 | — | — | WO | disclosed |
| EP-3941167-A1 | THIN METAL ELECTRODE FILMS, AND MANUFACTURING METHOD THEREOF | BASF SE (DE) | 2022-01-19 | — | — | EP | disclosed |
| EP-1862042-B1 | METALLIC PATTERN FORMING METHOD, METALLIC PATTERN OBTAINED THEREBY, PRINTED WIRING BOARD USING THE SAME, AND TFT WIRING BOARD USING THE SAME | FUJIFILM CORP (JP) | 2013-04-10 | — | — | EP | disclosed |
| US-8187664-B2 | Metallic pattern forming method, metallic pattern obtained thereby, printed wiring board using the same, and TFT wiring board using the same | FUJIFILM CORPORATION (JP) | 2012-05-29 | — | — | US | disclosed |
| US-20090022885-A1 | METALLIC PATTERN FORMING METHOD, METALLIC PATTERN OBTAINED THEREBY, PRINTED WIRING BOARD USING THE SAME, AND TFT WIRING BOARD USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-01-22 | — | — | US | disclosed |
| EP-1862042-A1 | METALLIC PATTERN FORMING METHOD, METALLIC PATTERN OBTAINED THEREBY, PRINTED WIRING BOARD USING THE SAME, AND TFT WIRING BOARD USING THE SAME | FUJIFILM Corporation (JP) | 2007-12-05 | — | — | EP | disclosed |
| WO-2006085669-A1 | METALLIC PATTERN FORMING METHOD, METALLIC PATTERN OBTAINED THEREBY, PRINTED WIRING BOARD USING THE SAME, AND TFT WIRING BOARD USING THE SAME | FUJIFILM CORPORATION (JP) | 2006-08-17 | — | — | WO | disclosed |