SCHEMBL4390857

SCHEMBL4390857

[CH2]C(=O)Oc1ccc(C)cc1

nearest known ligand 0.64

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.64
CYP1A2 P05177 1/20 0.50
CYP2C9 P11712 1/20 0.50
CYP2C19 P33261 1/20 0.50
ALDH1A1 P00352 1/20 0.50
GAA P10253 1/20 0.47
BCHE P06276 1/20 0.46
KMT2A Q03164 3/20 0.46
CHRNA7 P36544 1/20 0.45
ACHE P22303 1/20 0.44
L3MBTL1 Q9Y468 1/20 0.44
PTK2B Q14289 1/20 0.43
RXFP1 Q9HBX9 1/20 0.43
PRSS1 P07477 1/20 0.43
ACR P10323 1/20 0.43
CYP3A4 P08684 1/20 0.43
TSHR P16473 1/20 0.43
RAB9A P51151 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2003787 0.81 CA1 (0.56) LMNACYP1A2CYP2C9CYP2C19ALDH1A1
SCHEMBL47792 0.80 LMNA (0.70) LMNACYP1A2CYP2C9CYP2C19ALDH1A1
SCHEMBL7064531 0.80 LMNA (0.70) LMNACYP1A2CYP2C9CYP2C19ALDH1A1
SCHEMBL280615 0.78 LMNA (1.00) LMNACYP1A2CYP2C9CYP2C19ALDH1A1
SCHEMBL577352 0.78 LMNA (0.74) LMNACYP1A2CYP2C9CYP2C19ALDH1A1
SCHEMBL4642016 0.78 PARP10 (0.48) LMNAALDH1A1GAAKMT2ACYP3A4
SCHEMBL1254224 0.78 LMNA (0.67) LMNACYP1A2CYP2C9CYP2C19ALDH1A1
SCHEMBL26622125 0.77 LMNA (0.59) LMNACYP1A2CYP2C9CYP2C19ALDH1A1
SCHEMBL39792 0.77 THRB (0.59) LMNACYP1A2CYP2C9CYP2C19ALDH1A1
SCHEMBL7798435 0.76 LMNA (0.95) LMNACYP1A2CYP2C9CYP2C19ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11886119-B2 Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2024-01-30 US disclosed
CN-110709774-B Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2023-12-08 CN disclosed
US-20230185195-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2023-06-15 US disclosed
US-11599025-B2 Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2023-03-07 US disclosed
US-20220050379-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2022-02-17 US disclosed
EP-3922456-A1 MATERIAL FOR UNDERLAYER FILM FORMATION USE, RESIST UNDERLAYER FILM, AND LAMINATE Mitsui Chemicals, Inc. (JP) 2021-12-15 EP disclosed
CN-113365820-A Material for forming underlayer film, resist underlayer film, and laminate 三井化学株式会社 2021-09-07 CN disclosed
US-20200264511-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2020-08-20 US disclosed
WO-2020162183-A1 MATERIAL FOR UNDERLAYER FILM FORMATION USE, RESIST UNDERLAYER FILM, AND LAMINATE 三井化学株式会社 2020-08-13 WO disclosed
EP-3693793-A1 RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT Mitsui Chemicals, Inc. (JP) 2020-08-12 EP disclosed
CN-1311988-C Imide compounds and optical recording media made by using the same MITSUI CHEMICALS INC (JP) 2007-04-25 CN disclosed
US-20070054084-A1 Optical recording medium and compound used for the same MITSUI CHEMICALS, INC. (JP) 2007-03-08 US disclosed
CN-1867980-A Optical recording medium and compound for use in the same MITSUI CHEMICALS INC (JP) 2006-11-22 CN disclosed
EP-1672626-A1 OPTICAL RECORDING MEDIUM AND COMPOUND USED IN THE OPTICAL RECORDING MEDIUM Mitsui Chemicals, Inc. (JP) 2006-06-21 EP disclosed
US-20060078821-A1 A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication JSR CORPORATION (JP) 2006-04-13 US disclosed
EP-1640804-A2 Positive-tone radiation-sensitive resin composition JSR Corporation (JP) 2006-03-29 EP disclosed
US-20050208425-A1 Imide compound and optical recording media made by using the same YAMAMOTO CHEMICALS, INC. (JP) 2005-09-22 US disclosed
US-20050171195-A1 P2X7 antagonists for treating neuropathic pain ABBOTT LABORATORIES 2005-08-04 US disclosed
CN-1575236-A Imide compounds and optical recording media made by using the same MITSUI CHEMICALS INC OGISO AKI (JP) 2005-02-02 CN disclosed
EP-1445115-A1 IMIDE COMPOUNDS AND OPTICAL RECORDING MEDIA MADE BY USING THE SAME Mitsui Chemicals, Inc. (JP) 2004-08-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050171195-A1 P2X7 antagonists for treating neuropathic pain P2RX3, P2RX7, P2RX1 LMNA 3035/4885CYP1A2 2356/4885CYP2C9 2379/4885
US-20050208425-A1 Imide compound and optical recording media made by using the same CRY1, MTNR1A, TRPA1 LMNA 782/4885CYP1A2 837/4885CYP2C9 1903/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.