Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 3/20 | 0.32 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL443489 | 0.86 | PRKCA (0.38) | ALDH1A1LMNAHSD17B10TSHRTDP1 | |
| SCHEMBL445105 | 0.83 | CA2 (0.41) | ALDH1A1TSHRTDP1 | |
| SCHEMBL445367 | 0.80 | HDAC1 (0.37) | ALDH1A1LMNAHSD17B10TSHRTDP1 | |
| SCHEMBL19385447 | 0.79 | PRKCA (0.34) | ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL28331115 | 0.77 | ALDH1A1 (0.35) | ALDH1A1TDP1 | |
| SCHEMBL446240 | 0.77 | — | — | |
| SCHEMBL445107 | 0.73 | CTSK (0.40) | ALDH1A1TSHRTDP1 | |
| SCHEMBL29255803 | 0.73 | ALDH1A1 (0.48) | ALDH1A1LMNATSHRTDP1 | |
| Alcohol SCHEMBL7530022 | 0.73 | TSHR (0.34) | ALDH1A1LMNAHSD17B10TSHR | |
| SCHEMBL1584634 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10916437-B2 | Methods of forming micropatterns and substrate processing apparatus | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2021-02-09 | — | — | US | disclosed |
| US-20190198342-A1 | Methods of Forming Micropatterns and Substrate Processing Apparatus | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2019-06-27 | — | — | US | disclosed |
| US-10134606-B2 | Method of forming patterns and method of manufacturing integrated circuit device using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-11-20 | — | — | US | disclosed |
| US-9773672-B2 | Method of forming micropatterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2017-09-26 | — | — | US | disclosed |
| US-20160233083-A1 | METHOD OF FORMING MICROPATTERNS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2016-08-11 | — | — | US | disclosed |
| US-20150340246-A1 | METHOD OF FORMING PATTERNS AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-11-26 | — | — | US | disclosed |
| US-8986554-B2 | Method of forming patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-03-24 | — | — | US | disclosed |
| US-20130295772-A1 | METHOD OF FORMING PATTERNS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-11-07 | — | — | US | disclosed |
| US-20120064463-A1 | Method of Forming Micropatterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2012-03-15 | — | — | US | disclosed |