Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 2/20 | 0.68 |
| ▸ | PAM | P19021 | 1/20 | 0.50 |
| ▸ | MAOB | P27338 | 3/20 | 0.48 |
| ▸ | HTR2A | P28223 | 4/20 | 0.47 |
| ▸ | MAOA | P21397 | 2/20 | 0.46 |
| ▸ | CA1 | P00915 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | MMP1 | P03956 | 1/20 | 0.44 |
| ▸ | MMP2 | P08253 | 1/20 | 0.44 |
| ▸ | MMP9 | P14780 | 1/20 | 0.44 |
| ▸ | MMP12 | P39900 | 1/20 | 0.44 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.44 |
| ▸ | HTR2C | P28335 | 1/20 | 0.42 |
| ▸ | HTR2B | P41595 | 1/20 | 0.42 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL452603 | 1.00 | IDO1 (0.68) | IDO1PAMMAOBHTR2AMAOA | |
| SCHEMBL13957704 | 0.89 | IDO1 (0.57) | IDO1PAMMAOBHTR2AMAOA | |
| SCHEMBL7923411 | 0.89 | IDO1 (0.57) | IDO1PAMMAOBHTR2AMAOA | |
| SCHEMBL7923408 | 0.89 | IDO1 (0.57) | IDO1PAMMAOBHTR2AMAOA | |
| SCHEMBL1657284 | 0.87 | IDO1 (0.59) | IDO1PAMMAOBHTR2AMAOA | |
| SCHEMBL1657285 | 0.87 | IDO1 (0.59) | IDO1PAMMAOBHTR2AMAOA | |
| SCHEMBL430934 | 0.85 | IDO1 (0.68) | IDO1PAMMAOBHTR2AHTR2C | |
| SCHEMBL7514298 | 0.85 | IDO1 (0.68) | IDO1PAMMAOBHTR2AHTR2C | |
| SCHEMBL430935 | 0.85 | IDO1 (0.68) | IDO1PAMMAOBHTR2AHTR2C | |
| SCHEMBL11179703 | 0.85 | IDO1 (0.57) | IDO1PAMMAOBHTR2AMAOA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8026398-B2 | Catalysts comprising a combination of oxidized metals and a method for cleaving phenylalkyl hydroperoxides using the catalysts | SHELL OIL COMPANY | 2011-09-27 | — | — | US | claimed |
| US-20100063326-A1 | CATALYSTS COMPRISING A COMBINATION OF OXIDIZED METALS AND A METHOD FOR CLEAVING PHENYLALKYL HYDROPEROXIDES USING THE CATALYSTS | SHELL OIL COMPANY | 2010-03-11 | — | — | US | claimed |
| US-20100063329-A1 | METHOD FOR DECOMPOSING DI(PHENYLALKYL)PEROXIDES TO PRODUCE HYDROXYBENZENES AND PHENYLALKENES USING SOLID CATALYSTS | SHELL OIL COMPANY | 2010-03-11 | — | — | US | claimed |
| WO-2007137020-A2 | METHOD FOR DECOMPOSING DI(PHENYLALKYL)PEROXIDES TO PRODUCE HYDROXYBENZENES AND PHENYLALKENES USING SOLID CATALYSTS | SHELL OIL COMPANY (US) | 2007-11-29 | — | — | WO | claimed |
| WO-2007137021-A2 | CATALYSTS COMPRISING A COMBINATION OF OXIDIZED METALS AND A METHOD FOR CLEAVING PHENYLALKYL HYDROPEROXIDES USING THE CATALYSTS | SHELL OIL COMPANY (US) | 2007-11-29 | — | — | WO | claimed |
| EP-4714988-A1 | FLUORINE-CONTAINING POLYMER, COMPOSITION FOR FORMING FLUORINE-CONTAINING RESIN FILM, FLUORINE-CONTAINING RESIN FILM, COMPOSITION FOR FORMING RESIST PATTERN, METHOD FOR FORMING RESIST PATTERN, COMPOSITION FOR FORMING RESIST UPPER LAYER FILM, METHOD FOR DECOMPOSING FLUORINE-CONTAINING POLYMER, FLUORINE-CONTAINING POLYMERIZABLE MONOMER, COMPOUND, AND METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMERIZABLE MONOMER | Central Glass Company, Limited (JP) | 2026-03-25 | — | — | EP | disclosed |
| EP-4714990-A1 | COPOLYMER, POLYMER FOR WATER-REPELLENT AGENT, COMPOSITION FOR FORMING WATER-REPELLENT FILM, RESIN FILM, AND METHOD FOR FORMING RESIST PATTERN | Central Glass Company, Limited (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12498638-B2 | Monomer, resin for photoresist, resin composition for photoresist, and pattern forming method | DAICEL CORPORATION (JP) | 2025-12-16 | — | — | US | disclosed |
| US-12460031-B2 | Photosensitive resin composition, method for producing cured product of fluororesin, fluororesin, fluororesin film, bank and display element | CENTRAL GLASS COMPANY, LIMITED (JP) | 2025-11-04 | — | — | US | disclosed |
| US-12461443-B2 | Photoresist resin, method for producing photoresist resin, photoresist resin composition, and method for forming pattern | DAICEL CORPORATION (JP) | 2025-11-04 | — | — | US | disclosed |
| WO-2024248136-A1 | COPOLYMER, POLYMER FOR WATER-REPELLENT AGENT, COMPOSITION FOR FORMING WATER-REPELLENT FILM, RESIN FILM, AND METHOD FOR FORMING RESIST PATTERN | セントラル硝子株式会社 | 2024-12-05 | — | — | WO | disclosed |
| WO-2024248135-A1 | FLUORINE-CONTAINING POLYMER, COMPOSITION FOR FORMING FLUORINE-CONTAINING RESIN FILM, FLUORINE-CONTAINING RESIN FILM, COMPOSITION FOR FORMING RESIST PATTERN, METHOD FOR FORMING RESIST PATTERN, COMPOSITION FOR FORMING RESIST UPPER LAYER FILM, METHOD FOR DECOMPOSING FLUORINE-CONTAINING POLYMER, FLUORINE-CONTAINING POLYMERIZABLE MONOMER, COMPOUND, AND METHOD FOR PRODUCING FLUORINE-CONTAINING POLYMERIZABLE MONOMER | セントラル硝子株式会社 | 2024-12-05 | — | — | WO | disclosed |
| US-7122292-B2 | Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-10-17 | — | — | US | disclosed |
| US-20060135744-A1 | Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same | CENTRAL GLASS COMPANY LIMITED (JP) | 2006-06-22 | — | — | US | disclosed |
| US-20060057489-A1 | Lactone compounds, lactone-containing monomers, their polymers, resist compositions using same, and processes for forming patterns using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2006-03-16 | — | — | US | disclosed |
| US-20050250898-A1 | Top coat composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2005-11-10 | — | — | US | disclosed |
| US-6858760-B2 | Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2005-02-22 | — | — | US | disclosed |
| US-20040225159-A1 | Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method | CENTRAL GLASS COMPANY, LTD. (JP) | 2004-11-11 | — | — | US | disclosed |
| US-20040192867-A1 | Fluorine-containing compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers, dissolution inhibitors, and resist compositions | CENTRAL GLASS COMPANY, LIMITED (JP) | 2004-09-30 | — | — | US | disclosed |
| US-20040106755-A1 | Fluorine containing compounds with unsaturated ether or ester groups | CENTRAL GLASS COMPANY, LIMITED (JP) | 2004-06-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20060135744-A1 | Fluorinated cyclic compound, polymerizable fluoromonomer, fluoropolymer, resist material comprising the same, and method of forming pattern with the same | PFAS, AFF1, FUBP1 | IDO1 4283/4885PAM 1093/4885MAOB 1790/4885 |
| US-20100063329-A1 | METHOD FOR DECOMPOSING DI(PHENYLALKYL)PEROXIDES TO PRODUCE HYDROXYBENZENES AND PHENYLALKENES USING SOLID CATALYSTS | HAO2, HDHD5, PPOX | IDO1 759/4885PAM 559/4885MAOB 35/4885 |
| US-20100063326-A1 | CATALYSTS COMPRISING A COMBINATION OF OXIDIZED METALS AND A METHOD FOR CLEAVING PHENYLALKYL HYDROPEROXIDES USING THE CATALYSTS | GPX4, SOD1, PPOX | IDO1 1726/4885PAM 680/4885MAOB 363/4885 |
| US-20040225159-A1 | Fluorine-containing cyclic compounds, fluorine-containing polymerizable monomers, fluorine-containing polymers resist compositions and patterning method | AFF1, FPR1, AFF2 | IDO1 1886/4885PAM 982/4885MAOB 990/4885 |
| US-12498638-B2 | Monomer, resin for photoresist, resin composition for photoresist, and pattern forming method | ELOB, COPE, COPB1 | IDO1 2621/4885PAM 1593/4885MAOB 1672/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.