Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD17B2 | P37059 | 1/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.38 |
| ▸ | HSD17B3 | P37058 | 1/20 | 0.38 |
| ▸ | NLRP3 | Q96P20 | 1/20 | 0.37 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | NPC1 | O15118 | 1/20 | 0.35 |
| ▸ | RECQL | P46063 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 1/20 | 0.35 |
| ▸ | GLO1 | Q04760 | 1/20 | 0.34 |
| ▸ | KEAP1 | Q14145 | 1/20 | 0.34 |
| ▸ | NFE2L2 | Q16236 | 1/20 | 0.34 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.34 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.34 |
| ▸ | HSP90AB1 | P08238 | 1/20 | 0.34 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | APAF1 | O14727 | 1/20 | 0.33 |
| ▸ | NSD2 | O96028 | 1/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL450357 | 0.90 | ALDH1A1 (0.38) | ALDH1A1RECQLPRSS1POLBKDM4E | |
| SCHEMBL3205028 | 0.88 | ALDH1A1 (0.40) | ALDH1A1KEAP1NFE2L2KDM4EMEN1 | |
| SCHEMBL3204718 | 0.86 | F2 (0.33) | ALDH1A1PRSS1KDM4EMEN1MAPT | |
| SCHEMBL3195413 | 0.85 | LMNA (0.45) | ALDH1A1KEAP1NFE2L2PRSS1KDM4E | |
| SCHEMBL3199458 | 0.84 | ALDH1A1 (0.36) | ALDH1A1HSP90AA1HSP90AB1CA2APAF1 | |
| SCHEMBL449950 | 0.81 | LMNA (0.45) | ALDH1A1GLO1KEAP1NFE2L2PRSS1 | |
| SCHEMBL15675804 | 0.81 | ENPP2 (0.35) | ALDH1A1NPC1RAB9APRSS1CA1 | |
| SCHEMBL6746249 | 0.79 | HSD11B1 (0.53) | HSD11B1HSD17B3NLRP3ENPP1ALDH1A1 | |
| SCHEMBL451539 | 0.78 | HSD11B1 (0.53) | HSD17B2HSD11B1HSD17B3ENPP1ALDH1A1 | |
| SCHEMBL2634260 | 0.78 | HSD11B1 (0.53) | HSD17B2HSD11B1HSD17B3ENPP1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20070031758-A1 | Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material | JSR CORPORATION (JP) | 2007-02-08 | — | — | US | claimed |
| EP-1750176-A2 | Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material | JSR Corporation (JP) | 2007-02-07 | — | — | EP | claimed |
| EP-3010943-B1 | CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM | CANON KK (JP) | 2024-04-03 | — | — | EP | disclosed |
| US-11332597-B2 | Photo-curable composition and patterning method using the same | CANON KABUSHIKI KAISHA (JP) | 2022-05-17 | — | — | US | disclosed |
| EP-2841255-B1 | RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS | CANON KK (JP) | 2020-05-13 | — | — | EP | disclosed |
| US-20200123343-A1 | PHOTO-CURABLE COMPOSITION AND PATTERNING METHOD USING THE SAME | CANON KK (JP) | 2020-04-23 | — | — | US | disclosed |
| US-10472445-B2 | Photocurable composition and method for manufacturing film | CANON KABUSHIKI KAISHA (JP) | 2019-11-12 | — | — | US | disclosed |
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | CANON KABUSHIKI KAISHA (JP) | 2019-09-24 | — | — | US | disclosed |
| EP-2907156-B1 | IMPRINTING METHOD AND CURABLE COMPOSITION FOR IMPRINTING | CANON KK (JP) | 2019-04-10 | — | — | EP | disclosed |
| EP-2758987-B1 | METHOD OF FORMING A FILM | CANON KK (JP) | 2019-03-20 | — | — | EP | disclosed |
| US-10233274-B2 | Curable composition and patterning method using the same | CANON KABUSHIKI KAISHA (JP) | 2019-03-19 | — | — | US | disclosed |
| EP-1750176-A2 | Positive-type radiation-sensitive resin composition for producing a metal-plating formed material, transcription film and production method of a metal-plating formed material | JSR Corporation (JP) | 2007-02-07 | — | — | EP | disclosed |
| US-7060414-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2006-06-13 | — | — | US | disclosed |
| US-20060078821-A1 | A caroboxyalkylanthracene based compound, a hydroxy or alkoxystyrene polymer, and a sulfonimide compound as photoacid generator; low sublimation properties and excellent compatibility with other components; exhibits optimum controllability of radiation transmittance; microfabrication | JSR CORPORATION (JP) | 2006-04-13 | — | — | US | disclosed |
| EP-1640804-A2 | Positive-tone radiation-sensitive resin composition | JSR Corporation (JP) | 2006-03-29 | — | — | EP | disclosed |
| US-20050158657-A1 | Radiation-sensitive resin composition | SUZUKI AKI (JP) | 2005-07-21 | — | — | US | disclosed |
| US-6899989-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-05-31 | — | — | US | disclosed |
| US-20050095527-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2005-05-05 | — | — | US | disclosed |
| US-20030157423-A1 | Copolymer, polymer mixture, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2003-08-21 | — | — | US | disclosed |
| US-20020090569-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-07-11 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10421853-B2 | Photosensitive gas generating agent and photocurable composition | PFN1, PFAS, FRG1 | HSD17B2 3992/4885HSD11B1 4332/4885HSD17B3 4273/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.