SCHEMBL4532806

SCHEMBL4532806

O=S(=O)([O-])CCCC(=S)C(=S)CCCS(=O)(=O)[O-].[Na+].[Na+]

nearest known ligand 0.48

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.48
TSHR P16473 2/20 0.48
GMNN O75496 1/20 0.48
LMNA P02545 1/20 0.48
TP53 P04637 1/20 0.48
MAPK1 P28482 1/20 0.48
THPO P40225 1/20 0.48
HBB P68871 1/20 0.48
PMP22 Q01453 1/20 0.48
SMN1; SMN2 Q16637 1/20 0.48
KDM4E B2RXH2 1/20 0.40
MAPT P10636 1/20 0.40
ALOX15 P16050 1/20 0.40
BBOX1 O75936 2/20 0.39
ENPEP Q07075 2/20 0.38
MEN1 O00255 1/20 0.32
KMT2A Q03164 1/20 0.32
EPHX2 P34913 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29902977 0.76 GMNN (0.40) ALDH1A1TSHRGMNNLMNATP53
SCHEMBL5022357 0.75 CA1 (0.48) ALDH1A1TSHRGMNNLMNATP53
SCHEMBL917845 0.74 ALDH1A1 (0.67) ALDH1A1TSHRGMNNLMNATP53
Eprodisate SCHEMBL293813 0.74 ALDH1A1 (0.67) ALDH1A1TSHRGMNNLMNATP53
SCHEMBL29398301 0.73 ALDH1A1 (0.46) ALDH1A1TSHRGMNNLMNATP53
SCHEMBL2859772 0.72 GMNN (0.36) ALDH1A1TSHRGMNNLMNATP53
SCHEMBL3386062 0.72 TSHR (0.63) ALDH1A1TSHRGMNNLMNATP53
SCHEMBL921255 0.72 TSHR (0.63) ALDH1A1TSHRGMNNLMNATP53
SCHEMBL2289785 0.72 TSHR (0.63) ALDH1A1TSHRGMNNLMNATP53
SCHEMBL3385778 0.72 TSHR (0.63) ALDH1A1TSHRGMNNLMNATP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2010698-B1 PROCESS FOR ELECTROLYTICALLY PLATING COPPER MACDERMID INC (US) 2013-07-03 EP disclosed
US-7575666-B2 electrodeposition of copper metal on a very small printed circuit and carry out in confined spaces; pre-treatment solution contains anti-suppressor disodium bis(3-sulfopropyl) disulfide; lower the surface tension with surfactant or wetting agent CITIBANK, N.A. 2009-08-18 US disclosed
US-20070235343-A1 Process for electrolytically plating copper CITIBANK, N.A. 2007-10-11 US disclosed