Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NFKB1 | P19838 | 1/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.37 |
| ▸ | GRIN2D | O15399 | 2/20 | 0.36 |
| ▸ | GRIN3B | O60391 | 2/20 | 0.36 |
| ▸ | GRIN1 | Q05586 | 2/20 | 0.36 |
| ▸ | GRIN2A | Q12879 | 2/20 | 0.36 |
| ▸ | GRIN2B | Q13224 | 2/20 | 0.36 |
| ▸ | GRIN2C | Q14957 | 2/20 | 0.36 |
| ▸ | GRIN3A | Q8TCU5 | 2/20 | 0.36 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
| ▸ | AXL | P30530 | 1/20 | 0.35 |
| ▸ | TNF | P01375 | 1/20 | 0.35 |
| ▸ | IL6 | P05231 | 1/20 | 0.35 |
| ▸ | MAOB | P27338 | 5/20 | 0.33 |
| ▸ | P4HB | P07237 | 1/20 | 0.33 |
| ▸ | ABCG2 | Q9UNQ0 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | KIF11 | P52732 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16958175 | 0.87 | ALDH1A1 (0.41) | NFKB1ALDH1A1 | |
| SCHEMBL4074263 | 0.81 | APP (0.31) | — | |
| SCHEMBL29446986 | 0.80 | NFKB1 (0.52) | NFKB1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL165004 | 0.80 | NFKB1 (0.52) | NFKB1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL5963736 | 0.79 | NFKB1 (0.39) | NFKB1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL28332824 | 0.79 | NFE2L2 (0.38) | ALDH1A1 | |
| SCHEMBL1600817 | 0.79 | PIM1 (0.43) | NFKB1HSD11B1GRIN2DGRIN3BGRIN1 | |
| SCHEMBL25090393 | 0.78 | P2RX7 (0.44) | NFKB1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL7031301 | 0.78 | NFKB1 (0.42) | NFKB1GRIN2DGRIN3BGRIN1GRIN2A | |
| SCHEMBL7031294 | 0.78 | ERN1 (0.36) | NFKB1ALDH1A1LMNAPOLBTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 150 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119819370-A | Preparation method of photocatalytic degradation material for treating acid chrome blue K sewage | 北方工业大学 | 2025-04-15 | — | — | CN | claimed |
| CN-119819370-A | Preparation method of photocatalytic degradation material for treating acid chrome blue K sewage | 北方工业大学 | 2025-04-15 | — | — | CN | disclosed |
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-04-18 | — | — | US | disclosed |
| US-20240043593-A1 | Fluorine-Containing Polymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-02-08 | — | — | US | disclosed |
| CN-116848162-A | Fluorine-containing polymer | 中央硝子株式会社 | 2023-10-03 | — | — | CN | disclosed |
| CN-116694256-A | Special resin adhesive for vehicle-gauge-level power soft-package tab and preparation method thereof | 浙江文壹先端新材料有限公司 | 2023-09-05 | — | — | CN | disclosed |
| CN-112585113-B | Process for distillative purification of fluorine-containing polymerizable monomers | 中央硝子株式会社 | 2023-08-22 | — | — | CN | disclosed |
| CN-116615410-A | Method for producing fluorine-containing polymer and composition | 中央硝子株式会社 | 2023-08-18 | — | — | CN | disclosed |
| US-20230159766-A1 | CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230159766-A1 | CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-25 | — | — | US | disclosed |
| US-8193285-B2 | Block copolymers | NIPPON SODA CO., LTD. (JP) | 2012-06-05 | — | — | US | disclosed |
| CN-102449000-A | Fluorine-containing compound, fluorine-containing polymer compound, resist composition, top coat composition and pattern formation method | CENTRAL GLASS CO LTD | 2012-05-09 | — | — | CN | disclosed |
| US-20120077126-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-29 | — | — | US | disclosed |
| US-20120064459-A1 | Water Repellent Additive for Immersion Resist | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-03-15 | — | — | US | disclosed |
| US-20120040294-A1 | Top Coating Composition | CENTRAL GLASS COMPANY, LIMITED (JP) | 2012-02-16 | — | — | US | disclosed |
| US-20110245395-A1 | Top Coat Composition | CENTRAL GLASS COMPANY, LIMITED | 2011-10-06 | — | — | US | disclosed |
| US-20110244188-A1 | Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation | Central Glass Company , Limited (JP) | 2011-10-06 | — | — | US | disclosed |
| US-20090253867-A1 | BLOCK COPOLYMERS | NIPPON SODA CO., LTD. (JP) | 2009-10-08 | — | — | US | disclosed |
| EP-2019120-A1 | BLOCK COPOLYMERS | Nippon Soda Co., Ltd. (JP) | 2009-01-28 | — | — | EP | disclosed |
| WO-1998000750-A1 | PROCESS FOR PRODUCING LIQUID CRYSTAL ALIGNMENT LAYER AND LIQUID CRYSTAL DISPLAY DEVICE WITH THE USE OF THE SAME | HOECHST RESEARCH & TECHNOLOGY DEUTSCHLAND GMBH & CO. KG (DE) | 1998-01-08 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110244188-A1 | Polymerizable Fluoromonomer, Fluoropolymer, Resist Material, and Method of Pattern Formation | AFF1, FRG1, AFF2 | NFKB1 4145/4885HSD11B1 4170/4885GRIN2D 86/4885 |
| US-20120077126-A1 | Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition, Top Coat Composition And Pattern Formation Method | FRG1, AFF2, FBXL19 | NFKB1 4274/4885HSD11B1 4483/4885GRIN2D 770/4885 |
| US-20240124632-A1 | Method for Producing Fluorine-Containing Polymer and Composition | PFAS, AFF2, AFF1 | NFKB1 4144/4885HSD11B1 1754/4885GRIN2D 1543/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.