SCHEMBL4690291

SCHEMBL4690291

C=C(C)C(=O)OC1CC2CCC1C1C(=O)OCC21

nearest known ligand 0.34

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
GPX4 P36969 1/20 0.32
KDM4E B2RXH2 1/20 0.32
NPC1 O15118 1/20 0.32
POLB P06746 1/20 0.32
MAPT P10636 1/20 0.32
PKM P14618 1/20 0.32
HTT P42858 1/20 0.32
RECQL P46063 1/20 0.32
RAB9A P51151 1/20 0.32
ATM Q13315 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.30
CYP3A4 P08684 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL75164 0.91 GPX4 (0.33) GPX4KDM4ENPC1POLBMAPT
SCHEMBL304319 0.90 GPX4 (0.33) GPX4KDM4ENPC1POLBMAPT
SCHEMBL75010 0.85 GPX4 (0.34) GPX4KDM4ENPC1POLBMAPT
SCHEMBL18400928 0.85 GPX4 (0.34) GPX4KDM4ENPC1POLBMAPT
SCHEMBL4689491 0.81
SCHEMBL3809880 0.81 GPX4 (0.33) GPX4KDM4ENPC1POLBMAPT
SCHEMBL3803250 0.79 GPX4 (0.33) GPX4KDM4ENPC1POLBMAPT
SCHEMBL4687098 0.77 GPX4 (0.34) GPX4KDM4ENPC1POLBMAPT
SCHEMBL6467663 0.77 ALDH1A1 (0.35) ALDH1A1
SCHEMBL4688020 0.77 GPX4 (0.32) GPX4KDM4ENPC1POLBMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200089116-A1 Fluorine-Containing Monomer, Fluorine-Containing Polymer, Pattern Forming Composition Using Same, and Pattern Forming Method of Same CENTRAL GLASS COMPANY, LIMITED (JP) 2020-03-19 US disclosed
EP-1352904-B1 (METH)ACRYLATE ESTERS, STARTING ALCOHOLS FOR THE PREPARATION THEREOF, PROCESSES FOR PREPARING BOTH, POLYMERS OF THE ESTERS, CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS, AND METHOD FOR FORMING PATTERNS MITSUBISHI RAYON CO (JP) 2008-10-08 EP disclosed
US-7339014-B2 (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern MITSUBISHI RAYON CO., LTD. (JP) 2008-03-04 US disclosed
US-7041838-B2 (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns MITSUBISHI RAYON CO., LTD. (JP) 2006-05-09 US disclosed
US-20050113538-A1 (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern MITSUBISHI RAYON CO.,LTD. (JP) 2005-05-26 US disclosed
US-6746818-B2 (METH)ACRYLATE COMPOUNDS HAVING A NORBORNANE, BICYCLO(2.2.2) OCTANE, 7-OXANORBORNANE OR CYCLOHEXANE RING STRUCTURE AND A GAMMA-BUTYROLACTONE RING STRUCTURE CONNECTED TOGETHER BY A LINKER, USEFUL IN FORMING POLYMER WITH HIGH TRANSPARENCY SHIN-ETSU CHEMICAL CO., LTD. (JP) 2004-06-08 US disclosed
US-20040063882-A1 (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns MITSUBISHI CHEMICAL CORPORATION (JP) 2004-04-01 US disclosed
EP-1352904-A1 (METH)ACRYLATE ESTERS, STARTING ALCOHOLS FOR THE PREPARATION THEREOF, PROCESSES FOR PREPARING BOTH, POLYMERS OF THE ESTERS, CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS, AND METHOD FOR FORMING PATTERNS Mitsubishi Rayon Co., Ltd. (JP) 2003-10-15 EP disclosed
US-20030008232-A1 Novel (meth) acrylates having lactone structure, polymers, photoresist compositions and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2003-01-09 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040063882-A1 (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns ADH1A, ADH1C, ADH5 GPX4 2271/4885KDM4E 698/4885NPC1 4812/4885
US-20030008232-A1 Novel (meth) acrylates having lactone structure, polymers, photoresist compositions and patterning process MMAB, MBTD1, STK17A GPX4 4663/4885KDM4E 1396/4885NPC1 4805/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.