Known targets — ChEMBL curated mechanism
ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 known ✓ | P00918 | 1/20 | 0.38 |
| ▸ | CA4 known ✓ | P22748 | 1/20 | 0.38 |
| ▸ | PTGS1 known ✓ | P23219 | 1/20 | 0.34 |
| ▸ | PTGS2 known ✓ | P35354 | 1/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.47 |
| ▸ | HPGD | P15428 | 2/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | FABP1 | P07148 | 1/20 | 0.39 |
| ▸ | CTNNB1 | P35222 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.36 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.36 |
| ▸ | IRAK4 | Q9NWZ3 | 1/20 | 0.36 |
| ▸ | MEN1 | O00255 | 1/20 | 0.35 |
| ▸ | POLB | P06746 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | PKLR | P30613 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29380286 | 1.00 | KDM4E (0.47) | KDM4EALDH1A1HPGDL3MBTL1SLC22A6 | |
| SCHEMBL291629 | 1.00 | KDM4E (0.47) | KDM4EALDH1A1HPGDL3MBTL1SLC22A6 | |
| SCHEMBL30595394 | 1.00 | KDM4E (0.47) | KDM4EALDH1A1HPGDL3MBTL1SLC22A6 | |
| Water SCHEMBL27557581 | 0.98 | KDM4E (0.46) | KDM4EALDH1A1HPGDL3MBTL1SLC22A6 | |
| SCHEMBL38652300 | 0.98 | KDM4E (0.46) | KDM4EALDH1A1HPGDL3MBTL1SLC22A6 | |
| Potassium Ion SCHEMBL9114094 | 0.96 | KDM4E (0.42) | KDM4EALDH1A1HPGDL3MBTL1SLC22A6 | |
| SCHEMBL3169148 | 0.96 | KDM4E (0.42) | KDM4EALDH1A1HPGDL3MBTL1SLC22A6 | |
| SCHEMBL7065753 | 0.96 | KDM4E (0.42) | KDM4EALDH1A1HPGDL3MBTL1SLC22A6 | |
| Lithium Ion SCHEMBL10680313 | 0.96 | KDM4E (0.42) | KDM4EALDH1A1HPGDL3MBTL1SLC22A6 | |
| SCHEMBL20166759 | 0.96 | KDM4E (0.42) | KDM4EALDH1A1HPGDL3MBTL1SLC22A6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 247 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121583646-A | Composite conductive material and preparation method and application thereof | 广东电网有限责任公司惠州供电局 | 2026-02-27 | — | — | CN | claimed |
| CN-119980383-A | Technological method for micro-arc oxidation and galvanized iron alloy of magnesium alloy workpiece | 广州超邦化工有限公司 | 2025-05-13 | — | — | CN | claimed |
| CN-119980382-A | Process for preparing neodymium-iron-boron permanent magnet potassium chloride galvanized iron alloy | 广州超邦化工有限公司 | 2025-05-13 | — | — | CN | claimed |
| CN-119114010-B | Preparation method of low-carbon alcohol adsorbent | 山东齐鲁华信高科有限公司 | 2025-05-02 | — | — | CN | claimed |
| CN-119876948-A | Potassium chloride galvanized iron alloy process for magnesium alloy part | 广州超邦化工有限公司 | 2025-04-25 | — | — | CN | claimed |
| CN-119060622-B | Water-based two-component polyurethane varnish and preparation method and application method thereof | 广东优贝精细化工有限公司 | 2025-04-25 | — | — | CN | claimed |
| CN-119711184-A | Polyaniline modified cotton fabric and preparation method thereof | 盐城工学院 | 2025-03-28 | — | — | CN | claimed |
| CN-119685891-A | Potassium zinc iron chloride alloy plating solution and electroplating process | 广州超邦化工有限公司 | 2025-03-25 | — | — | CN | claimed |
| CN-115097062-B | Determination method for alkalinity and sodium aluminate concentration in secondary aluminum ash hydrolysate and application thereof | 广东至道先进土木工程材料技术研究有限公司 | 2025-01-17 | — | — | CN | claimed |
| CN-119114010-A | Preparation method of low-carbon alcohol adsorbent | 山东齐鲁华信高科有限公司 | 2024-12-13 | — | — | CN | claimed |
| CN-1306671-A | Method for removing thermal-hardened frit seal to be used for assembling electronic parts | LEE KI WON (KR) | 2001-08-01 | — | — | CN | claimed |
| US-6194365-B1 | Composition for cleaning and etching electronic display and substrate | INNOROOT CO., LTD. (KR) | 2001-02-27 | — | — | US | claimed |
| EP-1053559-A1 | A METHOD FOR REMOVING THE THERMAL-HARDENED FRIT SEAL TO BE USED FOR ASSEMBLING ELECTRONIC PARTS | Lee, Ki Won (KR) | 2000-11-22 | — | — | EP | claimed |
| WO-1999034388-A1 | A METHOD FOR REMOVING THE THERMAL-HARDENED FRIT SEAL TO BE USED FOR ASSEMBLING ELECTRONIC PARTS | LEE KI WON (KR) | 1999-07-08 | — | — | WO | claimed |
| CN-1216059-A | COMPOSITION FOR CLEANING AND ETCHING ELECTRONIC DISPLAY AND SUBSTRATE | LEE KI WON (KR) | 1999-05-05 | — | — | CN | claimed |
| EP-0892840-A1 | A COMPOSITION FOR CLEANING AND ETCHING ELECTRONIC DISPLAY AND SUBSTRATE | Lee, Ki Won (KR) | 1999-01-27 | — | — | EP | claimed |
| WO-1998031768-A1 | A COMPOSITION FOR CLEANING AND ETCHING ELECTRONIC DISPLAY AND SUBSTRATE | LEE KI WON (KR) | 1998-07-23 | — | — | WO | claimed |
| EP-0277273-A1 | Diazotype compositions | Andrews Paper and Chemical Co., Inc. (US) | 1988-08-10 | — | — | EP | claimed |
| US-4572889-A | POST-DEVELOPMENT TREATMENT WITH MALIC ACID OR SALT | FUJI PHOTO FILM CO., LTD. (JP) | 1986-02-25 | — | — | US | claimed |
| US-4287297-A | WHEREIN THE COMPOSITION CONTAINS A SODIUM SALT OF AN AROMATIC ACID OR SULFONIC ACID | DAICEL CHEMICAL INDUSTRIES LTD. (JP) | 1981-09-01 | — | — | US | claimed |