Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.46 |
| ▸ | MEN1 | O00255 | 3/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.45 |
| ▸ | SIGMAR1 | Q99720 | 2/20 | 0.44 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.44 |
| ▸ | TSHR | P16473 | 1/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.44 |
| ▸ | PSMB1 | P20618 | 1/20 | 0.44 |
| ▸ | PSMB5 | P28074 | 1/20 | 0.44 |
| ▸ | PSMB2 | P49721 | 1/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL65238 | 0.98 | SIGMAR1 (0.46) | KMT2AMEN1NPSR1SIGMAR1CYP1A2 | |
| SCHEMBL501543 | 0.87 | MEN1 (0.42) | KMT2AMEN1NPSR1SIGMAR1CYP1A2 | |
| SCHEMBL502078 | 0.85 | MEN1 (0.41) | KMT2AMEN1NPSR1SIGMAR1CYP1A2 | |
| SCHEMBL501651 | 0.85 | SIGMAR1 (0.42) | KMT2AMEN1NPSR1SIGMAR1CYP1A2 | |
| SCHEMBL12014417 | 0.84 | KMT2A (0.45) | KMT2AMEN1SIGMAR1CYP1A2CYP2D6 | |
| SCHEMBL501261 | 0.83 | SIGMAR1 (0.41) | KMT2AMEN1NPSR1SIGMAR1CYP1A2 | |
| SCHEMBL146725 | 0.83 | ALDH1A1 (0.54) | KMT2ACYP1A2KDM4EHPGD | |
| SCHEMBL13402787 | 0.83 | KDM4E (0.49) | KMT2AMEN1SIGMAR1CYP1A2CYP2D6 | |
| SCHEMBL12014418 | 0.82 | SIGMAR1 (0.44) | KMT2AMEN1SIGMAR1CYP1A2CYP2D6 | |
| SCHEMBL18232025 | 0.82 | SIGMAR1 (0.44) | KMT2AMEN1NPSR1SIGMAR1CYP1A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20180092915-A1 | SODIUM CHANNEL BLOCKERS FOR SKIN DISORDERS | PARION SCIENCES, INC. (US) | 2018-04-05 | — | — | US | disclosed |
| US-20180092915-A1 | SODIUM CHANNEL BLOCKERS FOR SKIN DISORDERS | PARION SCIENCES, INC. (US) | 2018-04-05 | — | — | US | disclosed |
| US-9849129-B2 | Sodium channel blockers for skin disorders | PARION SCIENCES, INC. (US) | 2017-12-26 | — | — | US | disclosed |
| US-9849129-B2 | Sodium channel blockers for skin disorders | PARION SCIENCES, INC. (US) | 2017-12-26 | — | — | US | disclosed |
| US-20170020870-A1 | SODIUM CHANNEL BLOCKERS FOR SKIN DISORDERS | PARION SCIENCES, INC. | 2017-01-26 | — | — | US | disclosed |
| WO-2016133967-A2 | SODIUM CHANNEL BLOCKERS FOR SKIN DISORDERS | PARION SCIENCES, INC. (US) | 2016-08-25 | — | — | WO | disclosed |
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| US-8945809-B2 | Fluorinated monomer, fluorinated polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-02-03 | — | — | US | disclosed |
| US-8933251-B2 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-01-13 | — | — | US | disclosed |
| US-8728707-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-05-20 | — | — | US | disclosed |
| US-7670751-B2 | Photoacid generator, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-03-02 | — | — | US | disclosed |
| US-20090274978-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-05 | — | — | US | disclosed |
| US-20090274984-A1 | CARBOXYL-CONTAINING LACTONE COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-05 | — | — | US | disclosed |
| US-20090246686-A1 | POLYMER, POLYMER PREPARATION METHOD, RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-01 | — | — | US | disclosed |
| US-20090143368-A1 | Use of Cinnamoyl Compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-06-04 | — | — | US | disclosed |
| EP-2033966-A2 | Movel photoacid generators, resist compositons, and patterning processes | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-03-11 | — | — | EP | disclosed |
| US-20090061358-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | PROXIMAL SYSTEMS CORPORATION | 2009-03-05 | — | — | US | disclosed |
| EP-1857104-A1 | USE OF CINNAMOYL COMPOUND | Sumitomo Chemical Company, Limited (JP) | 2007-11-21 | — | — | EP | disclosed |
| US-20070265228-A1 | Cinnamoyl compound and use of the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-11-15 | — | — | US | disclosed |
| US-20070265228-A1 | Cinnamoyl compound and use of the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-11-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180092915-A1 | SODIUM CHANNEL BLOCKERS FOR SKIN DISORDERS | SCNN1B, SCNN1A, SCNN1G | KMT2A 3665/4885MEN1 1509/4885NPSR1 1199/4885 |
| US-20090061358-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | RER1, CRY1, CYP21A2 | KMT2A 3509/4885MEN1 718/4885NPSR1 958/4885 |
| US-20090274984-A1 | CARBOXYL-CONTAINING LACTONE COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | WDR1, EGLN1, RER1 | KMT2A 463/4885MEN1 1074/4885NPSR1 3751/4885 |
| US-20090274978-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | CYP21A2, C1S, C1R | KMT2A 2308/4885MEN1 1211/4885NPSR1 1134/4885 |
| US-20070265228-A1 | Cinnamoyl compound and use of the same | NPC1, CES2, CYP51A1 | KMT2A 3443/4885MEN1 876/4885NPSR1 1445/4885 |
| US-20170020870-A1 | SODIUM CHANNEL BLOCKERS FOR SKIN DISORDERS | SCNN1B, SCNN1A, SCNN1G | KMT2A 3665/4885MEN1 1509/4885NPSR1 1199/4885 |
| US-20090143368-A1 | Use of Cinnamoyl Compound | COL2A1, COL1A1, SMAD2 | KMT2A 2275/4885MEN1 3367/4885NPSR1 3109/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.