Edetic Acid

Edetic Acid

SCHEMBL5389310

O.O=C(O)CN(CCN(CC(=O)O)CC(=O)O)CC(=O)O.[KH].[KH].[KH]

nearest known ligand 0.88

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Edetic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ACE known ✓ P12821 1/20 0.88
▸ CHRM2 known ✓ P08172 1/20 0.82
▸ ADRA2A known ✓ P08913 1/20 0.82
▸ SLC6A2 known ✓ P23975 1/20 0.82
▸ SLC6A4 known ✓ P31645 1/20 0.82
▸ ADRA1A known ✓ P35348 1/20 0.82
▸ DRD3 known ✓ P35462 1/20 0.82
▸ SLC6A3 known ✓ Q01959 1/20 0.82
▸ TDP1 Q9NUW8 2/20 0.88
▸ EYA2 O00167 1/20 0.88
▸ APP P05067 1/20 0.88
▸ BLM P54132 2/20 0.82
▸ PMP22 Q01453 2/20 0.82
▸ KDM4E B2RXH2 2/20 0.82
▸ ALOX15 P16050 2/20 0.82
▸ TSHR P16473 2/20 0.82
▸ LMNA P02545 1/20 0.82
▸ DRD1 P21728 1/20 0.82
▸ CYP2C19 P33261 1/20 0.82
▸ HRH3 Q9Y5N1 1/20 0.82

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Edetic Acid SCHEMBL5391298 1.00 TDP1 (0.88) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL1592927 1.00 TDP1 (0.88) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL120660 0.97 TDP1 (0.93) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL4287868 0.97 TDP1 (0.93) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL11181102 0.97 TDP1 (0.93) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL537771 0.97 TDP1 (0.93) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL1007448 0.97 TDP1 (0.93) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL1933603 0.97 TDP1 (0.93) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL9640564 0.97 TDP1 (0.93) TDP1EYA2APPACEBLM
Edetic Acid SCHEMBL464945 0.97 TDP1 (0.93) TDP1EYA2APPACEBLM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7196211-B2 Hafnium-containing material for film formation, method for producing the same, and method for producing hafnium-containing thin film using the same MITSUBISHI MATERIALS CORPORATION (JP) 2007-03-27 — — US disclosed
US-20050065358-A1 Hafnium-containing material for film formation, method for producing the same, and method for producing hafnium-containing thin film using the same MITSUBISHI MATERIALS CORPORATION (JP) 2005-03-24 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20050065358-A1 Hafnium-containing material for film formation, method for producing the same, and method for producing hafnium-containing thin film using the same PUF60, HAO2, RTF1 ACE 4432/4885CHRM2 4584/4885ADRA2A 4665/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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