SCHEMBL6052059

SCHEMBL6052059

O=C([O-])c1ccc2[nH]nnc2c1.[Na+]

nearest known ligand 0.39

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
CA2 known ✓ P00918 12/20 0.38
CA1 known ✓ P00915 11/20 0.38
CA4 known ✓ P22748 1/20 0.35
PARP1 P09874 2/20 0.39
CD40 P25942 1/20 0.38
CD40LG P29965 1/20 0.38
HIPK2 Q9H2X6 5/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Potassium Ion SCHEMBL6052122 0.97 CD40 (0.38) PARP1CA2CA1CD40CD40LG
Silver SCHEMBL8424374 0.97 CD40 (0.38) PARP1CA2CA1CD40CD40LG
SCHEMBL119640 0.82 TDP1 (0.44) CA2CA1CA4
Water SCHEMBL30938808 0.81 TDP1 (0.43) CA2CA1CD40CD40LGCA4
SCHEMBL446291 0.81 MMP2 (0.42) CD40CD40LG
Ammonia Solution, Strong SCHEMBL6052079 0.81 TDP1 (0.43) CA2CA1CD40CD40LGCA4
SCHEMBL8424370 0.81 TDP1 (0.43) CA2CA1CD40CD40LGCA4
SCHEMBL3726621 0.81 SLC2A1 (0.41) CD40CD40LG
SCHEMBL7325912 0.81 CD40 (0.38) CD40CD40LG
SCHEMBL9172322 0.79 MMP2 (0.41) CD40CD40LG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1162503-B1 Method of processing silver halide color photographic light-sensitive material FUJI PHOTO FILM CO LTD (JP) 2006-03-22 EP disclosed
US-6727050-B2 COLOR PHOTOGRAPHY FUJI PHOTO FILM CO., LTD. (JP) 2004-04-27 US disclosed
US-6686141-B2 SUPPORT HAVING LIGHT-SENSITIVE SILVER HALIDE EMULSION LAYER AND A NON-LIGHT-SENSITIVE LAYER; >60% OF THE PROJECTED AREA OF HALIDE GRAINS ARE TABULAR WITH AN AVERAGE ASPECT RATIO OF >5; PAG OF 4-8.5; STORAGE STABILITY; RAPID DEVELOPMENT FUJI PHOTO FILM CO., LTD. (JP) 2004-02-03 US disclosed
US-6555299-B2 Processing the light-sensitive material such that a silver density of the at least one light-sensitive silver halide emulsion layer during development is 4 x 105 g/m3 or more FUJI PHOTO FILM CO., LTD. (JP) 2003-04-29 US disclosed
US-20030054297-A1 Silver halide photographic lightsensitive material and image forming method using the same FUJIFILM CORPORATION (JP) 2003-03-20 US disclosed
US-6432624-B1 EXPOSING MATERIAL UNDER NATURAL LIGHT OR ARTIFICIAL LIGHT; COLOR DEVELOPING THE EXPOSED MATERIAL SO THAT THE TABULAR GRAINS HAVE 3.0 OR MORE (AVERAGE) DEVELOPMENT INITIATING POINTS PER GRAIN AT THE COMPLETION OF DEVELOPMENT FUJI PHOTO FILM CO., LTD. (JP) 2002-08-13 US disclosed
US-20020086249-A1 Method of processing silver halide color photographic lightsensitive material FUJIFILM CORPORATION (JP) 2002-07-04 US disclosed
US-20020055070-A1 Silver halide photographic light-sensitive material and method of forming image therein FUJI PHOTO FILM CO., LTD. 2002-05-09 US disclosed
US-20020031731-A1 Method of processing silver halide color photographic light-sensitive material FUJIFILM CORPORATION (JP) 2002-03-14 US disclosed
EP-1162503-A2 Method of processing silver halide color photographic light-sensitive material FUJI PHOTO FILM CO., LTD. (JP) 2001-12-12 EP disclosed