SCHEMBL6140119

SCHEMBL6140119

CCc1ccc(S(=O)(=O)[O-])cc1.c1cc(COc2ccc([S+](c3ccc(OCc4ccncc4)cc3)c3ccc(OCc4ccncc4)cc3)cc2)ccn1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 0.44
ALDH1A1 P00352 2/20 0.44
SMN1; SMN2 Q16637 2/20 0.44
NR2F2 P24468 1/20 0.44
HTT P42858 1/20 0.44
RAB9A P51151 1/20 0.44
RXRA P19793 1/20 0.44
RXRB P28702 1/20 0.44
ADAMTS4 O75173 1/20 0.43
MMP13 P45452 1/20 0.43
KMT2A Q03164 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
PTPRZ1 P23471 1/20 0.42
RORC P51449 1/20 0.41
CA12 O43570 3/20 0.40
CA1 P00915 3/20 0.40
CA2 P00918 3/20 0.40
CA7 P43166 3/20 0.40
CA9 Q16790 3/20 0.40
MAOB P27338 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6140104 0.89 RORC (0.49) LMNAALDH1A1SMN1; SMN2NR2F2HTT
SCHEMBL6537310 0.88 RORC (0.48) LMNAALDH1A1SMN1; SMN2NR2F2HTT
SCHEMBL6139950 0.86 NOS3 (0.43) LMNASMN1; SMN2HTTKMT2AL3MBTL1
SCHEMBL6140400 0.85 LMNA (0.47) LMNAALDH1A1SMN1; SMN2NR2F2HTT
SCHEMBL6140517 0.82 ALDH1A1 (0.46) LMNAALDH1A1SMN1; SMN2HTTRAB9A
SCHEMBL6140238 0.82 RORC (0.44) LMNAALDH1A1SMN1; SMN2NR2F2HTT
SCHEMBL6140394 0.82 RORC (0.44) LMNAALDH1A1SMN1; SMN2NR2F2HTT
SCHEMBL8662142 0.82 RORC (0.46) LMNASMN1; SMN2HTTADAMTS4MMP13
SCHEMBL6140818 0.82 CA12 (0.42) LMNAALDH1A1SMN1; SMN2NR2F2HTT
SCHEMBL6140297 0.81 LMNA (0.44) LMNAALDH1A1SMN1; SMN2NR2F2HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6955939-B1 Memory element formation with photosensitive polymer dielectric ADVANCED MICRO DEVICES, INC. (US) 2005-10-18 US disclosed
US-6878961-B2 Photosensitive polymeric memory elements ADVANCED MICRO DEVICES, INC. (US) 2005-04-12 US disclosed
US-20050045877-A1 PHOTOSENSITIVE POLYMERIC MEMORY ELEMENTS MORGAN STANLEY SENIOR FUNDING, INC. 2005-03-03 US disclosed
US-6534243-B1 A coating containing a cleaving compound to trim resist features; permitting a deprotection region to form within an inner portion of the patterned resist; removing coating and deprotection region to provide a second patterned feature ADVANCED MICRO DEVICES, INC. 2003-03-18 US disclosed
US-6492075-B1 COATING WITH CLEAVING COMPOUND TO CONTROLLABLY DECREASE SIZE OF DEVELOPED RESIST ADVANCED MICRO DEVICES, INC. 2002-12-10 US disclosed
US-6274289-B1 Chemical resist thickness reduction process ADVANCED MICRO DEVICES, INC. 2001-08-14 US disclosed
US-5847218-A Sulfonium salts and chemically amplified positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-12-08 US disclosed