Known targets — ChEMBL curated mechanism
CACNA1CCACNA1DCACNA1FCACNA1SDPP4HTR1BHTR1D
The experimentally established mechanism targets of Benzoic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.64 |
| ▸ | DAO | P14920 | 1/20 | 0.64 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.64 |
| ▸ | CES1 | P23141 | 5/20 | 0.54 |
| ▸ | CES2 | O00748 | 4/20 | 0.54 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | MEN1 | O00255 | 2/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.50 |
| ▸ | MAPT | P10636 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.50 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.50 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | RAB9A | P51151 | 2/20 | 0.45 |
| ▸ | NPC1 | O15118 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Terephthalic Acid SCHEMBL27842309 | 0.91 | ALDH1A1 (0.60) | TSHRDAONAPRTSRD5A2ALDH1A1 | |
| Terephthalic Acid SCHEMBL31728724 | 0.91 | ALDH1A1 (0.60) | TSHRDAONAPRTSRD5A2ALDH1A1 | |
| Isophthalic Acid SCHEMBL459728 | 0.87 | CA12 (0.52) | ALDH1A1MEN1KMT2AKDM4EMAPT | |
| Benzil SCHEMBL28793382 | 0.86 | CES2 (0.64) | TSHRCES1CES2ALDH1A1MEN1 | |
| Benzoic Acid SCHEMBL1886522 | 0.86 | TSHR (0.64) | TSHRDAONAPRTCES1CES2 | |
| Benzophenone SCHEMBL5804441 | 0.86 | ALDH1A1 (0.64) | CES1CES2SRD5A2ALDH1A1MEN1 | |
| Benzophenone SCHEMBL27800808 | 0.86 | ALDH1A1 (0.64) | CES1CES2SRD5A2ALDH1A1MEN1 | |
| Benzophenone SCHEMBL490746 | 0.86 | ALDH1A1 (0.64) | CES1CES2SRD5A2ALDH1A1MEN1 | |
| Benzoic Acid SCHEMBL2400344 | 0.85 | TSHR (0.78) | TSHRDAONAPRTCES1CES2 | |
| Benzoic Acid SCHEMBL28693411 | 0.85 | TSHR (0.78) | TSHRDAONAPRTCES1CES2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 189 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0680078-B1 | Semiconductor substrate surface treatment | MITSUBISHI GAS CHEMICAL CO (JP) | 2003-03-12 | — | — | EP | claimed |
| US-5972862-A | COMPRISING A FLUORINE-CONTAINING COMPOUND, A WATER-SOLUBLE OR WATER-MISCIBLE ORGANIC SOLVENT, AN ORGANIC ACID, AND A QUATERNARY AMMONIUM SALT | MITSUBISHI GAS CHEMICAL (JP) | 1999-10-26 | — | — | US | claimed |
| US-5630904-A | Stripping and cleaning agent for removing dry-etching and photoresist residues from a semiconductor substrate, and a method for forming a line pattern using the stripping and cleaning agent | MITSUBISHI GAS CHEMICAL CO., INC. (JP) | 1997-05-20 | — | — | US | claimed |
| US-5466858-A | Ruthenium catalyst, high selectivity with a carboxylic acid | UBE INDUSTRIES, LTD. (JP) | 1995-11-14 | — | — | US | claimed |
| EP-0680078-A2 | Semiconductor substrate surface treatment | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1995-11-02 | — | — | EP | claimed |
| US-4479889-A | TREATING TO MAKE INEDIBLE | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY (US) | 1984-10-30 | — | — | US | claimed |
| US-12564543-B2 | Dental composition | KURARAY NORITAKE DENTAL INC. (JP) | 2026-03-03 | — | — | US | disclosed |
| EP-3416176-B1 | ELECTROLYTE SOLUTION FOR ELECTROLYTIC CAPACITOR AND ELECTROLYTIC CAPACITOR UTILIZING SAID ELECTROLYTE SOLUTION | SANYO CHEMICAL IND LTD (JP) | 2026-01-07 | — | — | EP | disclosed |
| US-12173149-B2 | Composite particles, kit, material, and method for producing composite particles | SUN MEDICAL CO., LTD. (JP) | 2024-12-24 | — | — | US | disclosed |
| US-12146010-B2 | Amine co-initiator mixture | ARKEMA FRANCE (FR) | 2024-11-19 | — | — | US | disclosed |
| US-20240141078-A1 | AMINE CO-INITIATOR MIXTURE | ARKEMA FRANCE (FR) | 2024-05-02 | — | — | US | disclosed |
| EP-3835329-B1 | POLYMERIZATION INITIATOR, CURABLE COMPOSITION, DENTAL MATERIAL, AND PREPARATION KIT FOR CURABLE COMPOSITION | MITSUI CHEMICALS INC (JP) | 2024-05-01 | — | — | EP | disclosed |
| US-20240091107-A1 | DENTAL COMPOSITION | KURARAY NORITAKE DENTAL INC. (JP) | 2024-03-21 | — | — | US | disclosed |
| US-4760183-A | Process for the preparation of aromatic dialkylamines | HOECHST AKTIENGESELLSCHAFT (DE) | 1988-07-26 | — | — | US | disclosed |
| US-4715976-A | QUATERNARY AMMONIUM SALT OF CARBOXYLIC ACID IN APROTIC SOLVENT | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1987-12-29 | — | — | US | disclosed |
| EP-0246825-A2 | Quaternary salt solution electrolyte for electrolytic capacitors | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1987-11-25 | — | — | EP | disclosed |
| EP-0227433-A2 | Electrolyte solution of quaternary ammonium salt for electrolytic capacitor | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1987-07-01 | — | — | EP | disclosed |
| EP-0223245-A2 | Curable compositions for dental drugs having sustained release property | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1987-05-27 | — | — | EP | disclosed |
| US-4479889-A | TREATING TO MAKE INEDIBLE | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE ARMY (US) | 1984-10-30 | — | — | US | disclosed |
| US-4247458-A | COUPLING DIAZONIUM SALT WITH DISPERSE DYE COUPLER WITH DISPLACEABLE GROUP OTHER THAN HYDROGEN | EASTMAN KODAK COMPANY (US) | 1981-01-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12146010-B2 | Amine co-initiator mixture | JMJD6, KDM2B, KDM1B | TSHR 4410/4885DAO 239/4885NAPRT 2211/4885 |
| US-20240091107-A1 | DENTAL COMPOSITION | CCT7, TAS2R42, CCT5 | TSHR 3718/4885DAO 2526/4885NAPRT 4561/4885 |
| US-20240141078-A1 | AMINE CO-INITIATOR MIXTURE | JMJD6, KDM2B, KDM1B | TSHR 4410/4885DAO 239/4885NAPRT 2211/4885 |
| US-12564543-B2 | Dental composition | CAD, ARCN1, MAT1A | TSHR 4074/4885DAO 583/4885NAPRT 4868/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.