Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PPARG | P37231 | 1/20 | 0.61 |
| ▸ | PPARD | Q03181 | 1/20 | 0.61 |
| ▸ | PPARA | Q07869 | 1/20 | 0.61 |
| ▸ | ACHE | P22303 | 4/20 | 0.57 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.54 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.54 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.54 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.54 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.54 |
| ▸ | LMNA | P02545 | 1/20 | 0.53 |
| ▸ | GAA | P10253 | 1/20 | 0.53 |
| ▸ | HTT | P42858 | 1/20 | 0.53 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.53 |
| ▸ | TUBB4A | P04350 | 2/20 | 0.49 |
| ▸ | TUBB | P07437 | 2/20 | 0.49 |
| ▸ | TUBA3C | P0DPH7 | 2/20 | 0.49 |
| ▸ | TUBA1B | P68363 | 2/20 | 0.49 |
| ▸ | TUBA4A | P68366 | 2/20 | 0.49 |
| ▸ | TUBB4B | P68371 | 2/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL477320 | 0.90 | CNR2 (0.58) | PPARGPPARDPPARAACHEKMT2A | |
| SCHEMBL16231317 | 0.90 | PPARG (0.53) | PPARGPPARDPPARAACHEKMT2A | |
| SCHEMBL25688701 | 0.90 | PPARG (0.57) | PPARGPPARDPPARAACHEKMT2A | |
| SCHEMBL24050778 | 0.89 | PPARG (0.51) | PPARGPPARDPPARAACHEKMT2A | |
| SCHEMBL16231311 | 0.86 | PPARG (0.57) | PPARGPPARDPPARAACHEKMT2A | |
| SCHEMBL22420326 | 0.86 | LMNA (0.53) | PPARGPPARDPPARAACHEKMT2A | |
| SCHEMBL25688708 | 0.86 | ALOX5 (0.57) | PPARGPPARDPPARAACHEKMT2A | |
| SCHEMBL22420293 | 0.86 | CNR2 (0.54) | PPARGPPARDPPARAACHEKMT2A | |
| SCHEMBL4818551 | 0.85 | PPARG (0.51) | PPARGPPARDPPARAACHEL3MBTL1 | |
| SCHEMBL670305 | 0.84 | PPARG (0.59) | PPARGPPARDPPARAACHEKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12378231-B2 | Small molecules as monoacylglycerol lipase (MAGL) inhibitors, compositions and use thereof | APOGEE PHARMACEUTICALS, INC. (CA) | 2025-08-05 | — | — | US | disclosed |
| US-20240294514-A1 | SMALL MOLECULES AS MONOACYLGLYCEROL LIPASE (MAGL) INHIBITORS, COMPOSITIONS AND USE THEREOF | APOGEE PHARMACEUTICALS, INC. (CA) | 2024-09-05 | — | — | US | disclosed |
| EP-3109703-B1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, AND METHOD FOR FORMING PATTERN USING SAME | TOKYO ELECTRON LTD (JP) | 2020-12-30 | — | — | EP | disclosed |
| US-10772858-B2 | Benzhydrol derivatives for the management of conditions related to hypoxia inducible factors | GEORGIA STATE UNIVERSITY RESEARCH FOUNDATION, INC. (US) | 2020-09-15 | — | — | US | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | TOKYO ELECTRON LIMITED (JP) | 2018-07-17 | — | — | US | disclosed |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-10 | — | — | US | disclosed |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | JSR CORPORATION (JP) | 2018-07-10 | — | — | US | disclosed |
| US-9971247-B2 | Pattern-forming method | OSAKA UNIVERSITY (JP) | 2018-05-15 | — | — | US | disclosed |
| US-9971247-B2 | Pattern-forming method | OSAKA UNIVERSITY (JP) | 2018-05-15 | — | — | US | disclosed |
| US-20170052449-A1 | CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND | OSAKA UNIVERSITY (JP) | 2017-02-23 | — | — | US | disclosed |
| US-20170052450-A1 | PATTERN-FORMING METHOD | OSAKA UNIVERSITY (JP) | 2017-02-23 | — | — | US | disclosed |
| US-20170052450-A1 | PATTERN-FORMING METHOD | OSAKA UNIVERSITY (JP) | 2017-02-23 | — | — | US | disclosed |
| US-20160357103-A1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, METHOD FOR FORMING PATTERN USING SAME, SEMICONDUCTOR DEVICE, MASK FOR LITHOGRAPHY, AND TEMPLATE FOR NANOIMPRINTING | TOKYO ELECTRON LIMITED (JP) | 2016-12-08 | — | — | US | disclosed |
| US-20160357103-A1 | PHOTOSENSITIZATION CHEMICAL-AMPLIFICATION TYPE RESIST MATERIAL, METHOD FOR FORMING PATTERN USING SAME, SEMICONDUCTOR DEVICE, MASK FOR LITHOGRAPHY, AND TEMPLATE FOR NANOIMPRINTING | TOKYO ELECTRON LIMITED (JP) | 2016-12-08 | — | — | US | disclosed |
| EP-1291375-B1 | Functional groups for thermal crosslinking of polymeric systems | AIR PROD & CHEM (US) | 2004-06-30 | — | — | EP | disclosed |
| EP-0939096-B1 | Functional groups for thermal crosslinking of polymeric systems | AIR PROD & CHEM (US) | 2003-11-26 | — | — | EP | disclosed |
| EP-1291375-A1 | Functional groups for thermal crosslinking of polymeric systems | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2003-03-12 | — | — | EP | disclosed |
| US-6060170-A | A POLYARYLENE ETHER MODIFIED BY ALKOXYARYLENE KETONE GROUPS CROSSLINKED TO FORM A HEAT RESISTANT, LOW DIELECTRIC, ELASTIC MODULUS ABOVE THE INCREASED GLASS TRANSITION TEMPERATURE; VERY FINE DIMENSIONED INTEGRATED CIRCUITS; REPLACES SILICA | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2000-05-09 | — | — | US | disclosed |
| EP-0939096-A2 | Functional groups for thermal crosslinking of polymeric systems | AIR PRODUCTS AND CHEMICALS, INC. (US) | 1999-09-01 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10025187-B2 | Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting | ASIC1, ASIC3, CLTA | PPARG 2621/4885PPARD 3705/4885PPARA 676/4885 |
| US-12378231-B2 | Small molecules as monoacylglycerol lipase (MAGL) inhibitors, compositions and use thereof | MGLL, PNLIP, LPL | PPARG 552/4885PPARD 737/4885PPARA 1339/4885 |
| US-20240294514-A1 | SMALL MOLECULES AS MONOACYLGLYCEROL LIPASE (MAGL) INHIBITORS, COMPOSITIONS AND USE THEREOF | MGLL, PNLIP, LPL | PPARG 552/4885PPARD 737/4885PPARA 1339/4885 |
| US-10018911-B2 | Chemically amplified resist material and resist pattern-forming method | SLC11A2, XRCC5, RAD54L | PPARG 4454/4885PPARD 4862/4885PPARA 3604/4885 |
| US-20170052449-A1 | CHEMICALLY AMPLIFIED RESIST MATERIAL, PATTERN-FORMING METHOD, COMPOUND, AND PRODUCTION METHOD OF COMPOUND | RER1, POLR1A, FEM1B | PPARG 3955/4885PPARD 4680/4885PPARA 2473/4885 |
| US-10772858-B2 | Benzhydrol derivatives for the management of conditions related to hypoxia inducible factors | HIF1A, HIF1AN, EGLN2 | PPARG 148/4885PPARD 555/4885PPARA 540/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.