SCHEMBL675857

SCHEMBL675857

Cc1cc(O)cc(C)c1Cc1c(C)cc(O)cc1C

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 4/20 0.50
CHRM1 P11229 1/20 0.50
ALOX15 P16050 1/20 0.50
MAOA P21397 1/20 0.50
TBXA2R P21731 1/20 0.50
ADRA1A P35348 1/20 0.50
HTR2B P41595 1/20 0.50
ALDH1A1 P00352 1/20 0.43
ACHE P22303 2/20 0.39
MEN1 O00255 1/20 0.39
HSP90AA1 P07900 1/20 0.39
KMT2A Q03164 1/20 0.39
ATM Q13315 1/20 0.39
BACE1 P56817 1/20 0.39
SIRT1 Q96EB6 1/20 0.39
THRA P10827 1/20 0.38
THRB P10828 1/20 0.38
APP P05067 1/20 0.38
MAOB P27338 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16904621 0.92 ALDH1A1 (0.50) CYP3A4CHRM1ALOX15MAOATBXA2R
SCHEMBL27645322 0.81 THRA (0.58) THRATHRBESR1ESR2
SCHEMBL9154785 0.81 CYP3A4 (0.39) CYP3A4CHRM1ALOX15MAOATBXA2R
SCHEMBL3469757 0.80 CYP3A4 (0.48) CYP3A4CHRM1ALOX15MAOATBXA2R
SCHEMBL6285400 0.80 CYP3A4 (0.48) CYP3A4CHRM1ALOX15MAOATBXA2R
SCHEMBL12671647 0.80 CYP3A4 (0.48) CYP3A4CHRM1ALOX15MAOATBXA2R
SCHEMBL12305674 0.79 CYP3A4 (0.42) CYP3A4CHRM1ALOX15MAOATBXA2R
SCHEMBL8999606 0.79 ALDH1A1 (0.42) CYP3A4CHRM1ALOX15MAOATBXA2R
SCHEMBL11589520 0.79 THRA (0.49) ALDH1A1THRATHRBESR2GAA
SCHEMBL27516433 0.79 THRB (0.49) ALOX15ALDH1A1ACHEMEN1HSP90AA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 252 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260132240-A1 LINEAR BLOCK COPOLYMER AND CURABLE THERMOSETTING COMPOSITION COMPRISING THE LINEAR BLOCK COPOLYMER SHPP GLOBAL TECH B V (NL) 2026-05-14 US disclosed
EP-3636692-B1 POLY(ARYLENE ETHER) COPOLYMER SHPP GLOBAL TECH BV (NL) 2026-04-29 EP disclosed
US-20260071103-A1 Anionic Curable Compositions DESIGNER MOLECULES INC (US) 2026-03-12 US disclosed
US-20260071104-A1 Anionic Curable Compositions DESIGNER MOLECULES INC (US) 2026-03-12 US disclosed
US-12503593-B2 Curable thermosetting composition including poly(arylene ether) copolymer SHPP GLOBAL TECHNOLOGIES B.V. (NL) 2025-12-23 US disclosed
WO-2025224628-A1 POLYFUNCTIONAL POLY(ARYLENE ETHERS) AND CURABLE COMPOSITIONS THEREOF SHPP GLOBAL TECHNOLOGIES B.V. (NL) 2025-10-30 WO disclosed
EP-3919545-B1 CURABLE THERMOSETTING COMPOSITION INCLUDING POLY(ARYLENE ETHER) COPOLYMER SHPP GLOBAL TECH BV (NL) 2025-10-22 EP disclosed
EP-3885392-B1 FUNCTIONALIZED POLY(ARYLENE ETHER) COPOLYMER, METHOD OF MAKING AND ARTICLES OBTAINED THEREFROM SHPP GLOBAL TECH BV (NL) 2025-07-02 EP disclosed
US-20250197542-A1 COPOLYMERS DERIVED FROM DICYCLOPENTADIENE SHPP GLOBAL TECH BV (NL) 2025-06-19 US disclosed
CN-115698131-B Curable thermoset compositions comprising poly (arylene ether) copolymers 高新特殊工程塑料全球技术有限公司 2025-06-17 CN disclosed
US-20030211421-A1 Optically active compound and photosensitive resin composition KRI, INC. (JP) 2003-11-13 US disclosed
US-6448383-B2 CONDENSING, IN AN ORGANIC SOLVENT OTHER THAN AMIDE, POLYHYDRIC PHENOLIC COMPOUND AND 1,2-NAPHTHOQUINONEDIAZIDE SULFONIC ACID HALIDE IN THE PRESENCE OF ORGANIC AMINE; ADDING AMIDE SOLVENT; SEPARATING THE AMINE ACID SALT TOYO GOSEI KOGYO CO., LTD. (JP) 2002-09-10 US disclosed
US-20010049433-A1 Method for producing 1,2-naphthoquinonediazide photosensitive agent TOYO GOSEI KOGYO CO., LTD. (JP) 2001-12-06 US disclosed
EP-1153915-A2 Method for producing 1,2-naphthoquinone-diazide photosensitive agent Toyo Gosei Kogyo Co., Ltd. (JP) 2001-11-14 EP disclosed
EP-0589427-B1 Thermosensitive recording medium DAINIPPON INK & CHEMICALS (JP) 1997-03-12 EP disclosed
US-5518982-A SOLID SOLUTION, IMPROVED IMAGE STABILITY, PAPER FOR FACSIMILE, THERMAL PRINTING DAINIPPON INK AND CHEMICALS, INC. (JP) 1996-05-21 US disclosed
EP-0589427-A2 Thermosensitive recording medium DAINIPPON INK AND CHEMICALS, INC. (JP) 1994-03-30 EP disclosed
EP-0213465-B1 POLYCARBONATE-POLYETHER BLOCK COPOLYMERS, POLYMER BLENDS CONTAINING SAME AND INTERMEDIATES FOR THE PRODUCTION THEREOF GENERAL ELECTRIC COMPANY (US) 1989-06-21 EP disclosed
US-4663399-A ENDCAPPING GENERAL ELECTRIC COMPANY (US) 1987-05-05 US disclosed
EP-0213465-A2 Polycarbonate-polyether block copolymers, polymer blends containing same and intermediates for the production thereof GENERAL ELECTRIC COMPANY (US) 1987-03-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260071104-A1 Anionic Curable Compositions VCL, ITGA8, GABRE CYP3A4 4290/4885CHRM1 397/4885ALOX15 2269/4885
US-20260071103-A1 Anionic Curable Compositions CDH1, ESD, SETD2 CYP3A4 4573/4885CHRM1 1151/4885ALOX15 1506/4885
US-20030211421-A1 Optically active compound and photosensitive resin composition ARCN1, RAD51, PAM CYP3A4 2999/4885CHRM1 143/4885ALOX15 336/4885
US-20260132240-A1 LINEAR BLOCK COPOLYMER AND CURABLE THERMOSETTING COMPOSITION COMPRISING THE LINEAR BLOCK COPOLYMER CBLB, UBE4A, PSMD14 CYP3A4 1750/4885CHRM1 456/4885ALOX15 159/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.