SCHEMBL682087

SCHEMBL682087

COC(C)OCCOc1ccccc1OCc1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
HTR1A P08908 11/20 0.54
ADRA1D P25100 11/20 0.54
ADRA1A P35348 11/20 0.54
ADRA1B P35368 11/20 0.54
TDP1 Q9NUW8 3/20 0.49
MAPT P10636 1/20 0.49
MAPK1 P28482 1/20 0.49
L3MBTL1 Q9Y468 1/20 0.49
KDM4E B2RXH2 2/20 0.48
LIPE Q05469 1/20 0.45
ALDH1A1 P00352 1/20 0.45
APP P05067 1/20 0.44
RXRA P19793 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14443375 0.85 HTR1A (0.54) HTR1AADRA1DADRA1AADRA1BTDP1
SCHEMBL683157 0.84 RAB9A (0.50) MAPTL3MBTL1
SCHEMBL11654055 0.83 TDP1 (0.55) HTR1AADRA1DADRA1AADRA1BTDP1
SCHEMBL683156 0.81 NPSR1 (0.44) TDP1MAPTMAPK1L3MBTL1KDM4E
SCHEMBL683138 0.79 CYP1A2 (0.45) TDP1MAPTL3MBTL1ALDH1A1
SCHEMBL682086 0.78 MEN1 (0.47) TDP1MAPTL3MBTL1ALDH1A1
SCHEMBL683166 0.77 RCE1 (0.47) MAPTALDH1A1
SCHEMBL775134 0.76 KCNA3 (0.50) MAPTALDH1A1
SCHEMBL8482839 0.76 ALDH1A1 (0.62) TDP1KDM4EALDH1A1
SCHEMBL339812 0.75 MAPT (0.71) HTR1AADRA1DADRA1AADRA1BTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed