Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.53 |
| ▸ | MEN1 | O00255 | 4/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.50 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.50 |
| ▸ | CA12 | O43570 | 1/20 | 0.46 |
| ▸ | CA1 | P00915 | 1/20 | 0.46 |
| ▸ | CA2 | P00918 | 1/20 | 0.46 |
| ▸ | CA9 | Q16790 | 1/20 | 0.46 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | ATM | Q13315 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | SCN9A | Q15858 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.37 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL685747 | 0.90 | ALDH1A1 (0.53) | ALDH1A1MEN1KMT2AL3MBTL1CA12 | |
| SCHEMBL685875 | 0.89 | ALDH1A1 (0.47) | ALDH1A1MEN1KMT2AL3MBTL1CA12 | |
| SCHEMBL686025 | 0.88 | ALDH1A1 (0.42) | ALDH1A1MEN1KMT2AL3MBTL1CA12 | |
| SCHEMBL685210 | 0.88 | ALDH1A1 (0.42) | ALDH1A1MEN1KMT2AL3MBTL1CA12 | |
| SCHEMBL12768748 | 0.87 | ALDH1A1 (0.50) | ALDH1A1MEN1KMT2AL3MBTL1CA12 | |
| SCHEMBL686035 | 0.87 | ALDH1A1 (0.50) | ALDH1A1MEN1KMT2AL3MBTL1CA12 | |
| SCHEMBL686003 | 0.86 | ALDH1A1 (0.56) | ALDH1A1MEN1KMT2AL3MBTL1CA12 | |
| SCHEMBL10150822 | 0.86 | ALDH1A1 (0.51) | ALDH1A1MEN1KMT2AL3MBTL1CA12 | |
| SCHEMBL17281570 | 0.85 | ALDH1A1 (0.49) | ALDH1A1MEN1KMT2AL3MBTL1CA12 | |
| SCHEMBL17752186 | 0.85 | ALDH1A1 (0.49) | ALDH1A1MEN1KMT2AL3MBTL1CA12 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 430 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12038689-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-16 | — | — | US | disclosed |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-11840503-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-12-12 | — | — | US | disclosed |
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11834419-B2 | Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern | LG CHEM, LTD. (KR) | 2023-12-05 | — | — | US | disclosed |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11820735-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11822241-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11815813-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-14 | — | — | US | disclosed |
| US-20110020749-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND SALT EMPLOYED THEREIN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-27 | — | — | US | disclosed |
| US-20110014567-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20110014568-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20110014566-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20100330497-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-30 | — | — | US | disclosed |
| US-20100316951-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-16 | — | — | US | disclosed |
| US-20100316952-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-16 | — | — | US | disclosed |
| US-20100304296-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100203446-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-08-12 | — | — | US | disclosed |
| US-20080081925-A1 | Sulfonium compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-04-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (16 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100316951-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | THEM6, INTS6, CRY1 | ALDH1A1 2847/4885MEN1 372/4885KMT2A 1038/4885 |
| US-20110014568-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | RER1, REN, SSB | ALDH1A1 3377/4885MEN1 1752/4885KMT2A 1961/4885 |
| US-20080081925-A1 | Sulfonium compound | SLCO2A1, AFF2, SLCO2B1 | ALDH1A1 1315/4885MEN1 1442/4885KMT2A 2018/4885 |
| US-11820735-B2 | Salt, acid generator, resist composition and method for producing resist pattern | RER1, LPAR1, TLR7 | ALDH1A1 2671/4885MEN1 2510/4885KMT2A 1932/4885 |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SCO2, CBR1, OXGR1 | ALDH1A1 492/4885MEN1 2790/4885KMT2A 2023/4885 |
| US-11834419-B2 | Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern | PPOX, SETD7, CRY1 | ALDH1A1 997/4885MEN1 1277/4885KMT2A 567/4885 |
| US-20100304296-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | C1S, H1-0, H1-2 | ALDH1A1 918/4885MEN1 238/4885KMT2A 1330/4885 |
| US-11835849-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | RER1, TERB1, TRRAP | ALDH1A1 2433/4885MEN1 1509/4885KMT2A 1724/4885 |
| US-20100316952-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | AFF1, AFF2, AFF4 | ALDH1A1 1746/4885MEN1 1216/4885KMT2A 1044/4885 |
| US-20110014567-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | XPA, XPOT, ERCC4 | ALDH1A1 4445/4885MEN1 1450/4885KMT2A 2851/4885 |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | RER1, AFF1, AFF4 | ALDH1A1 2890/4885MEN1 1409/4885KMT2A 872/4885 |
| US-20110020749-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND SALT EMPLOYED THEREIN | RER1, RARA, RARG | ALDH1A1 2115/4885MEN1 2172/4885KMT2A 527/4885 |
| US-20110014566-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | XPA, NPPA, ERCC4 | ALDH1A1 3326/4885MEN1 888/4885KMT2A 369/4885 |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | H1-10, H1-0, H1-2 | ALDH1A1 608/4885MEN1 1103/4885KMT2A 2150/4885 |
| US-11822241-B2 | Salt, acid generator, resist composition and method for producing resist pattern | H1-10, H1-0, CHRM1 | ALDH1A1 921/4885MEN1 454/4885KMT2A 2220/4885 |
| US-11840503-B2 | Salt, acid generator, resist composition and method for producing resist pattern | RER1, H1-0, CA7 | ALDH1A1 2235/4885MEN1 391/4885KMT2A 1983/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.