SCHEMBL686338

SCHEMBL686338

Cc1ccc(Sc2ccc([S+](c3ccc(C)cc3)c3ccc(C)cc3)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MLYCD O95822 1/20 0.44
L3MBTL1 Q9Y468 4/20 0.41
TDP1 Q9NUW8 3/20 0.41
MAPT P10636 2/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
HKDC1 Q2TB90 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
ACHE P22303 1/20 0.40
HAO1 Q9UJM8 1/20 0.39
HPGD P15428 4/20 0.39
LMNA P02545 1/20 0.39
MCL1 Q07820 2/20 0.39
BCL2 P10415 1/20 0.39
NPC1 O15118 1/20 0.36
RAB9A P51151 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
MAPK1 P28482 2/20 0.36
NR1H2 P55055 1/20 0.36
CYP3A4 P08684 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL685359 1.00 MLYCD (0.44) MLYCDL3MBTL1TDP1MAPTMEN1
SCHEMBL30513265 0.91 MLYCD (0.43) MLYCDL3MBTL1TDP1MAPTMEN1
SCHEMBL31534663 0.91 MLYCD (0.43) MLYCDL3MBTL1TDP1MAPTMEN1
SCHEMBL30513292 0.91 MLYCD (0.43) MLYCDL3MBTL1TDP1MAPTMEN1
SCHEMBL686333 0.91 MAPT (0.44) MLYCDL3MBTL1TDP1MAPTMEN1
SCHEMBL30513349 0.91 MLYCD (0.43) MLYCDL3MBTL1TDP1MAPTMEN1
SCHEMBL685986 0.91 MAPT (0.44) MLYCDL3MBTL1TDP1MAPTMEN1
SCHEMBL685341 0.91 ALDH1A1 (0.47) MLYCDL3MBTL1TDP1MAPTMEN1
SCHEMBL685966 0.91 MAPT (0.44) MLYCDL3MBTL1TDP1MAPTMEN1
SCHEMBL686336 0.89 ALDH1A1 (0.46) MLYCDL3MBTL1TDP1MAPTMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 391 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260116071-A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD CANON KK (JP) 2026-04-30 US disclosed
EP-4696511-A1 INK-JET RECORDING HEAD Canon Kabushiki Kaisha (JP) 2026-02-18 EP disclosed
US-20260042918-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
US-20260042917-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
US-20260042294-A1 INK-JET RECORDING HEAD CANON KK (JP) 2026-02-12 US disclosed
EP-4691783-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD CANON KABUSHIKI KAISHA (JP) 2026-02-11 EP disclosed
EP-4691782-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD Canon Kabushiki Kaisha (JP) 2026-02-11 EP disclosed
EP-4692937-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT AND METHOD FOR PRODUCING SAME, HOLLOW STRUCTURE, ELECTRONIC COMPONENT, AND ELASTIC WAVE FILTER Toray Industries, Inc. (JP) 2026-02-11 EP disclosed
WO-2025063041-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION COATING FILM, NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION FILM, CURED FILM, AND ELECTRONIC COMPONENT USING SAME 東レ株式会社 2025-03-27 WO disclosed
WO-2025023159-A1 PHOTOCURABLE RESIN COMPOSITION, ADHESIVE, SEALING MATERIAL, COATING AGENT, CURED PRODUCT, SEMICONDUCTOR DEVICE, ELECTRONIC COMPONENT, AND CURING, BONDING, SEALING, AND COATING METHODS USING PHOTOCURABLE RESIN COMPOSITION ナミックス株式会社 2025-01-30 WO disclosed
US-7244473-B2 Active ray curable ink-jet composition, image forming method using the same, ink-jet recording apparatus, and triarylsulfonium salt compound KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-07-17 US disclosed
US-20070149702-A1 Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED 2007-06-28 US disclosed
US-20070122750-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-05-31 US disclosed
US-20070100158-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-05-03 US disclosed
US-20070100096-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED 2007-05-03 US disclosed
US-20070088131-A1 Sulfonate and resist composition TOISHI KOUJI 2007-04-19 US disclosed
US-20070078269-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-04-05 US disclosed
US-20070054974-A1 Active ray curable ink-jet composition, image forming method using the same, ink-jet recording apparatus, and triarylsulfonium salt compound KONICA MINOLTA MEDICAL & GRAPHIC, INC. (JP) 2007-03-08 US disclosed
EP-1752463-A1 NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX San-Apro Limited (JP) 2007-02-14 EP disclosed
US-20070027336-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-02-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (9 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260042917-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD MLLT3, OR10J3, RFT1 MLYCD 4882/4885L3MBTL1 293/4885TDP1 1246/4885
US-20070027336-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SLC26A3, NHERF1, HCN4 MLYCD 3094/4885L3MBTL1 4447/4885TDP1 4668/4885
US-20070100096-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same KCNH3, KCNN4, NHERF1 MLYCD 4159/4885L3MBTL1 4826/4885TDP1 4096/4885
US-20260116071-A1 METHOD OF MANUFACTURING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD ASIC1, PTGER1, PELP1 MLYCD 4879/4885L3MBTL1 2792/4885TDP1 2887/4885
US-20260042294-A1 INK-JET RECORDING HEAD SEM1, ASIC1, C9 MLYCD 4867/4885L3MBTL1 2613/4885TDP1 1613/4885
US-20070122750-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same HCN3, NHERF1, HCN4 MLYCD 4086/4885L3MBTL1 4862/4885TDP1 4378/4885
US-20070078269-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same HCN4, HCN3, HCN1 MLYCD 3305/4885L3MBTL1 4841/4885TDP1 4186/4885
US-20070100158-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SLC26A3, RFC1, RFC2 MLYCD 3720/4885L3MBTL1 4879/4885TDP1 4160/4885
US-20260042918-A1 PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD MLLT1, MLLT3, ERCC1 MLYCD 4883/4885L3MBTL1 714/4885TDP1 1005/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.