Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 4/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 3/20 | 0.44 |
| ▸ | HKDC1 | Q2TB90 | 2/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.42 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.40 |
| ▸ | ACHE | P22303 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | MLYCD | O95822 | 1/20 | 0.39 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.38 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.38 |
| ▸ | ATM | Q13315 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL685966 | 1.00 | MAPT (0.44) | MAPTNPSR1HKDC1TDP1L3MBTL1 | |
| SCHEMBL686333 | 1.00 | MAPT (0.44) | MAPTNPSR1HKDC1TDP1L3MBTL1 | |
| SCHEMBL686336 | 0.98 | ALDH1A1 (0.46) | MAPTNPSR1HKDC1TDP1L3MBTL1 | |
| SCHEMBL685341 | 0.96 | ALDH1A1 (0.47) | MAPTNPSR1HKDC1TDP1L3MBTL1 | |
| SCHEMBL685359 | 0.91 | MLYCD (0.44) | MAPTNPSR1HKDC1TDP1L3MBTL1 | |
| SCHEMBL686338 | 0.91 | MLYCD (0.44) | MAPTNPSR1HKDC1TDP1L3MBTL1 | |
| SCHEMBL30175576 | 0.90 | ADORA2A (0.42) | MAPTNPSR1HKDC1TDP1L3MBTL1 | |
| SCHEMBL4646381 | 0.89 | MAPT (0.38) | MAPTNPSR1HKDC1TDP1L3MBTL1 | |
| SCHEMBL92199 | 0.89 | HPGD (0.45) | MAPTL3MBTL1ALDH1A1HPGDLMNA | |
| SCHEMBL686057 | 0.88 | TSHR (0.48) | MAPTNPSR1HKDC1TDP1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 145 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11746085-B2 | Triphenylsulfonium salt compound, and uses thereof | CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD. (CN) | 2023-09-05 | — | — | US | disclosed |
| EP-4198019-A1 | TRIPHENYLPHOSPHONIUM SALT COMPOUND, AND USES THEREOF | Changzhou Tronly Advanced Electronic Materials Co., Ltd. (CN) | 2023-06-21 | — | — | EP | disclosed |
| US-20210387948-A1 | TRIPHENYLSULFONIUM SALT COMPOUND, AND USES THEREOF | CHANGZHOU TRONLY NEW ELECTRONICS MATERIALS CO., LTD. (CN) | 2021-12-16 | — | — | US | disclosed |
| EP-3865473-A1 | TRIPHENYLPHOSPHONIUM SALT COMPOUND, AND USES THEREOF | Changzhou Tronly Advanced Electronic Materials Co., Ltd. (CN) | 2021-08-18 | — | — | EP | disclosed |
| US-10766992-B2 | Resin and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2020-09-08 | — | — | US | disclosed |
| US-10377692-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2019-08-13 | — | — | US | disclosed |
| US-9726976-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |
| US-9429841-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-30 | — | — | US | disclosed |
| US-9405187-B2 | Salt, acid generator and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-02 | — | — | US | disclosed |
| US-9346750-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-05-24 | — | — | US | disclosed |
| US-7304175-B2 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-12-04 | — | — | US | disclosed |
| US-20070218401-A1 | liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-09-20 | — | — | US | disclosed |
| US-7262321-B2 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-08-28 | — | — | US | disclosed |
| US-20070184382-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-08-09 | — | — | US | disclosed |
| US-20070149702-A1 | Resin suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED | 2007-06-28 | — | — | US | disclosed |
| US-20070122750-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-05-31 | — | — | US | disclosed |
| US-20070100158-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070100096-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED | 2007-05-03 | — | — | US | disclosed |
| US-20070088131-A1 | Sulfonate and resist composition | TOISHI KOUJI | 2007-04-19 | — | — | US | disclosed |
| US-20070078269-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2007-04-05 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210387948-A1 | TRIPHENYLSULFONIUM SALT COMPOUND, AND USES THEREOF | TST, TRPA1, TERB1 | MAPT 3687/4885NPSR1 1596/4885HKDC1 4879/4885 |
| US-20070100096-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | KCNH3, KCNN4, NHERF1 | MAPT 4813/4885NPSR1 514/4885HKDC1 2629/4885 |
| US-20070122750-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | HCN3, NHERF1, HCN4 | MAPT 4704/4885NPSR1 482/4885HKDC1 2174/4885 |
| US-11746085-B2 | Triphenylsulfonium salt compound, and uses thereof | TST, TRPA1, TERB1 | MAPT 3687/4885NPSR1 1596/4885HKDC1 4879/4885 |
| US-20070078269-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | HCN4, HCN3, HCN1 | MAPT 4756/4885NPSR1 603/4885HKDC1 2888/4885 |
| US-10377692-B2 | Photoresist composition | C1R, C1S, F12 | MAPT 588/4885NPSR1 915/4885HKDC1 4641/4885 |
| US-20070100158-A1 | Salt suitable for an acid generator and a chemically amplified resist composition containing the same | SLC26A3, RFC1, RFC2 | MAPT 4784/4885NPSR1 590/4885HKDC1 1898/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.