Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.38 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.38 |
| ▸ | GAA | P10253 | 1/20 | 0.38 |
| ▸ | KAT6A | Q92794 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 1/20 | 0.38 |
| ▸ | FLT1 | P17948 | 1/20 | 0.37 |
| ▸ | FLT4 | P35916 | 1/20 | 0.37 |
| ▸ | KDR | P35968 | 1/20 | 0.37 |
| ▸ | ERCC5 | P28715 | 1/20 | 0.37 |
| ▸ | FEN1 | P39748 | 1/20 | 0.37 |
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.35 |
| ▸ | CYTH2 | Q99418 | 1/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9010921 | 0.80 | ALDH1A1 (0.39) | MAPTALDH1A1GAAKAT6AHPGD | |
| SCHEMBL6932650 | 0.77 | LMNA (0.48) | MAPTALDH1A1GAAHTTSMN1; SMN2 | |
| SCHEMBL777052 | 0.75 | HPGD (0.46) | MAPTALDH1A1GAAKAT6AHPGD | |
| SCHEMBL6933539 | 0.73 | KAT6A (0.49) | MAPTALDH1A1KAT6AHPGDHTT | |
| SCHEMBL23277176 | 0.71 | SMN1; SMN2 (0.47) | MAPTALDH1A1TP53HTTHSD17B10 | |
| SCHEMBL65095 | 0.70 | SMN1; SMN2 (0.46) | MAPTALDH1A1TP53HTTHSD17B10 | |
| SCHEMBL6931446 | 0.70 | HSD11B1 (0.47) | MAPTALDH1A1HPGDFLT1FLT4 | |
| SCHEMBL6931744 | 0.70 | HSD11B1 (0.47) | ALDH1A1KMT2AKDM4EL3MBTL1 | |
| SCHEMBL6931275 | 0.70 | HSD11B1 (0.51) | MAPTALDH1A1GAAHPGDHTT | |
| SCHEMBL991197 | 0.69 | ERCC5 (0.50) | ALDH1A1GAAHPGDERCC5FEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6589705-B1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-07-08 | — | — | US | disclosed |
| US-6555289-B2 | Positive photoresist composition comprises a resin having a specific silicon-containing group on the side chain, the solubility of which resin in an akali developer increases under action of an acid | FUJI PHOTO FILM CO., LTD. (JP) | 2003-04-29 | — | — | US | disclosed |
| US-6528229-B2 | Mixture of polymer and acid generators | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-04 | — | — | US | disclosed |
| US-6506535-B1 | A positive working photoresist composition for use in the production of semiconductor integrated circuit devices, mask for the production of integrated circuits, printed wiring boards, liquid crystal panels | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-14 | — | — | US | disclosed |
| US-20020048720-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2002-04-25 | — | — | US | disclosed |
| US-20010041303-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| EP-1096319-A1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-05-02 | — | — | EP | disclosed |