SCHEMBL6933263

SCHEMBL6933263

C[N+](C)(C)CCCCCCCCCCCC[N+](C)(C)C

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 4/20 1.00
KMT2A Q03164 4/20 1.00
ACHE P22303 4/20 1.00
APEX1 P27695 3/20 1.00
NFKB1 P19838 2/20 1.00
KDM4E B2RXH2 2/20 1.00
SMN1; SMN2 Q16637 2/20 1.00
PMP22 Q01453 2/20 1.00
LMNA P02545 2/20 1.00
HSD17B10 Q99714 1/20 1.00
HRH3 Q9Y5N1 1/20 1.00
TSHR P16473 1/20 1.00
RAB9A P51151 1/20 1.00
NPSR1 Q6W5P4 1/20 0.92
DNM1 Q05193 6/20 0.73
APAF1 O14727 1/20 0.65
HSP90AA1 P07900 1/20 0.65
RAD52 P43351 1/20 0.65
BBOX1 O75936 1/20 0.47
HTT P42858 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30019398 1.00 MEN1 (1.00) MEN1KMT2AACHEAPEX1NFKB1
SCHEMBL17898629 1.00 MEN1 (1.00) MEN1KMT2AACHEAPEX1NFKB1
SCHEMBL17898630 1.00 MEN1 (1.00) MEN1KMT2AACHEAPEX1NFKB1
SCHEMBL6931794 1.00 MEN1 (1.00) MEN1KMT2AACHEAPEX1NFKB1
Decamethonium SCHEMBL238400 1.00 MEN1 (1.00) MEN1KMT2AACHEAPEX1NFKB1
SCHEMBL8208718 1.00 MEN1 (1.00) MEN1KMT2AACHEAPEX1NFKB1
SCHEMBL12126378 1.00 MEN1 (1.00) MEN1KMT2AACHEAPEX1NFKB1
Hexamethonium SCHEMBL34900 1.00 MEN1 (1.00) MEN1KMT2AACHEAPEX1NFKB1
Pentamethonium SCHEMBL61798 1.00 MEN1 (1.00) MEN1KMT2AACHEAPEX1NFKB1
SCHEMBL12198121 1.00 MEN1 (1.00) MEN1KMT2AACHEAPEX1NFKB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12252632-B2 Chemical-mechanical polishing composition, rinse composition, chemical- mechanical polishing method, and rinsing method ENTEGRIS, INC. (US) 2025-03-18 US disclosed
US-11720018-B2 Chemically amplified resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-08-08 US disclosed
US-20230152692-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-18 US disclosed
US-20220372329-A1 CHEMICAL-MECHANICAL POLISHING COMPOSITION, RINSE COMPOSITION, CHEMICAL-MECHANICAL POLISHING METHOD, AND RINSING METHOD ENTEGRIS, INC. 2022-11-24 US disclosed
CN-114258421-A Chemical mechanical polishing composition, cleaning composition, chemical mechanical polishing method and cleaning method CMC材料株式会社 2022-03-29 CN disclosed
US-20220004101-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-01-06 US disclosed
US-20210033969-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-02-04 US disclosed
US-20180143532-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-05-24 US disclosed
US-20180086948-A1 ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-03-29 US disclosed
US-9645498-B2 Developer and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-09 US disclosed
US-20160195813-A1 DEVELOPER AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-07-07 US disclosed
US-8980643-B2 Dicationic liquid salts and methods of use thereof SIGMA-ALDRICH CO., LLC (US) 2015-03-17 US disclosed
US-7947854-B2 Phospholipase inhibitor; prevention or therapy of microbial infection; bactericides; fungicides; viricides; parasiticides; using quaternary or phosphonium group containing compounds THE UNIVERSITY OF SYDNEY (AU) 2011-05-24 US disclosed
US-20110017908-A1 DICATIONIC LIQUID SALTS AND METHODS OF USE THEREOF SIGMA-ALDRICH CO. (US) 2011-01-27 US disclosed
US-20080275003-A1 Bis-Cationic Compounds and Use Thereof THE UNIVERSITY OF SYDNEY (AU) 2008-11-06 US disclosed
EP-1088791-B1 Process for the preparation of MTT-type zeolites using specific structuring agent precursors INST FRANCAIS DU PETROLE (FR) 2003-11-26 EP disclosed
EP-1088791-A1 Process for the preparation of MTT-type zeolites using specific structuring agent precursors INSTITUT FRANCAIS DU PETROLE (FR) 2001-04-04 EP disclosed
US-4035341-A MELT-SPINNABLE, QUATERNARY AMMONIUM COMPOUNDS RHONE-POULENC-TEXTILE (FR) 1977-07-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160195813-A1 DEVELOPER AND PATTERNING PROCESS USING THE SAME BMPR1A, RER1, BMPR1B MEN1 837/4885KMT2A 1730/4885ACHE 4583/4885
US-20080275003-A1 Bis-Cationic Compounds and Use Thereof PLCB1, PLCB3, PLA2G4B MEN1 1499/4885KMT2A 2534/4885ACHE 557/4885
US-20110017908-A1 DICATIONIC LIQUID SALTS AND METHODS OF USE THEREOF SRMS, AQP4, SLC6A12 MEN1 977/4885KMT2A 2811/4885ACHE 4419/4885
US-20180086948-A1 ADHESIVE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING A BIO-ELECTRODE, AND SALT SLC9A1, FN1, EPCAM MEN1 1394/4885KMT2A 1734/4885ACHE 1576/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.