SCHEMBL706628

SCHEMBL706628

O=C(CC(c1ccccc1)c1ccccc1)O[SiH3]

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.49
MAPT P10636 3/20 0.49
HPGD P15428 2/20 0.45
LMNA P02545 4/20 0.44
POLB P06746 2/20 0.44
HMOX2 P30519 1/20 0.42
NPSR1 Q6W5P4 2/20 0.42
KDM4E B2RXH2 1/20 0.42
MEN1 O00255 1/20 0.42
GAA P10253 1/20 0.42
KMT2A Q03164 1/20 0.42
MAPK1 P28482 1/20 0.42
CYP2C19 P33261 1/20 0.42
CYP2D6 P10635 1/20 0.41
SRC P12931 1/20 0.41
GABBR2 O75899 1/20 0.41
GABBR1 Q9UBS5 1/20 0.41
CACNA1H O95180 1/20 0.41
CACNA2D1 P54289 1/20 0.41
CACNA1B Q00975 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11212196 0.83 ALDH1A1 (0.51) ALDH1A1MAPTHPGDLMNAPOLB
SCHEMBL7056829 0.82 LTB4R (0.48) ALDH1A1HPGDPOLBNPSR1CYP2C19
SCHEMBL705573 0.80 MTNR1A (0.44) CYP2D6
SCHEMBL7759603 0.80 ALDH1A1 (0.46) ALDH1A1MAPTLMNAPOLBNPSR1
SCHEMBL2347309 0.79 HPGD (0.57) ALDH1A1MAPTHPGDLMNAPOLB
SCHEMBL4251422 0.78 CYP19A1 (0.51) ALDH1A1MAPTHPGDLMNAPOLB
SCHEMBL707771 0.77 HRH1 (0.46)
SCHEMBL11212200 0.76 LMNA (0.50) ALDH1A1MAPTHPGDLMNAPOLB
SCHEMBL7178642 0.76 ALDH1A1 (0.55) ALDH1A1MAPTHPGDLMNAPOLB
SCHEMBL3697521 0.76 HPGD (0.50) ALDH1A1MAPTHPGDLMNAPOLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 84 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260118764-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2026-04-30 US disclosed
EP-4715465-A1 MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER Nissan Chemical Corporation (JP) 2026-03-25 EP disclosed
US-12585188-B2 Composition for forming resist underlying film NISSAN CHEMICAL CORPORATION (JP) 2026-03-24 US disclosed
EP-4679175-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM Nissan Chemical Corporation (JP) 2026-01-14 EP disclosed
US-20250377596-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2025-12-11 US disclosed
US-20250362609-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING POLYFUNCTIONAL SULFONIC ACID NISSAN CHEMICAL CORPORATION (JP) 2025-11-27 US disclosed
US-20250355357-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2025-11-20 US disclosed
US-20250348001-A1 METHOD FOR PRODUCING LAMINATE AND METHOD FOR PRODUCING SEMICONDUCTOR ELEMENT NISSAN CHEMICAL CORPORATION (JP) 2025-11-13 US disclosed
US-12339586-B2 Photocurable resin composition containing self-crosslinkable polymer NISSAN CHEMICAL CORPORATION (JP) 2025-06-24 US disclosed
US-20250172869-A1 WAFER END PROTECTIVE-FILM FORMING COMPOSITION FOR SEMICONDUCTOR MANUFACTURING NISSAN CHEMICAL CORPORATION (JP) 2025-05-29 US disclosed
EP-0591302-A4 1994-08-03 EP disclosed
EP-0592534-A4 SILYL PHOSPHORYLATING REAGENTS AND METHODS OF USING THEM ABBOTT LAB (US) 1994-07-06 EP disclosed
EP-0592534-A1 SILYL PHOSPHORYLATING REAGENTS AND METHODS OF USING THEM ABBOTT LABORATORIES (US) 1994-04-20 EP disclosed
EP-0591344-A1 A PROCESS FOR SYNTHESIS OF SILYL ALCOHOLS ABBOTT LABORATORIES (US) 1994-04-13 EP disclosed
EP-0591302-A1 SUBSTITUTED SILYL ALCOHOLS ABBOTT LABORATORIES (US) 1994-04-13 EP disclosed
WO-1992022561-A1 A PROCESS FOR SYNTHESIS OF SILYL ALCOHOLS ABBOTT LABORATORIES (US) 1992-12-23 WO disclosed
WO-1992022557-A1 SUBSTITUTED SILYL ALCOHOLS ABBOTT LABORATORIES (US) 1992-12-23 WO disclosed
WO-1992021689-A1 SILYL PHOSPHORYLATING REAGENTS AND METHODS OF USING THEM ABBOTT LABORATORIES (US) 1992-12-10 WO disclosed
US-5159095-A Reagant for phosphorylating oligonucleotides ABBOTT LABORATORIES (US) 1992-10-27 US disclosed
US-5113005-A Hydrosilation ABBOTT LABORATORIES (US) 1992-05-12 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260118764-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM SRSF1, MACF1, SRPK1 ALDH1A1 3642/4885MAPT 965/4885HPGD 4830/4885
US-12585188-B2 Composition for forming resist underlying film SRR, SMC1A, ASH2L ALDH1A1 1320/4885MAPT 4790/4885HPGD 4863/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.