Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 1/20 | 0.61 |
| ▸ | LMNA | P02545 | 1/20 | 0.56 |
| ▸ | ACHE | P22303 | 4/20 | 0.51 |
| ▸ | PARP1 | P09874 | 1/20 | 0.48 |
| ▸ | IDO1 | P14902 | 2/20 | 0.46 |
| ▸ | AGXT | P21549 | 2/20 | 0.46 |
| ▸ | MMP1 | P03956 | 2/20 | 0.46 |
| ▸ | MMP2 | P08253 | 2/20 | 0.46 |
| ▸ | MMP9 | P14780 | 2/20 | 0.46 |
| ▸ | MMP12 | P39900 | 2/20 | 0.46 |
| ▸ | MEN1 | O00255 | 1/20 | 0.45 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.45 |
| ▸ | PKM | P14618 | 1/20 | 0.45 |
| ▸ | NPC1 | O15118 | 1/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | HTT | P42858 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phosphonic Acid SCHEMBL9616589 | 0.94 | CYP3A4 (0.54) | CYP3A4LMNAACHEPARP1IDO1 | |
| SCHEMBL6668922 | 0.88 | CYP3A4 (0.62) | CYP3A4LMNAACHEPARP1IDO1 | |
| SCHEMBL9430891 | 0.87 | CYP3A4 (0.48) | CYP3A4LMNAACHEPARP1MMP1 | |
| SCHEMBL10351327 | 0.86 | CYP3A4 (0.61) | CYP3A4LMNAACHEPARP1MMP1 | |
| SCHEMBL25512033 | 0.85 | CYP3A4 (0.59) | CYP3A4LMNAACHEPARP1MMP1 | |
| SCHEMBL25528980 | 0.84 | CYP3A4 (0.54) | CYP3A4LMNAACHEPARP1IDO1 | |
| SCHEMBL31525960 | 0.82 | CYP3A4 (0.59) | CYP3A4LMNAACHEPARP1MEN1 | |
| SCHEMBL202980 | 0.82 | CYP3A4 (0.59) | CYP3A4LMNAACHEPARP1MEN1 | |
| SCHEMBL3339215 | 0.82 | CYP3A4 (0.59) | CYP3A4LMNAACHEPARP1MEN1 | |
| SCHEMBL9362791 | 0.82 | CYP3A4 (0.59) | CYP3A4LMNAACHEPARP1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240018131-A1 | MATRIX METALLOPROTEINASE (MMP) INHIBITORS AND METHODS OF USE THEREOF | FORESEE PHARMACEUTICALS USA, INC. | 2024-01-18 | — | — | US | disclosed |
| US-20230314938-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-10-05 | — | — | US | disclosed |
| US-20230305395-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-11739080-B2 | Matrix metalloproteinase (MMP) inhibitors and methods of use thereof | FORESEE PHARMACEUTICALS USA, INC. (US) | 2023-08-29 | — | — | US | disclosed |
| US-20230161244-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161243-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-25 | — | — | US | disclosed |
| US-20230161250-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-25 | — | — | US | disclosed |
| EP-1097922-A1 | 5-THIA-OMEGA-SUBSTITUTED PHENYL-PROSTAGLANDIN E DERIVATIVES, PROCESS FOR PRODUCING THE SAME AND DRUGS CONTAINING THE SAME AS THE ACTIVE INGREDIENT | ONO PHARMACEUTICAL CO., LTD. (JP) | 2001-05-09 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230161250-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RIMKLA, GAR1, PCCA | CYP3A4 3390/4885LMNA 4633/4885ACHE 3604/4885 |
| US-20240018131-A1 | MATRIX METALLOPROTEINASE (MMP) INHIBITORS AND METHODS OF USE THEREOF | MMP12, MMP1, MMP11 | CYP3A4 1727/4885LMNA 1041/4885ACHE 1173/4885 |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, H1-0, BET1 | CYP3A4 4585/4885LMNA 2852/4885ACHE 4521/4885 |
| US-11739080-B2 | Matrix metalloproteinase (MMP) inhibitors and methods of use thereof | MMP12, MMP1, MMP11 | CYP3A4 1727/4885LMNA 1041/4885ACHE 1173/4885 |
| US-20230161243-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, ASIC1, REN | CYP3A4 4442/4885LMNA 4153/4885ACHE 4291/4885 |
| US-20230314938-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | HCAR1, H1-0, H1-10 | CYP3A4 2644/4885LMNA 4546/4885ACHE 2474/4885 |
| US-20230161244-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | GAR1, RER1, RIMKLA | CYP3A4 3026/4885LMNA 4554/4885ACHE 3581/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.