Sugi Predict

Sugi Predict / Compounds / SCHEMBL817538

SCHEMBL817538

SCHEMBL817538

O=C(O)c1cc(C(F)(F)F)c(C(F)(F)F)c(C(F)(F)F)c1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ RXRA P19793 2/20 0.46
▸ RXRB P28702 2/20 0.46
▸ RXRG P48443 2/20 0.46
▸ CA12 O43570 2/20 0.41
▸ CA1 P00915 2/20 0.41
▸ CA2 P00918 2/20 0.41
▸ CA7 P43166 2/20 0.41
▸ CA9 Q16790 2/20 0.41
▸ CA14 Q9ULX7 2/20 0.41
▸ SRD5A2 P31213 2/20 0.41
▸ ASPH Q12797 1/20 0.40
▸ TPMT P51580 3/20 0.39
▸ LMNA P02545 2/20 0.39
▸ MAPT P10636 2/20 0.39
▸ KDM4E B2RXH2 1/20 0.39
▸ ALDH1A1 P00352 1/20 0.39
▸ TP53 P04637 1/20 0.39
▸ CA3 P07451 1/20 0.39
▸ SELL P14151 1/20 0.39
▸ HPGD P15428 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14213196 0.84 TPMT (0.46) RXRARXRBRXRGCA12CA1
SCHEMBL28053969 0.82 RXRA (0.41) RXRARXRBRXRGCA12CA1
SCHEMBL7721527 0.82 RXRA (0.41) RXRARXRBRXRGCA12CA1
SCHEMBL28688436 0.80 DHODH (0.43) RXRARXRBRXRGDHODH
Hydrochloric Acid SCHEMBL7981979 0.80 RXRA (0.40) RXRARXRBRXRGCA12CA1
SCHEMBL13749764 0.80 ERN1 (0.41) MAPTSMN1; SMN2HSD17B10TDP1DHODH
SCHEMBL816306 0.80 KIF11 (0.47) RXRARXRBRXRGLMNACA5A
SCHEMBL816784 0.80 CES2 (0.35) RXRARXRBRXRGASPHLMNA
SCHEMBL3875496 0.77 RXRA (0.46) RXRARXRBRXRGCA12CA1
SCHEMBL627998 0.77 CES2 (0.45) RXRARXRBRXRGCA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11953829-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device FUJIFILM CORPORATION (JP) 2024-04-09 — — US disclosed
US-20200192220-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2020-06-18 — — US disclosed
US-20200192220-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2020-06-18 — — US disclosed
US-10040732-B2 Process for the production of biaryl compounds DSM IP ASSETS B.V. (NL) 2018-08-07 — — US disclosed
EP-3169651-B1 PROCESS FOR THE PRODUCTION OF BIARYL COMPOUNDS DSM IP ASSETS BV (NL) 2018-06-20 — — EP disclosed
US-20170210681-A1 PROCESS FOR THE PRODUCTION OF BIARYL COMPOUNDS DSM IP ASSETS B.V. (NL) 2017-07-27 — — US disclosed
EP-3169651-A1 PROCESS FOR THE PRODUCTION OF BIARYL COMPOUNDS DSM IP Assets B.V. (NL) 2017-05-24 — — EP disclosed
CN-106536455-A Process for the production of biaryl compounds 帝斯曼知识产权资产管理有限公司 2017-03-22 — — CN disclosed
WO-2016008931-A1 PROCESS FOR THE PRODUCTION OF BIARYL COMPOUNDS DSM IP ASSETS B.V. (NL) 2016-01-21 — — WO disclosed
US-8067625-B2 Fluorosurfactants MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 2011-11-29 — — US disclosed
US-8049022-B2 Fluorosurfactants MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 2011-11-01 — — US disclosed
US-8049022-B2 Fluorosurfactants MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 2011-11-01 — — US disclosed
US-20100152081-A1 Fluorosurfactants MERCK PATENT GMBH (DE) 2010-06-17 — — US disclosed
US-20100152081-A1 Fluorosurfactants MERCK PATENT GMBH (DE) 2010-06-17 — — US disclosed
US-20090312432-A1 FLUOROSURFACTANTS MERCK PATENT GESELLSCHAFT (DE) 2009-12-17 — — US disclosed
US-20090312432-A1 FLUOROSURFACTANTS MERCK PATENT GESELLSCHAFT (DE) 2009-12-17 — — US disclosed
US-20090264525-A1 FLUOROSURFACTANTS MERCK PATENT GMBH (DE) 2009-10-22 — — US disclosed
US-20090264525-A1 FLUOROSURFACTANTS MERCK PATENT GMBH (DE) 2009-10-22 — — US disclosed
US-20090197201-A1 FLUOROSURFACTANTS MERCK PATENT GESELLSCHAFT (DE) 2009-08-06 — — US disclosed
US-20090197201-A1 FLUOROSURFACTANTS MERCK PATENT GESELLSCHAFT (DE) 2009-08-06 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20170210681-A1 PROCESS FOR THE PRODUCTION OF BIARYL COMPOUNDS DDT, COASY, ALDH3A1 RXRA 3666/4885RXRB 3670/4885RXRG 3850/4885
US-10040732-B2 Process for the production of biaryl compounds DDT, COASY, ALDH3A1 RXRA 3666/4885RXRB 3670/4885RXRG 3850/4885
US-20090312432-A1 FLUOROSURFACTANTS SGMS2, FASN, SGMS1 RXRA 441/4885RXRB 612/4885RXRG 580/4885
US-20100152081-A1 Fluorosurfactants CBR3, FPR3, NOX3 RXRA 1426/4885RXRB 1358/4885RXRG 1418/4885
US-20090264525-A1 FLUOROSURFACTANTS FASN, FFAR3, SGMS2 RXRA 559/4885RXRB 586/4885RXRG 616/4885
US-20090197201-A1 FLUOROSURFACTANTS CBR3, SCO2, FPR3 RXRA 2735/4885RXRB 2457/4885RXRG 2195/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.