SCHEMBL8279451

SCHEMBL8279451

CCC(C)(C)C(=O)NCCCN(C)C

nearest known ligand 0.49

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 2/20 0.49
KDM4E B2RXH2 2/20 0.41
RIPK1 Q13546 3/20 0.41
CA14 Q9ULX7 1/20 0.40
HPGD P15428 1/20 0.40
PAOX Q6QHF9 1/20 0.40
DRD2 P14416 1/20 0.39
DRD4 P21917 1/20 0.39
EPHX1 P07099 1/20 0.38
POLB P06746 1/20 0.38
MEN1 O00255 1/20 0.37
ALDH1A1 P00352 1/20 0.37
HTT P42858 1/20 0.37
KMT2A Q03164 1/20 0.37
CNR1 P21554 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14153988 0.89 RIPK1 (0.41) DNM1RIPK1CA14DRD2DRD4
SCHEMBL409080 0.89 DNM1 (0.44) DNM1RIPK1DRD2DRD4ALDH1A1
SCHEMBL22061841 0.86 DNM1 (0.44) DNM1KDM4ECA14HPGDPAOX
SCHEMBL10879405 0.85 DNM1 (0.45) DNM1KDM4ECA14HPGDPAOX
SCHEMBL13450761 0.84 EPHX1 (0.50) KDM4ERIPK1CA14DRD2DRD4
SCHEMBL5961344 0.84 ALDH1A1 (0.50) RIPK1CA14PAOXDRD2DRD4
SCHEMBL14958582 0.84 DNM1 (0.44) DNM1KDM4ECA14HPGDPAOX
SCHEMBL17447509 0.82 PTGS1 (0.46) RIPK1DRD2DRD4EPHX1POLB
SCHEMBL10201764 0.82 DNM1 (0.49) DNM1KDM4ECA14HPGDPAOX
SCHEMBL4546721 0.82 EPHX1 (0.53) KDM4ERIPK1CA14DRD2DRD4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 77 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12044968-B2 Protective film-forming composition having acetal structure and amide structure NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 US disclosed
US-12044968-B2 Protective film-forming composition having acetal structure and amide structure NISSAN CHEMICAL CORPORATION (JP) 2024-07-23 US disclosed
US-20230338415-A1 SUBSTITUTED PHENYL BORONIC ACID CONTAINING POLYMERS AND METHODS OF USE GLYSCEND, INC. 2023-10-26 US disclosed
US-20230183515-A1 COATING COMPOSITION, USE AND METHODS FOR MAKING A SUBSTRATE FROST RESISTANT SOLVAY SA (BE) 2023-06-15 US disclosed
US-20230183515-A1 COATING COMPOSITION, USE AND METHODS FOR MAKING A SUBSTRATE FROST RESISTANT SOLVAY SA (BE) 2023-06-15 US disclosed
US-20230159786-A1 USE OF COATING COMPOSITIONS FOR MAKING A SUBSTRATE FROST RESISTANT, COMPOSITIONS AND METHODS USEFUL THEREFOR SOLVAY SA (BE) 2023-05-25 US disclosed
US-20230159786-A1 USE OF COATING COMPOSITIONS FOR MAKING A SUBSTRATE FROST RESISTANT, COMPOSITIONS AND METHODS USEFUL THEREFOR SOLVAY SA (BE) 2023-05-25 US disclosed
US-20230068813-A1 POLYMER ADDITIVE COMPRISING ZWITTERIONIC MOIETIES FOR VINYLIDENE FLUORIDEPOLYMER BASED MEMBRANES SOLVAY SA (BE) 2023-03-02 US disclosed
US-20220135552-A1 PYRROLE DERIVATIVES AS PLK1 INHIBITORS SENTINEL ONCOLOGY LIMITED (GB) 2022-05-05 US disclosed
WO-2021207956-A1 USE OF COATING COMPOSITIONS FOR MAKING A SUBSTRATE FROST RESISTANT, COMPOSITIONS AND METHODS USEFUL THEREFOR SOLVAY SA (BE) 2021-10-21 WO disclosed
US-7939601-B1 Polymers, compositions and methods of use for foams, laundry detergents, shower rinses, and coagulants RHODIA INC. (US) 2011-05-10 US disclosed
US-7915212-B2 Zwitterionic suds stabilizer; cosmetics; extenders for soaps and shampoos; antideposit agents, and antisoilants; terpolymers such as of hydroxyethyl acrylate-dimethylamino/ethyl methacrylate-acrylic acid; depilatories, cleaning compounds, oil well treatment, shaving gels, coagulants RHODIA INC. (US) 2011-03-29 US disclosed
US-20100297554-A1 RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-25 US disclosed
US-20100297563-A1 RESIST-MODIFYING COMPOSITION AND PATTERN FORMING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-11-25 US disclosed
US-7811742-B2 Lithographic printing plate precursor FUJIFILM CORPORATION (JP) 2010-10-12 US disclosed
US-20090148384-A1 FUNCTIONALIZED, SOLID POLYMER NANOPARTICLES COMPRISING EPOTHILONES BAYER SCHERING PHARMA AG (DE) 2009-06-11 US disclosed
US-20090081420-A1 INK COMPOSITION, INKJET RECORDING METHOD, AND PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2009-03-26 US disclosed
US-20080268372-A1 LITHOGRAPHIC PRINTING PLATE PRECURSOR FUJIFILM CORPORATION (JP) 2008-10-30 US disclosed
US-20080131393-A1 BLOCK POLYMERS, COMPOSITIONS AND METHODS OF USE FOR FOAMS, LAUNDRY DETERGENTS, SHOWER RINSES AND COAGULANTS RHODIA INC. (US) 2008-06-05 US disclosed
US-7335700-B2 Block polymers, compositions and methods of use for foams, laundry detergents, shower rinses and coagulants RHODIA INC. (US) 2008-02-26 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090148384-A1 FUNCTIONALIZED, SOLID POLYMER NANOPARTICLES COMPRISING EPOTHILONES EPOR, SELPLG, SELP DNM1 4495/4885KDM4E 4032/4885RIPK1 2207/4885
US-20230338415-A1 SUBSTITUTED PHENYL BORONIC ACID CONTAINING POLYMERS AND METHODS OF USE SLC10A2, PYGL, SLC10A1 DNM1 3976/4885KDM4E 4355/4885RIPK1 3307/4885
US-20080131393-A1 BLOCK POLYMERS, COMPOSITIONS AND METHODS OF USE FOR FOAMS, LAUNDRY DETERGENTS, SHOWER RINSES AND COAGULANTS CUTA, GZMB, DAGLB DNM1 4566/4885KDM4E 380/4885RIPK1 2377/4885
US-20220135552-A1 PYRROLE DERIVATIVES AS PLK1 INHIBITORS PLK1, CDK1, AURKC DNM1 1356/4885KDM4E 2032/4885RIPK1 1533/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.