Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTNR1A | P48039 | 4/20 | 0.49 |
| ▸ | MTNR1B | P49286 | 4/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.49 |
| ▸ | PKM | P14618 | 2/20 | 0.49 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | RAB9A | P51151 | 1/20 | 0.47 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.46 |
| ▸ | PTGER4 | P35408 | 1/20 | 0.45 |
| ▸ | PTGER2 | P43116 | 1/20 | 0.45 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | THRB | P10828 | 1/20 | 0.44 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | CASP6 | P55212 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1264240 | 0.85 | MTNR1A (0.44) | MTNR1AMTNR1BALDH1A1PKML3MBTL1 | |
| SCHEMBL449799 | 0.82 | THRB (0.61) | MTNR1AMTNR1BALDH1A1PKML3MBTL1 | |
| SCHEMBL20411149 | 0.80 | PPARA (0.44) | MTNR1AMTNR1BALDH1A1PKML3MBTL1 | |
| SCHEMBL19929351 | 0.79 | ALDH1A1 (0.46) | ALDH1A1KMT2ATDP1 | |
| SCHEMBL26607873 | 0.79 | MTNR1A (0.50) | MTNR1AMTNR1BALDH1A1PKML3MBTL1 | |
| SCHEMBL3387966 | 0.78 | TSHR (0.50) | ALDH1A1MAPTLMNAMEN1KMT2A | |
| SCHEMBL28648553 | 0.78 | ALDH1A1 (0.49) | ALDH1A1L3MBTL1LMNAMEN1KMT2A | |
| SCHEMBL11135363 | 0.78 | ALDH1A1 (0.62) | MTNR1AMTNR1BALDH1A1PKMMAPT | |
| SCHEMBL19119440 | 0.78 | PKM (0.53) | MTNR1AMTNR1BALDH1A1PKML3MBTL1 | |
| Phenol SCHEMBL29231472 | 0.78 | THRB (0.56) | MTNR1AMTNR1BALDH1A1PKML3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230305392-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-09-28 | — | — | US | disclosed |
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-08-29 | — | — | US | disclosed |
| US-11681224-B2 | Resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-20 | — | — | US | disclosed |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-05-02 | — | — | US | disclosed |
| US-20180065924-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-03-08 | — | — | US | disclosed |
| US-5663260-A | Hyperbranched copolymers from AB monomers and C monomers | CORNELL RESEARCH FOUNDATION, INC. (US) | 1997-09-02 | — | — | US | disclosed |
| EP-0791022-A1 | HYPERBRANCHED COPOLYMERS FROM AB MONOMERS AND C MONOMERS | CORNELL RESEARCH FOUNDATION, INC. (US) | 1997-08-27 | — | — | EP | disclosed |
| WO-1996014345-A1 | HYPERBRANCHED COPOLYMERS FROM AB MONOMERS AND C MONOMERS | CORNELL RESEARCH FOUNDATION, INC. (US) | 1996-05-17 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SCO2, CBR1, OXGR1 | MTNR1A 1070/4885MTNR1B 1791/4885ALDH1A1 492/4885 |
| US-20230305391-A1 | SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | RER1, H1-0, BET1 | MTNR1A 296/4885MTNR1B 511/4885ALDH1A1 1692/4885 |
| US-11739056-B2 | Carboxylate, carboxylic acid generator, resist composition and method for producing resist pattern | CHRM1, CHRM2, SCO2 | MTNR1A 916/4885MTNR1B 1281/4885ALDH1A1 836/4885 |
| US-11640114-B2 | Compound, resin, photoresist composition and process for producing photoresist pattern | HAX1, BRIX1, RXRA | MTNR1A 1287/4885MTNR1B 1745/4885ALDH1A1 2800/4885 |
| US-20180065924-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | C1R, RER1, C1S | MTNR1A 149/4885MTNR1B 409/4885ALDH1A1 2788/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.