Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Salicylic Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 8/20 | 0.68 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.68 |
| ▸ | HPGD | P15428 | 4/20 | 0.68 |
| ▸ | GAA | P10253 | 3/20 | 0.46 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.45 |
| ▸ | CA1 | P00915 | 2/20 | 0.45 |
| ▸ | CA9 | Q16790 | 2/20 | 0.45 |
| ▸ | CA12 | O43570 | 1/20 | 0.45 |
| ▸ | CA2 | P00918 | 1/20 | 0.45 |
| ▸ | HMGB1 | P09429 | 1/20 | 0.45 |
| ▸ | CA4 | P22748 | 1/20 | 0.45 |
| ▸ | CA6 | P23280 | 1/20 | 0.45 |
| ▸ | CA7 | P43166 | 1/20 | 0.45 |
| ▸ | NAPRT | Q6XQN6 | 1/20 | 0.45 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.45 |
| ▸ | TSHR | P16473 | 3/20 | 0.44 |
| ▸ | LMNA | P02545 | 3/20 | 0.44 |
| ▸ | MAPT | P10636 | 2/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.44 |
| ▸ | HTT | P42858 | 2/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phthalic Acid SCHEMBL2452632 | 0.88 | ALDH1A1 (0.48) | KDM4EALDH1A1HPGDCA2CA4 | |
| Phthalic Acid SCHEMBL8014901 | 0.86 | ALDH1A1 (0.47) | KDM4EALDH1A1HPGDCA2CA4 | |
| Tetrapropylammonium SCHEMBL104579 | 0.86 | KDM4E (0.63) | KDM4EALDH1A1HPGDGAASMN1; SMN2 | |
| 2,3-Dihydroxybenzoic Acid SCHEMBL5677506 | 0.86 | ALDH1A1 (0.48) | KDM4EALDH1A1HPGDCA1CA9 | |
| Salicylic Acid SCHEMBL11342550 | 0.85 | KDM4E (0.73) | KDM4EALDH1A1HPGDGAASMN1; SMN2 | |
| Salicylic Acid SCHEMBL982277 | 0.85 | KDM4E (0.73) | KDM4EALDH1A1HPGDGAASMN1; SMN2 | |
| Salicylic Acid SCHEMBL18340669 | 0.85 | KDM4E (0.80) | KDM4EALDH1A1HPGDGAASMN1; SMN2 | |
| Salicylic Acid SCHEMBL31547399 | 0.85 | ALDH1A1 (0.53) | KDM4EALDH1A1HPGDGAASMN1; SMN2 | |
| Salicylic Acid SCHEMBL106469 | 0.84 | KDM4E (0.79) | KDM4EALDH1A1HPGDGAASMN1; SMN2 | |
| Salicylic Acid SCHEMBL6249450 | 0.84 | KDM4E (0.95) | KDM4EALDH1A1HPGDGAASMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 93 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5356748-A | Nonaqueous solvent containing dispersed resin grains and graft polymer stabilizer | FUJI PHOTO FILM CO., LTD. (JP) | 1994-10-18 | — | — | US | claimed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| EP-4621486-A2 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-24 | — | — | EP | disclosed |
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-09-18 | — | — | US | disclosed |
| EP-4592299-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-30 | — | — | EP | disclosed |
| US-20250237953-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-24 | — | — | US | disclosed |
| US-12332565-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-06-17 | — | — | US | disclosed |
| US-12332567-B2 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-06-17 | — | — | US | disclosed |
| US-5733661-A | METAL OXIDE CONTAINING IONS OF AN ORGANIC CARBOXYLIC ACID SALT AND/OR IONS OF AN INORGANIC OXOACID SALT | MITSUBISHI CHEMICAL CORPORATION (JP) | 1998-03-31 | — | — | US | disclosed |
| US-5589312-A | RESIN GRAINS | FUJI PHOTO FILM CO., LTD. (JP) | 1996-12-31 | — | — | US | disclosed |
| US-5532099-A | RESIN GRAINS DISPERSED IN A NONAQUEOUS SOLVENT POLYMERIZED IN PRESENCE OF DISPERSION STABILIZING RESIN; TONER IMAGES HAVING RESIST WITH ETCHING RESISTANCE | FUJI PHOTO FILM CO., LTD. (JP) | 1996-07-02 | — | — | US | disclosed |
| US-5356748-A | Nonaqueous solvent containing dispersed resin grains and graft polymer stabilizer | FUJI PHOTO FILM CO., LTD. (JP) | 1994-10-18 | — | — | US | disclosed |
| US-5308730-A | Liquid developer for electrostatic photography | FUJI PHOTO FILM CO., LTD. (JP) | 1994-05-03 | — | — | US | disclosed |
| EP-0227433-B1 | ELECTROLYTE SOLUTION OF QUATERNARY AMMONIUM SALT FOR ELECTROLYTIC CAPACITOR | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1992-01-15 | — | — | EP | disclosed |
| US-4885115-A | Liquid electrolyte for use in electrolytic capacitor | NIPPON CHEMI-CON CORPORATION (JP) | 1989-12-05 | — | — | US | disclosed |
| US-4734821-A | AMMONIUM SALT OF CARBOXYLIC ACID | ASAHI GLASS COMPANY LTD. (JP) | 1988-03-29 | — | — | US | disclosed |
| US-4715976-A | QUATERNARY AMMONIUM SALT OF CARBOXYLIC ACID IN APROTIC SOLVENT | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1987-12-29 | — | — | US | disclosed |
| EP-0227433-A2 | Electrolyte solution of quaternary ammonium salt for electrolytic capacitor | MITSUBISHI PETROCHEMICAL CO., LTD. (JP) | 1987-07-01 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12332567-B2 | Composition for forming silicon-containing resist underlayer film, patterning process, and silicon compound | SMC1A, CDH1, SMC4 | KDM4E 404/4885ALDH1A1 1586/4885HPGD 4756/4885 |
| US-20250289931-A1 | POLYVALENT AMMONIUM SALT COMPOUND, COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | ASH2L, PUF60, IDUA | KDM4E 757/4885ALDH1A1 4472/4885HPGD 4883/4885 |
| US-12332565-B2 | Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process | RPS4X, SIK3, MLX | KDM4E 1336/4885ALDH1A1 4644/4885HPGD 4860/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | KDM4E 588/4885ALDH1A1 4452/4885HPGD 4878/4885 |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SMC1A, SPOUT1, LBR | KDM4E 2013/4885ALDH1A1 1558/4885HPGD 4586/4885 |
| US-20250237953-A1 | SILICON-CONTAINING SULFONIUM SALT COMPOUND, COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDERLAYER FILM, AND PATTERNING PROCESS | SMURF1, OSR1, SIK1 | KDM4E 2013/4885ALDH1A1 4150/4885HPGD 4870/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.