Known targets — ChEMBL curated mechanism
ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | USP2 | O75604 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | TSHR | P16473 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL893127 | 0.88 | USP2 (0.31) | USP2MAPTTSHR | |
| SCHEMBL6725199 | 0.84 | CA4 (0.30) | — | |
| SCHEMBL6063777 | 0.75 | — | — | |
| SCHEMBL5385256 | 0.73 | USP2 (0.33) | USP2MAPTTSHR | |
| SCHEMBL7513032 | 0.71 | ALDH1A1 (0.32) | — | |
| SCHEMBL4614918 | 0.69 | RECQL (0.41) | TSHR | |
| SCHEMBL27628647 | 0.69 | TSHR (0.35) | USP2MAPTTSHR | |
| SCHEMBL5946667 | 0.68 | CA4 (0.34) | TSHR | |
| SCHEMBL12076820 | 0.67 | TSHR (0.42) | USP2MAPTTSHR | |
| SCHEMBL12646616 | 0.67 | TSHR (0.38) | USP2MAPTTSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8084367-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD (KR) | 2011-12-27 | — | — | US | claimed |
| US-20070293054-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | SAMSUNG ELECTRONICS CO., LTD. | 2007-12-20 | — | — | US | claimed |
| US-7002044-B2 | Catalysis by water-soluble organometallic complexes in water-in-densified fluid microemulsions | THE UNIVERSITY OF CONNECTICUT (US) | 2006-02-21 | — | — | US | claimed |
| US-20040097761-A1 | Catalysis by water-soluble organometallic complexes in water-in-densified fluid microemulsions | CONNECTICUT, THE UNIVERSITY OF | 2004-05-20 | — | — | US | claimed |
| US-10155903-B2 | Metal etchant compositions and methods of fabricating a semiconductor device using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-12-18 | — | — | US | disclosed |
| US-20160204001-A1 | METAL ETCHANT COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME | LEE HYOSAN (KR) | 2016-07-14 | — | — | US | disclosed |
| US-20150368557-A1 | METAL ETCHANT COMPOSITIONS AND METHODS OF FABRICATING A SEMICONDUCTOR DEVICE USING THE SAME | CORNELL UNIVERSITY | 2015-12-24 | — | — | US | disclosed |
| US-8951383-B2 | Apparatus for treating wafers using supercritical fluid | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-02-10 | — | — | US | disclosed |
| US-8790470-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2014-07-29 | — | — | US | disclosed |
| US-8585917-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-11-19 | — | — | US | disclosed |
| US-20120085495-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | LEE HYO-SAN (US) | 2012-04-12 | — | — | US | disclosed |
| US-20120080059-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | LEE HYO-SAN (US) | 2012-04-05 | — | — | US | disclosed |
| US-8084367-B2 | Etching, cleaning and drying methods using supercritical fluid and chamber systems using these methods | SAMSUNG ELECTRONICS CO., LTD (KR) | 2011-12-27 | — | — | US | disclosed |
| US-20110083807-A1 | Apparatus for Treating Wafers Using Supercritical Fluid | CARESTREAM HEALTH, INC. | 2011-04-14 | — | — | US | disclosed |
| US-20070293054-A1 | ETCHING, CLEANING AND DRYING METHODS USING SUPERCRITICAL FLUID AND CHAMBER SYSTEMS USING THESE METHODS | SAMSUNG ELECTRONICS CO., LTD. | 2007-12-20 | — | — | US | disclosed |
| US-7002044-B2 | Catalysis by water-soluble organometallic complexes in water-in-densified fluid microemulsions | THE UNIVERSITY OF CONNECTICUT (US) | 2006-02-21 | — | — | US | disclosed |
| US-20040097761-A1 | Catalysis by water-soluble organometallic complexes in water-in-densified fluid microemulsions | CONNECTICUT, THE UNIVERSITY OF | 2004-05-20 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20040097761-A1 | Catalysis by water-soluble organometallic complexes in water-in-densified fluid microemulsions | MGAM, NSFL1C, LIPA | USP2 1727/4885MAPT 2250/4885TSHR 4415/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.