Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | USP2 | O75604 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | RECQL | P46063 | 1/20 | 0.32 |
| ▸ | GAA | P10253 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8617343 | 0.97 | TSHR (0.39) | TSHRKDM4ETDP1USP2MAPT | |
| SCHEMBL8619106 | 0.97 | TSHR (0.39) | TSHRKDM4ETDP1USP2MAPT | |
| SCHEMBL123489 | 0.97 | TSHR (0.39) | TSHRKDM4ETDP1USP2MAPT | |
| SCHEMBL959164 | 0.97 | TSHR (0.39) | TSHRKDM4ETDP1USP2MAPT | |
| SCHEMBL62076 | 0.97 | TSHR (0.39) | TSHRKDM4ETDP1USP2MAPT | |
| SCHEMBL1686885 | 0.97 | TSHR (0.39) | TSHRKDM4ETDP1USP2MAPT | |
| SCHEMBL1930697 | 0.97 | TSHR (0.39) | TSHRKDM4ETDP1USP2MAPT | |
| SCHEMBL21426 | 0.92 | TSHR (0.38) | TSHRKDM4ETDP1USP2MAPT | |
| SCHEMBL21906296 | 0.91 | TSHR (0.36) | TSHRKDM4ETDP1USP2MAPT | |
| Fluoride SCHEMBL28773810 | 0.90 | TSHR (0.37) | TSHRKDM4ETDP1USP2MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 284 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260140439-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2026-05-21 | — | — | US | disclosed |
| US-12560861-B2 | Method of manufacturing chemical fluid for manufacturing electronic material, pattern forming method, method of manufacturing semiconductor device, chemical fluid for manufacturing electronic material, container, and quality inspection method | FUJIFILM CORPORATION (JP) | 2026-02-24 | — | — | US | disclosed |
| EP-4691618-A1 | METHOD FOR PRODUCING HOLLOW FINE PARTICLES, HOLLOW FINE PARTICLES, PHASE-SEPARATED FINE PARTICLES, AQUEOUS DISPERSION, AND COMPOSITION | Daikin Industries, Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-12547072-B2 | Self-aligned build-up processing | GEMINATIO, INC. (US) | 2026-02-10 | — | — | US | disclosed |
| US-20260035554-A1 | METHOD FOR PRODUCING HOLLOW FINE PARTICLES, HOLLOW FINE PARTICLES, PHASE-SEPARATED FINE PARTICLES, AQUEOUS DISPERSION, AND COMPOSITION | DAIKIN INDUSTRIES, LTD. (JP) | 2026-02-05 | — | — | US | disclosed |
| US-20250336673-A1 | METHODS FOR SUBSTRATE PATTERNING PROCESS | TOKYO ELECTRON LTD (JP) | 2025-10-30 | — | — | US | disclosed |
| US-20250314969-A1 | SELF-ALIGNED DOUBLE PATTERNING USING METAL-BASED RESIST | TOKYO ELECTRON LTD (JP) | 2025-10-09 | — | — | US | disclosed |
| US-20250314968-A1 | SELF-ALIGNED DOUBLE PATTERNING USING METAL-BASED RESIST | TOKYO ELECTRON LTD (JP) | 2025-10-09 | — | — | US | disclosed |
| US-20250304524-A1 | FLUORINATED COMPOUND, PHOTOPOLYMERIZABLE COMPOSITION, HOLOGRAM RECORDING MEDIUM, PREPARATION METHOD THEREOF AND OPTICAL ELEMENT COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2025-10-02 | — | — | US | disclosed |
| US-12386261-B2 | In-resist process for high density contact formation | GEMINATIO, INC. (US) | 2025-08-12 | — | — | US | disclosed |
| US-20050245701-A1 | Process for producing modified particle; carrier; catalyst component for addition polymerization; process for producing catalyst for addition polymerization; and process for producing addition polymer | SUMITOMO CHEMICAL COMPANY, LIMITED | 2005-11-03 | — | — | US | disclosed |
| US-20050222351-A1 | Process for producing compound, catalyst component for addition polymerization, process for producing catalyst for addition polymerization, and process for producing addition polymer | SUMITOMO CHEMICAL COMPANY, LIMITED | 2005-10-06 | — | — | US | disclosed |
| US-20050148459-A1 | Process for producing modified particle, carrier or catalyst component for addition polymerization, pre-polymerized catalyst component therefor, catalyst therefor, and addition polymer | SUMITOMO CHEMICAL COMPANY, LIMITED | 2005-07-07 | — | — | US | disclosed |
| US-20040209762-A1 | Metal compound, and catalyst component and catalyst for addition polymerization, and process for producing addition polymer | SUMITOMO CHEMICAL COMPANY, LIMITED | 2004-10-21 | — | — | US | disclosed |
| EP-0973844-A1 | COMPOUNDS AND PROCESS FOR CONTROLLING CONE TILT ANGLE IN MIXTURES OF SMECTIC LIQUID CRYSTAL COMPOUNDS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 2000-01-26 | — | — | EP | disclosed |
| WO-1998046697-A1 | COMPOUNDS AND PROCESS FOR CONTROLLING CONE TILT ANGLE IN MIXTURES OF SMECTIC LIQUID CRYSTAL COMPOUNDS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1998-10-22 | — | — | WO | disclosed |
| EP-0837085-A1 | POLYCARBONATE-BASE POLYMER, PRODUCTION PROCESS, RESIN COATING FLUID PREPARED THEREFROM, AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR PREPARED THEREFROM | IDEMITSU KOSAN COMPANY LIMITED (JP) | 1998-04-22 | — | — | EP | disclosed |
| US-4965159-A | CORE, LAYER FOR CONTROLLING TRIBOELECTRIC CHARGING, AND FLUORINATED ALKYL METHACRYLATE | KONICA CORPORATION (JP) | 1990-10-23 | — | — | US | disclosed |
| US-4720533-A | Polyorganophosphazene curable in atmosphere | ETHYL CORPORATION (US) | 1988-01-19 | — | — | US | disclosed |
| US-4710549-A | Cross-linked phosphazene polymer | ETHYL CORPORATION (US) | 1987-12-01 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12547072-B2 | Self-aligned build-up processing | MYBBP1A, SMURF1, MYB | TSHR 2540/4885KDM4E 914/4885TDP1 2362/4885 |
| US-20260035554-A1 | METHOD FOR PRODUCING HOLLOW FINE PARTICLES, HOLLOW FINE PARTICLES, PHASE-SEPARATED FINE PARTICLES, AQUEOUS DISPERSION, AND COMPOSITION | PF4, PFN1, AQP3 | TSHR 1757/4885KDM4E 3989/4885TDP1 2857/4885 |
| US-20250304524-A1 | FLUORINATED COMPOUND, PHOTOPOLYMERIZABLE COMPOSITION, HOLOGRAM RECORDING MEDIUM, PREPARATION METHOD THEREOF AND OPTICAL ELEMENT COMPRISING THE SAME | NEFM, FLNA, FLNB | TSHR 4567/4885KDM4E 3664/4885TDP1 2467/4885 |
| US-12560861-B2 | Method of manufacturing chemical fluid for manufacturing electronic material, pattern forming method, method of manufacturing semiconductor device, chemical fluid for manufacturing electronic material, container, and quality inspection method | PRNP, SRP72, FIP1L1 | TSHR 801/4885KDM4E 3807/4885TDP1 1576/4885 |
| US-20040209762-A1 | Metal compound, and catalyst component and catalyst for addition polymerization, and process for producing addition polymer | AP1M1, PYM1, SEM1 | TSHR 4012/4885KDM4E 1556/4885TDP1 3299/4885 |
| US-20260140439-A1 | METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE | SLC39A3, TFRC, PRNP | TSHR 648/4885KDM4E 567/4885TDP1 1186/4885 |
| US-20050222351-A1 | Process for producing compound, catalyst component for addition polymerization, process for producing catalyst for addition polymerization, and process for producing addition polymer | CCNT1, C5, C9 | TSHR 4243/4885KDM4E 2347/4885TDP1 4509/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.