Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.36 |
| ▸ | PNMT | P11086 | 1/20 | 0.36 |
| ▸ | IDO1 | P14902 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4848754 | 0.81 | TSHR (0.36) | ALDH1A1TSHRKMT2APNMT | |
| SCHEMBL4841457 | 0.78 | PNMT (0.34) | PNMTIDO1 | |
| SCHEMBL4432992 | 0.78 | TSHR (0.38) | ALDH1A1TSHRKMT2APNMTIDO1 | |
| SCHEMBL2524726 | 0.78 | IDO1 (0.50) | PNMTIDO1 | |
| SCHEMBL10709160 | 0.78 | GABRA1 (0.41) | ALDH1A1PNMT | |
| SCHEMBL4847240 | 0.78 | TSHR (0.35) | ALDH1A1TSHRPNMTIDO1 | |
| SCHEMBL10708865 | 0.75 | ADRA2B (0.36) | ALDH1A1PNMT | |
| SCHEMBL5487371 | 0.75 | CALM1 (0.46) | ALDH1A1KMT2A | |
| SCHEMBL150237 | 0.74 | TSHR (0.50) | ALDH1A1TSHRKMT2APNMTIDO1 | |
| SCHEMBL29350459 | 0.74 | TSHR (0.50) | ALDH1A1TSHRKMT2APNMTIDO1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 114 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108755145-A | A kind of material and its preparation and application with antibacterial collaboration bacteriological protection adhesive function | 广州大学 | 2018-11-06 | — | — | CN | claimed |
| CN-104710644-A | Method for preparing antibacterial surface on medical high polymer material surface | CHANGCHUN APPLIED CHEMISTRY | 2015-06-17 | — | — | CN | claimed |
| US-6833075-B2 | Process for preparing reactive compositions for fluid treatment | WATERVISIONS INTERNATIONAL, INC. | 2004-12-21 | — | — | US | claimed |
| WO-2003089113-A1 | PROCESS FOR PREPARING REACTIVE COMPOSITIONS FOR FLUID TREATMENT | WATERVISIONS INTERNATIONAL, INC. (US) | 2003-10-30 | — | — | WO | claimed |
| US-20030196960-A1 | Process for preparing reactive compositions for fluid treatment | WATERVISIONS INTERNATIONAL, INC. | 2003-10-23 | — | — | US | claimed |
| EP-0164598-B1 | PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR FORMING PHOTO-RESIST PATTERN USING THE SAME | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1990-09-12 | — | — | EP | claimed |
| EP-0164598-A2 | Photosensitive resin composition and process for forming photo-resist pattern using the same | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1985-12-18 | — | — | EP | claimed |
| JP-60059347-A | — | — | None | — | — | JP | disclosed |
| US-20250326936-A1 | ARTICLES INCLUDING SURFACE COATINGS AND METHODS TO PRODUCE THEM | MAXTERIAL INC (US) | 2025-10-23 | — | — | US | disclosed |
| US-12173166-B2 | Articles including surface coatings and methods to produce them | MAXTERIAL, INC. (US) | 2024-12-24 | — | — | US | disclosed |
| US-20240351940-A1 | POLYMER BRUSH | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2024-10-24 | — | — | US | disclosed |
| CN-108155354-B | Polymerization of anode active material particles having a synthetic SEI layer by grafting from a main chain | 罗伯特·博世有限公司 | 2024-03-22 | — | — | CN | disclosed |
| US-20240026333-A1 | STABILITY AND ACTIVITY OF ENZYMES BY IMMOBILIZATION | THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) | 2024-01-25 | — | — | US | disclosed |
| US-5688642-A | Selective attachment of nucleic acid molecules to patterned self-assembled surfaces | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF THE NAVY (US) | 1997-11-18 | — | — | US | disclosed |
| US-5397642-A | Articles including thin film monolayers and multilayers | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES DEPARTMENT OF ENERGY (US) | 1995-03-14 | — | — | US | disclosed |
| WO-1992017333-A1 | SELF-ASSEMBLED SUPER LATTICES | NORTHWESTERN UNIVERSITY (US) | 1992-10-15 | — | — | WO | disclosed |
| EP-0164598-B1 | PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR FORMING PHOTO-RESIST PATTERN USING THE SAME | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1990-09-12 | — | — | EP | disclosed |
| US-4702990-A | Photosensitive resin composition and process for forming photo-resist pattern using the same | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1987-10-27 | — | — | US | disclosed |
| EP-0164598-A2 | Photosensitive resin composition and process for forming photo-resist pattern using the same | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1985-12-18 | — | — | EP | disclosed |
| JP-S6059347-A | MANUFACTURE OF RESIST MATERIAL | NIPPON TELEGR & TELEPH CORP <NTT> | 1985-04-05 | — | — | JP | disclosed |